[미국특허]
Selective deposition modeling method and apparatus for forming three-dimensional objects and supports
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B29C-035/08
B29C-041/02
B41J-002/01
G06F-017/50
G06F-019/00
출원번호
US-0924433
(2001-08-06)
발명자
/ 주소
Leyden, Richard N.
Thayer, Jeffrey S.
Bedal, Bryan J. L.
Almquist, Thomas A.
Hull, Charles W.
Earl, Jocelyn M.
Kerekes, Thomas A.
Smalley, Dennis R.
Merot, Christian M.
Fedchenko, Richard P.
출원인 / 주소
3D Systems, Inc.
대리인 / 주소
D'Alessandro, Ralph
인용정보
피인용 횟수 :
84인용 특허 :
54
초록▼
A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented
A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.
대표청구항▼
A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented
A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation. anode, a hole transporting layer, a light emitting layer, and electron transporting layer and a cathode comprising fluorescent maleimides of the formula I wherein R1and R2independently from each other stand for wherein Q1stands for hydrogen, halogen, phenyl, --E--C1-C8alkyl, --E-phenyl, wherein phenyl can be substituted up to three times with C1-C8alkyl, halogen, C1-C8alkoxy, diphenylamino, --C=CH--Q2,wherein Q2stands for phenyl, pyridyl, or thiophenyl, which can be substituted up to three times with C1-C8alkyl, halogen, C1-C8alkoxy, --CN, wherein E stands for oxygen or sulfur, and wherein R21stands for C1-C8alkyl, phenyl, which can be substituted up to three times with C1-C4alkyl, C1-C4alkoxy, or dimethylamino, and R22and R23independently from each other stand for hydrogen, R21,C1-C8alkoxy, or dimethylamino, or --NR4R5,wherein R4and R5,independently from each other stand for hydrogen, phenyl, or C1-C8alkyl-carbonyl, or --NR4R5stands for a five- or six-membered ring system, and R3stands for allyl, wherein Q
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