[특허]Method and apparatus for removing a liquid from a surface of a rotating substrate

[미국특허] Method and apparatus for removing a liquid from a surface of a rotating substrate 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B08D-003/02 B08B-003/00
출원번호	US-0159801 (1998-09-23)
우선권정보	EP-988700563 (1998-03-20)
발명자 / 주소	Paul Mertens BE Mark Meuris BE Marc Heyns BE
출원인 / 주소	Interuniversitair Microelektronics Centrum (IMEC) BE
대리인 / 주소	McDonnell Boehnen Hulbert & Berghoff
인용정보	피인용 횟수 : 104 인용 특허 : 7

초록 ▼

A method and an apparatus for removing a liquid, i.e a wet processing liquid, from a surface of at least one substrate is disclosed. A liquid is supplied on a surface of substrate. Simultaneously or thereafter besides the liquid also a gaseous substance can be supplied thereby creating at least locally a sharply defined liquid-vapor boundary. The gaseous substance and the liquid can be selected such that the gaseous substance is miscible with the liquid and when mixed with the liquid yields a mixture having a surface tension lower than that of the liquid. According to the invention, the substrate is subjected to a rotary movement at a speed to guide said liquid-vapor boundary over said substrate thereby removing said liquid from said substrate.

대표청구항 ▼

1. A method of removing a liquid from at least a portion of one surface of a substrate, the method comprising steps of:subjecting said substrate to a rotary movement; supplying a liquid to at least a part of said surface of said substrate; and supplying a gaseous substance to at least a section of said surface of said substrate, the step of supplying a gaseous substance being performed, at least a part of the time, simultaneously with the step of supplying a liquid, said gaseous substance being at least partially miscible with said liquid and when mixed with said liquid yielding a mixture having a surface tension being lower than that of said liquid, wherein the supplying of a liquid and the supplying of a gaseous substance cooperatively remove liquid from at least a portion of one surface of a substrate.

이 특허에 인용된 특허 (7) 인용/피인용 타임라인 분석

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Paul Mertens BE; Marc Meuris BE; Marc Heyns BE, Method and apparatus for removing a liquid from a surface.
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Leenaars Adriaan F. M. (Eindhoven NLX) Huethorst Johanna A. M. (Eindhoven NLX) Marra Johannes (Eindhoven NLX), Method for removing in a centrifuge a liquid from a surface of a substrate.
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Kanno Itaru,JPX, Wafer cleaning apparatus.
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A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
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[미국특허] Method and apparatus for removing a liquid from a surface of a rotating substrate 원문보기

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[미국특허] Method and apparatus for removing a liquid from a surface of a rotating substrate 원문보기

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대표청구항 ▼

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이 특허에 인용된 특허 (7) 인용/피인용 타임라인 분석

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