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Inductively coupled plasma source with controllable power deposition 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-007/24
출원번호 US-0544377 (2000-04-06)
발명자 / 주소
  • Barnes, Michael
  • Holland, John
  • Todorov, Valentin
출원인 / 주소
  • Applied Materials Inc.
대리인 / 주소
    Moser, Patterson, Sheridan
인용정보 피인용 횟수 : 34  인용 특허 : 21

초록

Method and apparatus for distributing power from a single power source to a plurality of coils disposed on a processing chamber which provides controllable plasma uniformity across a substrate disposed in the processing chamber. The apparatus for distributing power from a power source to two or more

대표청구항

Method and apparatus for distributing power from a single power source to a plurality of coils disposed on a processing chamber which provides controllable plasma uniformity across a substrate disposed in the processing chamber. The apparatus for distributing power from a power source to two or more

이 특허에 인용된 특허 (21)

  1. Shan Hongching ; Lee Evans Y. ; Welch Michael D. ; Wu Robert W. ; Pu Bryan Y. ; Luscher Paul E. ; Carducci James D. ; Blume Richard, Adjusting DC bias voltage in plasma chamber.
  2. Armacost Michael David ; Wise Richard Stephen, Anisotropic and selective nitride etch process for high aspect ratio features in high density plasma.
  3. Grimbergen Michael ; Pan Shaoher X., Apparatus for monitoring processing of a substrate.
  4. Nuckolls Joe A. (Blacksburg VA), Biasing system for controlling chemical concentration in lamps.
  5. Patrick Roger (Santa Clara CA) Bose Frank (Wettingen CA CHX) Schoenborn Philippe (San Jose CA) Toda Harry (Santa Clara CA), Coil configurations for improved uniformity in inductively coupled plasma systems.
  6. Ye Yan ; Hanawa Hiroji ; Ma Diana Xiaobing ; Yin Gerald Zheyao, Inductively and multi-capacitively coupled plasma reactor.
  7. Sato Arthur H. ; Qian Xue-Yu, Inductively coupled plasma reactor with an inductive coil antenna having independent loops.
  8. Sato Arthur H. ; Qian Xue-Yu, Inductively coupled plasma reactor with an inductive coil antenna having independent loops.
  9. Lymberopoulos Dimitris ; Loewenhardt Peter ; Yamartino John, Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor.
  10. Lymberopoulos Dimitris ; Loewenhardt Peter ; Yamartino John, Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor.
  11. Yang Wenge ; Shen Lewis, Method for etching layers on a semiconductor wafer in a single etching chamber.
  12. Pan Shaoher ; Xu Songlin, Method of etching polycide structures.
  13. Zarowin Charles B. (Rowayton CT) Bollinger L. David (Ridgefield CT), Methods and apparatus for generating a plasma for “downstream”rapid shaping of surfaces of substrates and films.
  14. Gagne Peter H. (Brookfield CT) Morrisroe Peter J. (New Fairfield CT), Plasma emission source.
  15. Collins Kenneth S. ; Roderick Craig A. ; Trow John R. ; Yang Chan-Lon ; Wong Jerry Yuen-Kui ; Marks Jeffrey ; Keswick Peter R. ; Groechel David W. ; Pinson ; II Jay D. ; Ishikawa Tetsuya ; Lei Lawren, Plasma etch processes.
  16. Samukawa Seiji,JPX ; Tsukada Tsutomu,JPX ; Nakagawa Yukito,JPX ; Shinohara Kibatsu,JPX ; Ueyama Hiroyuki,JPX, Plasma generator with a shield interposing the antenna.
  17. Collins Kenneth S. ; Rice Michael ; Trow John ; Buchberger Douglas ; Askarinam Eric ; Tsui Joshua Chiu-Wing ; Groechel David W. ; Hung Raymond, Plasma reactor having an inductive antenna coupling power through a parallel plate electrode.
  18. Ye Yan ; Zhao Xiaoye ; Hsieh Chang-Lin ; Deng Xian-Can,CNX ; Tu Wen-Chiang ; Chu Chung-Fu ; Ma Diana Xiaobing, Post-etch treatment of plasma-etched feature surfaces to prevent corrosion.
  19. Collins Kenneth S. ; Roderick Craig A. ; Trow John R. ; Yang Chan-Lon ; Wong Jerry Yuen-Kui ; Marks Jeffrey ; Keswick Peter R. ; Groechel David W. ; Pinson ; II Jay D. ; Ishikawa Tetsuya,JPX ; Lei La, Process used in an RF coupled plasma reactor.
  20. Gates Duane Charles, Segmented coil for generating plasma in plasma processing equipment.
  21. Collins Kenneth S. (San Jose CA) Roderick Craig A. (San Jose CA) Trow John R. (Santa Clara CA) Yang Chan-Lon (Los Gatos CA) Wong Jerry Y. (Fremont CA) Marks Jeffrey (San Jose CA) Keswick Peter R. (Ne, Silicon scavenger in an inductively coupled RF plasma reactor.

