이 특허에 인용된 특허 (129)

1. Marshall Mary C. (San Antonio TX), Apparatus and method for cleaning articles utilizing supercritical and near supercritical fluids.

   상세보기
2. Pawliszyn Janusz B. (383 Dunvegan Dr. Waterloo CAX N2K 1W7), Apparatus and method for delivering supercritical fluid.

   상세보기
3. Gessner Adolf W. (Silver Spring MD), Apparatus and method for reducing solvent vapor losses.

   상세보기
4. Smith Charles W. (Fairview PA) Stanford ; Jr. Thomas B. (San Pedro CA), Apparatus for applying ultrasonic energy in precision cleaning.

   상세보기
5. Basso James E. (Hopewell Junction NY) Bhalla Parmesh K. (Pleasant Valley NY) Chahine John J. (Poughkeepsie NY) Diddell Daro (San Diego CA) Earle Gregory J. (Wallkill NY) Gabriel Edward P. (Newburgh N, Apparatus for cleaning and drying workpieces.

   상세보기
6. Marshall Mary C. (San Antonio TX), Apparatus for cleaning articles utilizing supercritical and near supercritical fluids.

   상세보기
7. Hazano Shigeki (Yokohama CA JPX) Shibagaki Masahiro (San Jose CA) Jyo Hidetaka (Sagamihara JPX) Sensui Reiichiro (Sagamihara JPX) Iwami Munenori (Yokohama JPX) Suzuki Noboru (Chigasaki JPX), Apparatus for producing semiconductor devices.

   상세보기
8. Mielnik Richard J. (Erie PA) Metalonis John A. (Erie PA) Reber Richard K. (Erie PA) Rosio Larry R. (Erie PA) Shore Stephen H. (Erie PA) Smith Charles W. (Erie PA), Apparatus for supercritical cleaning.

   상세보기
9. Mielnik Richard J. (Erie PA) Metalonis John A. (Fairview PA) Reber Richard K. (Erie PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA) Smith Charles W. (Fairview PA), Apparatus for supercritical cleaning.

   상세보기
10. Harris Robert D. (8145-B Belvedere Ave. Sacramento CA 95826), Carbonated cleaning solution.

    상세보기
11. Chao Sidney C. (Manhattan Beach CA) Purer Edna M. (Los Angeles CA), Chemical decomposition by sonication in liquid carbon dioxide.

    상세보기
12. Matson Dean W. (Kennewick WA) Fulton John L. (Richland WA) Smith Richard D. (Richland WA) Consani Keith A. (Richland WA), Chemical reactions in reverse micelle systems.

    상세보기
13. Zucchini ; Guido, Circuit for the recovery of solvent vapor evolved in the course of a cleaning cycle in dry-cleaning machines or plants,.

    상세보기
14. Chao Sidney C. (Manhattan Beach CA) Purer Edna M. (Los Angeles CA) Stanford Thomas B. (San Pedro CA) Townsend Carl W. (Los Angeles CA), Cleaning by cavitation in liquefied gas.

    상세보기
15. Lee Wai M. (Fremont CA), Cleaning compositions for removing etching residue and method of using.

    상세보기
16. Adler Robert,ATX, Cleaning of workpieces having organic residues.

    상세보기
17. Blaudszun Bernd (Hamburg DEX), Cleaning or stripping of coated objects.

    상세보기
18. DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.

    상세보기
19. DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.

    상세보기
20. DeSimone Joseph M. ; Romack Timothy J. ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.

    상세보기
21. Jackson David P. (Saugus CA) Buck Orval F. (Santa Monica CA), Cleaning process using phase shifting of dense phase gases.

    상세보기
22. Tanaka Masato (Nagano) Ichikawa Tadayoshi (Nagano JPX), Cleaning system using a solvent.

    상세보기
23. Mitchell James D. (Alamo CA) Alvarez Vincent E. (Livermore CA) Carty Daniel T. (Danville CA) Latham James R. (Livermore CA), Cleaning through perhydrolysis conducted in dense fluid medium.

