초록 ▼

A magnetic closure with mutual interlock for bags, knapsacks, items of clothing and the like, comprising a female element and a male element with regions for accommodating magnetic elements for mutual coupling. A particularity consists in that there are provided, on the female element, guiding means

A magnetic closure with mutual interlock for bags, knapsacks, items of clothing and the like, comprising a female element and a male element with regions for accommodating magnetic elements for mutual coupling. A particularity consists in that there are provided, on the female element, guiding means for coupling to the male element and, on the male element, mechanical engagement elements which are adapted to contrast the mutual sliding of the male element and the female element.

대표청구항 ▼

A magnetic closure with mutual interlock for bags, knapsacks, items of clothing and the like, comprising a female element and a male element with regions for accommodating magnetic elements for mutual coupling. A particularity consists in that there are provided, on the female element, guiding means

A magnetic closure with mutual interlock for bags, knapsacks, items of clothing and the like, comprising a female element and a male element with regions for accommodating magnetic elements for mutual coupling. A particularity consists in that there are provided, on the female element, guiding means for coupling to the male element and, on the male element, mechanical engagement elements which are adapted to contrast the mutual sliding of the male element and the female element. beam. 25. An X-ray exposure apparatus comprising: an illumination system including (i) a reflection type integrator having plural cylindrical surfaces, each cylindrical surface having a function for transforming an X-ray beam from an X-ray source into an X-ray beam having a section of an arcuate shape, and (ii) a concave mirror for superposing X-ray beams having arcuate sectional shapes, from said reflection type integrator, one upon another on a reflection type mask; and a projection optical system for projecting a pattern of the reflection type mask onto a wafer, by use of X-rays reflected, by the reflection type mask, obliquely with respect to the surface of the refection type mask. 26. An apparatus according to claim 25, further comprising a scanning mechanism for relatively and scanningly moving the mask and an object relative to said projection optical system. 27. An apparatus according to claim 25, further comprising another concave mirror for projecting a parallel X-ray beam onto said integrator. 28. An apparatus according to claim 25, wherein said reflection type integrator provides a secondary light source of X-rays, and said concave mirror has a focal point disposed at the position of said secondary light source. 29. An illumination system according to claim 25, wherein said reflection type integrator has a reflection surface having a multilayered film formed thereon. 30. An illumination system according to claim 25, wherein the X-ray source comprises a laser plasma X-ray source. 31. A device manufacturing method, comprising the steps of: exposing a wafer with a pattern of a reflection type mask, by use of an exposure apparatus which includes (i) an illumination system having (a) a reflection type integrator having plural cylindrical surfaces, each cylindrical surface having a function for transforming an X-ray beam from an X-ray source into an X-ray beam having a section of an arcuate shape, and (b) a concave mirror for superposing X-ray beams having arcuate sectional shapes, from the reflection type integrator, one upon another on the reflection type mask, and (ii) a projection optical system for projecting the pattern of the reflection type mask onto the wafer, by use of X-rays reflected, by the reflection type mask, obliquely with respect to the surface of the reflection type mask; and developing the exposed wafer.