이 특허를 인용한 특허 (34)

  1. Ilic, Milan, Arc recovery with over-voltage protection for plasma-chamber power supplies.
  2. Leray, Gary, Dynamic control band for RF plasma current ratio control.
  3. Veltrop, Robert G.; Chen, Jian J.; Wicker, Thomas E., Inductive plasma processor including current sensor for plasma excitation coil.
  4. Gilbert, James A., Inductively-coupled plasma device.
  5. Gilbert, James A., Inductively-coupled plasma device.
  6. Koo, Il-Gyo; Choi, Myeong Yeol; Collins, Jeremiah H.; Moore, Cameron A.; Rahman, Abdur; Collins, George J., Liquid-gas interface plasma device.
  7. Koo, Il-Gyo; Collins, George J., Liquid-gas interface plasma device.
  8. Singh, Saravjeet; Nangoy, Roy C., Method and apparatus for fast gas exchange, fast gas switching, and programmable gas delivery.
  9. Nangoy, Roy C.; Singh, Saravjeet; Farr, Jon C.; Pamarthy, Sharma V.; Kumar, Ajay, Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor.
  10. Nangoy, Roy C.; Singh, Saravjeet; Farr, Jon C.; Pamarthy, Sharma V.; Kumar, Ajay, Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactor.
  11. Barnes, Michael; Holland, John; Todorov, Valentin; Jain, Mohit; Paterson, Alexander, Method for controlling etch uniformity.
  12. Miller, Paul A.; Aragon, Ben P., Method for generating surface plasma.
  13. Nam, Sang Ki; Dhindsa, Rajinder, Methods and apparatus for correcting for non-uniformity in a plasma processing system.
  14. Kutney, Michael C.; Hoffman, Daniel J.; Delgadino, Gerardo A.; Gold, Ezra R.; Sinha, Ashok; Zhao, Xiaoye; Burns, Douglas H.; Ma, Shawming, Methods to avoid unstable plasma states during a process transition.
  15. Ilic, Milan, Over-voltage protection during arc recovery for plasma-chamber power supplies.
  16. Carter, Daniel C.; Brouk, Victor L., Passive power distribution for multiple electrode inductive plasma source.
  17. Carter, Daniel; Brouk, Victor, Passive power distribution for multiple electrode inductive plasma source.
  18. Howald, Arthur M.; McMillin, Brian; Lin, Frank Yun, Plasma excitation coil.
  19. Holland, John; Todorow, Valentin N.; Barnes, Michael, Plasma reactor having a symmetric parallel conductor coil antenna.
  20. Hoffman, Daniel J.; Lindley, Roger A.; Kutney, Michael C.; Salinas, Martin J.; Tavassoli, Hamid F.; Horioka, Keiji; Buchberger, Jr., Douglas A., Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction.
  21. Koo, Il-Gyo; Moore, Cameron A.; Collins, George J., Plasma-based chemical source device and method of use thereof.
  22. Bulliard, Albert; Fragniere, Benoit; Oehen, Joel, Power supply device for plasma processing.
  23. Bulliard, Albert; Fragniere, Benoit; Oehen, Joel, Power supply device for plasma processing.
  24. Bulliard, Albert; Fragniere, Benoit; Oehen, Joel; Cardou, Olivier, Power supply device for plasma processing.
  25. Bulliard, Albert; Fragnière, Benoit; Oehen, Joël, Power supply device for plasma processing.
  26. Bulliard, Albert; Fragnière, Benoit; Oehen, Joël; Cardou, Olivier, Power supply device for plasma processing.
  27. Morgan, Forrest; Frost, Daryl; Heine, Frank; Pelleymounter, Doug; Walde, Hendrik, Power supply ignition system and method.
  28. Larson, Skip B.; Nauman, Jr., Kenneth E.; Walde, Hendrik; McDonald, R. Mike, Proactive arc management of a plasma load.
  29. Collins, Kenneth S.; Hanawa, Hiroji; Ramaswamy, Kartik; Al-Bayati, Amir; Nguyen, Andrew; Gallo, Biagio, RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor.
  30. Ward, Arlen K.; Sartor, Joe D., System and method for biofilm remediation.
  31. Sartor, Joe D., System and method for sinus surgery.
  32. Koo, Il-Gyo; Moore, Cameron A.; Collins, George J.; Cho, Jin-Hoon, System and methods for plasma application.
  33. Koo, Il-Gyo; Moore, Cameron A.; Collins, George J.; Cho, Jin-Hoon, System and methods for plasma application.
  34. Moore, Cameron A.; Scott, Douglas A.; Collins, George J., System, method and apparatus for generating plasma.
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