    상세보기
24. Jackson David P. (Saugus CA) Buck Orval F. (Santa Monica CA), Coating process using dense phase gas.

    상세보기
25. Monzyk Bruce F. (Maryland Heights MO), Compositions containing n-ethyl hydroxamic acid chelants.

    상세보기
26. Palen Edward J. (Los Angeles CA), Continuous operation supercritical fluid treatment process and system.

    상세보기
27. Fowler David E. (Gainesville FL) Witt Charles R. (Crystal River FL), Decontamination apparatus for chemically and/or radioactively contaminated tools and equipment.

    상세보기
28. Jackson David P. (608 Ruberta Glendale CA 91201), Dense fluid microwave centrifuge.

    상세보기
29. Jackson David P. (Saugus CA), Dense fluid photochemical process for liquid substrate treatment.

    상세보기
30. Jackson David P. (Saugus CA), Dense fluid photochemical process for substrate treatment.

    상세보기
31. Jackson David P. (Saugus CA), Dense phase gas photochemical process for substrate treatment.

    상세보기
32. Jureller Sharon Harriott (Haworth NJ) Kerschner Judith Lynne (Ridgewood NJ) Bae-Lee Myongsuk (Montville NJ) Del Pizzo Lisa (Bloomfield NJ) Harris Rosemarie (Yonkers NY) Resch Carol (Rutherford NJ) Wa, Dry cleaning system using densified carbon dioxide and a surfactant adjunct.

    상세보기
33. Bergman Eric J. (120 Midale Kalispell MT 59901), Dynamic semiconductor wafer processing using homogeneous chemical vapors.

    상세보기
34. Ho Chih-Ming (Rancho Palos Verdes CA) Miu Denny K. (Valencia CA) Leu Jeremy Tzong-Shyng (Plainsboro NJ) Miller Raanan (Pasadena CA) Desai Amish (Pasadena CA) Liu Chang (Pasadena CA) Tsao Tom (Pasaden, Electromagnetically actuated micromachined flap.

    상세보기
35. Beckman Eric J. (Edgewood PA) Russell Alan J. (Wexford PA), Extraction of metals in carbon dioxide and chelating agents therefor.

    상세보기
36. Wai Chien M. ; Laintz Kenneth E., Extraction of metals using supercritical fluid and chelate forming legand.

    상세보기
37. Blander Milton (Palos Park IL) Wai Chien M. (Moscow ID) Nagy Zoltan (Woodridge IL), Extraction of trace metals from fly ash.

    상세보기
38. Ohno, Reiko; Matsuoka, Terumi, Film removing method and film removing agent.

    상세보기
39. Wai Chien M. ; Laintz Kenneth E., Fluid extraction.

    상세보기
40. Beckman Eric J. ; Russell Alan J., Further extractions of metals in carbon dioxide and chelating agents therefor.

    상세보기
41. Gluck Ronald (Rochester NY) Roselle Paul L. (Rochester NY), Gaseous cleaning method for silicon devices.

    상세보기
42. Blackwood Robert S. (Lubbock TX) Biggerstaff Rex L. (Lubbock TX) Clements L. Davis (Lincoln NE) Cleavelin C. Rinn (Lubbock TX), Gaseous process and apparatus for removing films from substrates.

    상세보기
43. DeSimone Joseph M. (Chapel Hill NC) Maury Elise E. (Chapel Hill NC) Combes James R. (Carboro NC) Menceloglu Yusuf Z. (Chapel Hill NC), Heterogeneous polymerization in carbon dioxide.

    상세보기
44. DeSimone Joseph M. (Chapel Hill NC) Maury Elise E. (Chapel Hill NC) Combes James R. (Carboro NC) Menceloglu Yusuf Z. (Chapel Hill NC), Heterogeneous polymerization in carbon dioxide.

