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Integrated platen assembly for a chemical mechanical planarization system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-007/00
출원번호 US-0931156 (2001-08-16)
발명자 / 주소
  • Franklin, Timothy J.
  • Marohl, Dan A.
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Moser, Patterson & Sheridan
인용정보 피인용 횟수 : 9  인용 특허 : 114

초록

Generally, a method and apparatus for supporting a web of polishing material. In one embodiment, the apparatus includes a platen and a blocker valve. The platen includes a support surface adapted to support the polishing material and a port fluidly coupled to the support surface. A housing that incl

대표청구항

Generally, a method and apparatus for supporting a web of polishing material. In one embodiment, the apparatus includes a platen and a blocker valve. The platen includes a support surface adapted to support the polishing material and a port fluidly coupled to the support surface. A housing that incl

이 특허에 인용된 특허 (114)

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이 특허를 인용한 특허 (9)

  1. Talieh, Homayoun; Basol, Bulent M., Advanced chemical mechanical polishing system with smart endpoint detection.
  2. Talieh,Homayoun; Basol,Bulent M., Advanced chemical mechanical polishing system with smart endpoint detection.
  3. Brown, Karl; Arellano, Nora; Sherstinsky, Semyon; Lau, Allen; Tsai, Cheng-Hsiung; Mehta, Vineet; Sansoni, Steve; Wang, Wei W., Detachable electrostatic chuck.
  4. Brown,Karl; Sherstinsky,Semyon; Wang,Wei W.; Tsai,Cheng Hsiung; Mehta,Vineet; Lau,Allen; Sansoni,Steve, Detachable electrostatic chuck for supporting a substrate in a process chamber.
  5. Parkhe, Vijay D.; Tsai, Cheng Tsiung; Sansoni, Steven V., Detachable electrostatic chuck having sealing assembly.
  6. Bonner,Benjamin A.; McReynolds,Peter; Menk,Gregory E.; Iyer,Anand N.; Prabhu,Gopalakrishna B.; Rondum,Erik S.; Jackson,Robert L.; Leung,Garlen, Materials for chemical mechanical polishing.
  7. Bonner,Benjamin A.; McReynolds,Peter; Menk,Gregory E.; Iyer,Anand N.; Prabhu,Gopalakrishna B.; Rondum,Erik S.; Jackson,Robert L.; Leung,Garlen, Materials for chemical mechanical polishing.
  8. Sommer,Phillip R.; Butterfield,Paul, Polishing media stabilizer.
  9. Teshirogi, Kazuo; Shimobeppu, Yuzo; Yoshimoto, Kazuhiro; Watanabe, Mitsuhisa; Shinjo, Yoshiaki; Yoshida, Eiji; Hayasaka, Noboru, Vacuum fixing jig for semiconductor device.
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