    상세보기
45. Natale Nicholas R. (Moscow ID) Wai Chien M. (Moscow ID) Elshani Sadik (Moscow ID), Hydroxamic acid crown ethers.

    상세보기
46. Privat Michel (6 ; rue Monsigny 75002 Paris FRX), Installation for cleaning clothes and removal of particulate contaminants especially from clothing contaminated by radio.

    상세보기
47. Ting Chiu H. ; Holtkamp William H., Integrated vacuum and plating cluster system.

    상세보기
48. Moses John M. (Dedham MA), Liquid CO₂/cosolvent extraction.

    상세보기
49. Townsend Carl W. (Los Angeles CA) Purer Edna M. (Los Angeles CA), Liquid carbon dioxide dry cleaning system having a hydraulically powered basket.

    상세보기
50. Dewees Thomas G. (Pleasanton CA) Knafelc Frank M. (Lafayette CA) Mitchell James D. (Alamo CA) Taylor R. Gregory (Pleasanton CA) Iliff Robert J. (Oakley CA) Carty Daniel T. (Danville CA) Latham James , Liquid/supercritical carbon dioxide dry cleaning system.

    상세보기
51. Iliff Robert J. (Oakley CA) Mitchell James D. (Alamo CA) Carty Daniel T. (Danville CA) Latham James R. (Livermore CA) Kong Stephen B. (Alameda CA), Liquid/supercritical carbon dioxide/dry cleaning system.

    상세보기
52. Mitchell James D. (Alamo CA) Carty Daniel T. (Danville CA) Latham James R. (Livermore CA) Kong Stephen B. (Alameda CA) Iliff Robert J. (Oakley CA), Liquid/supercritical cleaning with decreased polymer damage.

    상세보기
53. Stanford,Jr. Thomas B. (San Pedro CA) Chao Sidney C. (Manhattan Beach CA), Low cost equipment for cleaning using liquefiable gases.

    상세보기
54. Weil Peter (Helene-Mayer-Ring 10 D-8000 Munich DEX), Method and apparatus for treating objects in a closed vessel with a solvent.

    상세보기
55. Paranjpe Ajit P. (Plano TX), Method for cleaning semiconductor wafers using liquified gases.

    상세보기
56. Biebl Markus (Augsburg DEX), Method for drying micromechanical components.

    상세보기
57. Chau Kevin H. L. (North Andover MA) Saltmarsh Michael P. (Concord NH) Church Deborah A. (Pepperell MA), Method for fabricating microstructures using temporary bridges.

    상세보기
58. Morita Kiyoyuki (Osaka JPX) Ishihara Takeshi (Osaka JPX), Method for forming a dielectric thin film or its pattern of high accuracy on a substrate.

    상세보기
59. Morita Kiyoyuki (Osaka JPX) Ishihara Takeshi (Osaka JPX), Method for forming a dielectric thin film or its pattern of high accuracy on substrate.

    상세보기
60. Batchelder John Samuel, Method for optical inspection and lithography.

    상세보기
61. Gonzales David (Boise ID) Hudson Guy F. (Boise ID), Method for post chemical-mechanical planarization cleaning of semiconductor wafers.

    상세보기
62. Schulz Peter (Wappingers Falls NY), Method for reducing metal contamination of silicon wafers during semiconductor manufacturing.

    상세보기
63. Kim Jae-Jeong,KRX, Method for removing etch residue material.

    상세보기
64. Douglas Monte A. ; Templeton Allen C., Method for removing inorganic contamination by chemical derivitization and extraction.

    상세보기
65. Starov Vladimir (Redwood City CA), Method for removing photoresist and other adherent materials from substrates.

    상세보기
66. Shortes Samuel R. (Lewisville TX) Penn Thomas C. (Richardson TX), Method for removing photoresist layer from substrate by ozone treatment.

    상세보기
67. DeCrosta Michelle A. (Bethlehem PA) Jagnandan Indradat (West Orange NJ), Method for removing residual additives from elastomeric articles.

    상세보기
68. Evans Jeffrey J. (Milltown NJ) Guth Leslie A. (Newtown PA) Ray Urmi (Plainsboro NJ), Method for stripping conformal coatings from circuit boards.

    상세보기
69. Truckenmller Kurt (Heilbronn DEX) Wrner Gottlob (Bnningheim DEX), Method for the application of a lubricant on a sewing yarn.

    상세보기
70. Alley Rodney L. (El Cerrito CA) Howe Roger T. (Lafayette CA) Komyopoulos Kyriakos (Orinda CA), Method of applying a monolayer lubricant to micromachines.

    상세보기
71. Wallace Robert M. ; Douglas Monte A., Method of cleaning and treating a semiconductor device including a micromechanical device.

    상세보기
72. Saga Koichiro (Kanagawa JPX) Koyata Sakuo (Kanagawa JPX) Hattori Takeshi (Kanagawa JPX), Method of cleaning substrate.

    상세보기
73. Smith ; Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA), Method of cleaning workpiece with solvent and then with liquid carbon dioxide.

    상세보기
74. Jureller Sharon Harriott (Haworth NJ) Kerschner Judith Lynne (Ridgewood NJ) Bae-Lee Myongsuk (Montville NJ) Del Pizzo Lisa (Bloomfield NJ) Harris Rosemarie (Yonkers NY) Resch Carol (Rutherford NJ) Wa, Method of dry cleaning fabrics using densified carbon dioxide.

    상세보기
75. Jureller Sharon Harriott (Haworth NJ) Kerschner Judith Lynne (Fairlawn NJ) Harris Rosemarie (Yonkers NY), Method of dry cleaning fabrics using densified liquid carbon dioxide.

    상세보기
76. Houston Michael R. ; Howe Roger T. ; Maboudian Roya ; Srinivasan Uthara, Method of drying passivated micromachines by dewetting from a liquid-based process.

    상세보기
77. DeSimone Joseph M., Method of making fluoropolymers.

    상세보기
78. DeSimone Joseph M. (Chapel Hill NC), Method of making fluoropolymers.

    상세보기
79. Nishikawa Masaru (Tsutsujigaoka Haimu A-409 ; 13-3 ; Shibazaki 2-chome Chofu-shi ; Tokyo JPX) Nakagawa Kazumichi (Tokyo JPX) Yamaguchi Yohichi (Tokyo JPX), Method of processing an article in a supercritical atmosphere.

    상세보기
80. Douglas Monte A. ; Templeton Allen C., Method of removing inorganic contamination by chemical alteration and extraction in a supercritical fluid media.

    상세보기
81. Douglas Monte A. (Coppell TX) Wallace Robert M. (Dallas TX), Method of unsticking components of micro-mechanical devices.

    상세보기
82. Stanford ; Jr. Thomas B. (San Pedro CA) Chao Sidney C. (Manhattan Beach CA), Method using megasonic energy in liquefied gases.

    상세보기
83. Wai Chien M. (Moscow ID), Methods and devices for the separation of radioactive rare earth metal isotopes from their alkaline earth metal precurso.

    상세보기
84. Hoy Kenneth L. (St. Albans WV) Nielsen Kenneth A. (Charleston WV), Methods for cleaning apparatus using compressed fluids.

    상세보기
85. Lin Liwei (Berkeley CA) Nguyen Clark T. (Berkeley CA) Howe Roger T. (Lafayette CA) Pisano Albert P. (Berkeley CA), Microelectromechanical signal processor fabrication.

    상세보기
86. Yager Paul ; Brody James P. ; Holl Mark R. ; Forster Fred K. ; Galambos Paul C., Microfabricated differential extraction device and method.

    상세보기
87. Gimzewski James (Zuerich CHX) Parrinello Michele (Horgen CHX) Reihl Bruno (Wilen CHX), Molecular recording/reproducing method and recording medium.

    상세보기
88. Kiba Hiroshi (Hiroshima JPX) Nagano Kenzou (Hiroshima JPX) Sumiyoshi Shigeru (Hiroshima JPX), Painting truck washing system.

    상세보기
89. O\Brien Sean (Plano TX), Particle removal in supercritical liquids using single frequency acoustic waves.

    상세보기
90. Fujita Yoshihiro (Kanagawa JPX) Morigaki Masakazu (Kanagawa JPX) Kawamoto Hiroshi (Kanagawa JPX) Nakamura Shigeru (Kanagawa JPX) Yagihara Morio (Kanagawa JPX) Watanabe Hiroyuki (Kanagawa JPX), Photographic processing solution having a stabilizing ability and a method for processing a silver halide color photogra.

    상세보기
91. Sawan Samuel P. ; Talhi Abdelhafid ; Taylor Craig M., Polymers with increased order.

    상세보기
92. Smith ; Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA) Karle James A. (Erie PA), Precision cleaning system.

    상세보기
93. Smith ; Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA), Precision cleaning vessel.

    상세보기
94. Fitzgerald Wayne ; James Kenneth J. ; Waibel Brian J., Precision high pressure control assembly.

    상세보기
95. James Kenneth J. ; Waibel Brian J., Precision high pressure control assembly.

    상세보기
96. Wetmore Paula M. (5 S. Webster St. Bradford MA 01835) Krukonis Val J. (287 Emerson Rd. Lexington MA 02173) Coffey Michael P. (5 Blood Rd. Townsend MA 01469), Pressure pulse cleaning.

    상세보기
97. Sauer Richard A. ; Hubert Jean-Luc ; Connors Robert W., Pressure-swing absorption based cleaning methods and systems.

    상세보기
98. Schlenker Wolfgang (Basel CHX) Liechti Peter (Arisdorf CHX) Werthemann Dieter (Basel CHX) Casa Angelo D. (Riehen CHX), Process for dyeing cellulosic textile material with disperse dyes.

    상세보기
99. Saus Wolfgang (Grevenbroich DEX) Knittel Dierk (Krefeld DEX) Schollmeyer Eckhard (Kempen DEX) Buschmann Hans-Jrgen (Krefeld DEX), Process for dyeing hydrophobic textile material with disperse dyes from supercritical CO₂: reducing the pr.

    상세보기
100. Cathey ; Jr. David A. (Boise ID), Process for etching semiconductor devices.

     상세보기
101. Allen Robert David (San Jose CA) Wallraff Gregory Michael (Morgan Hill CA), Process for generating negative tone resist images utilizing carbon dioxide critical fluid.

     상세보기
102. Hedrick Jeffrey Curtis ; Hedrick James Lupton ; Hilborn Jons Gunnar,CHX ; Liao Yun-Hsin ; Miller Robert Dennis ; Shih Da-Yuan, Process for making a foamed elastomeric polymer.

     상세보기
103. Hedrick Jeffrey Curtis ; Hedrick James Lupton ; Hilborn Jons Gunnar,CHX ; Liao Yun-Hsin ; Miller Robert Dennis ; Shih Da-Yuan, Process for making a foamed elastometric polymer.

     상세보기
104. Oesch Gustav (Zurich CHX) Gmeiner Paul (Lieli CHX) Hofer Urs (Zurich CHX), Process for the extraction of oil or polychlorinated biphenyl from electrical parts through the use of solvents and for.

     상세보기
105. Schlenker Wolfgang (Basel CHX) Werthemann Dieter (Basel CHX) Eckhardt Claude (Riedisheim FRX), Process for the fluorescent whitening of hydrophobic textile material with disperse fluorescent whitening agents from su.

     상세보기
106. Kagiyama Yasuhiro (Tokuyama JPX) Doi Koichi (Tabuse JPX) Nonaka Toru (Tokuyama JPX) Ishiyama Yuji (Shin-Nanyo JPX) Komatsubara Shigeo (Yokohama JPX), Process for washing semiconductor substrate with organic solvent.

     상세보기
107. Jackson David P. (22328 W. Barcotta Dr. Santa Clarita CA 91350) Lepp Michael A. (22334 W. Barcotta Dr. Santa Clarita CA 91350), Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids.

     상세보기
108. Beckman Eric J. (Kennewick WA) Smith Richard D. (Richland WA) Fulton John L. (Richland WA), Processes for microemulsion polymerization employing novel microemulsion systems.

     상세보기
109. Witowski Robert (Austin TX), Reduced temperature suppression of volatilization of photoexcited halogen reaction products from surface of silicon wafe.

     상세보기
110. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Removal of fluorine or chlorine residue by liquid CO.sub.2.

     상세보기
111. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Residue removal by supercritical fluids.

     상세보기
112. Olesen Michael B. (Yorba Linda CA) Bran Mario E. (Garden Grove CA), Semiconductor wafer cleaning system.

     상세보기
113. Moslehi Mehrdad M. (Dallas TX), Semiconductor wafer cleaning using condensed-phase processing.

     상세보기
114. Fukazawa Yuji (Yokohama JPX), Semiconductor wafer treating method.

     상세보기
115. Muraoka Hisashi (Yokohama JPX), Silicon wafer cleaning fluid with HN0₃, HF, HCl, surfactant, and water.

     상세보기
116. Vaartstra Brian A., Supercritical compositions for removal of organic material and methods of using same.

     상세보기
117. Vaartstra Brian A., Supercritical etching compositions and method of using same.

     상세보기
118. Wai Chien M. (Moscow ID) Laintz Kenneth (Pullman WA), Supercritical fluid extraction.

     상세보기
119. Lansberry Don D. (Kaysville UT) Council Thomas G. (Camarillo CA), Supercritical fluid recirculating system for a precision inertial instrument parts cleaner.

     상세보기
120. Fulton John L. (Richland WA) Smith Richard D. (Richland WA), Supercritical fluid reverse micelle separation.

     상세보기
121. Fulton John L. (Richland WA) Smith Richard D. (Richland WA), Supercritical fluid reverse micelle systems.

     상세보기
122. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Northampton PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Milwood NY) Schwarz Alexander (Bethlehem PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using an argon or nitrogen aerosol.

     상세보기
123. Hayashida Ichiro (Kawagoe JPX) Kakizawa Masahiko (Kawagoe JPX), Surface treating agents and treating process for semiconductors.

     상세보기
124. Hayashida Ichiro (Kawagoe JPX) Kakizawa Masahiko (Kawagoe JPX) Umekita Kenichi (Kawagoe JPX) Nawa Hiroyoshi (Kawagoe JPX) Muraoka Hisashi (Yokohama JPX), Surface treating cleaning method.

     상세보기
125. Rand Burton (Norristown PA), Vapor degreasing system having a divider wall between upper and lower vapor zone portions.

     상세보기
126. Kurokawa Hideaki (Hitachi JPX) Ebara Katsuya (Mito JPX) Takahashi Sankichi (Hitachi JPX) Matsuzaki Harumi (Hitachi JPX) Yoda Hiroaki (Tsuchiura JPX) Nitta Takahisa (Fuchu JPX) kouchi Isao (Hitachi JP, Vapor washing process and apparatus.

     상세보기
127. Rahn Armin (St. Jean sur Richelieu CAX), Vapour phase treatment process and apparatus.

     상세보기
128. Tanaka Masato (Hikone JPX) Nishizawa Hisao (Hikone JPX) Hirai Nobuyuki (Hikone JPX) Shinbara Kaoru (Hikone JPX) Yoshioka Hitoshi (Hikone JPX), Wafer cleaning method and apparatus therefore.

     상세보기
129. Ishijima Akira (Tokyo JPX) Beppu Toshihiko (Tokyo JPX) Kikuchi Gunpei (Tokyo JPX), Washing arrangement for and method of washing lead frames.

     상세보기
더보기