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Method of passivating a gas vessel or component of a gas transfer system using a silicon overlay coating 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65D-085/00
  • C23C-008/06
  • B32B-015/00
출원번호 US-0259656 (1999-02-26)
발명자 / 주소
  • Barone, Gary A.
  • Schuyler, Andy S.
  • Stauffer, Joseph
출원인 / 주소
  • Restek Corporation
대리인 / 주소
    Earley, John F. A.Earley, III, John F. A.Harding, Earley, Follmer & Frailey
인용정보 피인용 횟수 : 37  인용 특허 : 6

초록

A method of passivating the interior surface of a gas storage vessel to protect the surface against corrosion. The interior surface of the vessel is first dehydrated and then evacuated. A silicon hydride gas is introduced into the vessel. The vessel and silicon hydride gas contained therein are heat

대표청구항

A method of passivating the interior surface of a gas storage vessel to protect the surface against corrosion. The interior surface of the vessel is first dehydrated and then evacuated. A silicon hydride gas is introduced into the vessel. The vessel and silicon hydride gas contained therein are heat

이 특허에 인용된 특허 (6)

  1. Liyanage A. Nimal (Chiyoda JPX) Chevrel Henri (Tsukuba JPX) Boireau Alain (Minato JPX) Friedt Jean-Marie (Tokyo JPX), Corrosion resistant welding of stainless steel.
  2. Bourdon Bernard (Orsay FRX), Method for depositing thin layers of materials by decomposing a gas to yield a plasma.
  3. Tanabe Yasuo (Tokyo JPX) Tamura Minoru (Kasukabe JPX), Method for the production of silicon.
  4. Sato Noritada (Yokosuka JPX) Seki Yasukazu (Yokosuka JPX), Process for forming crystalline films by glow discharge.
  5. Li Yao-En (Buffalo Grove IL) Rizos John (Frankfort IL) Kasper Gerhard (Downers Grove IL), Process for passivating metal surfaces to enhance the stability of gaseous hydride mixtures at low concentration in cont.
  6. Hirai Yutaka (Tokyo JPX) Matsuda Hiroshi (Yokohama JPX) Eguchi Ken (Yokohama JPX) Haruta Masahiro (Funabashi JPX) Nishimura Yukuo (Sagamihara JPX) Nakagiri Takashi (Tokyo JPX), Process for producing deposition films.

이 특허를 인용한 특허 (37)

  1. Lagard, Danielle; Reiner, George Allen; Christensen, Gary William, Analysis of the headspace proximate a substrate surface containing fragrance-containing microcapsules.
  2. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  3. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  4. Benesch, Robert; Haouchine, Malik; Jacksier, Tracey, Articles of manufacture containing increased stability low concentration gases and methods of making and using the same.
  5. Sinha, Ashwini K; Smith, Stanley M; Heiderman, Douglas C; Campeau, Serge M, Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation.
  6. Tissandier, Michael D., Chemical detector.
  7. Opalka, Susanne M.; Cordatos, Haralambos, Chemical scavenging component for a fuel system.
  8. Smith, David A.; Mattzela, James B.; Silvis, Paul H.; Barone, Gary A., Chemical vapor deposition coating, article, and method.
  9. Smith, David A.; Silvis, Paul H., Chemical vapor deposition functionalization.
  10. Yuan, Min; Smith, David A.; Silvis, Paul H.; Mattzela, James B., Chemical vapor deposition process and coated article.
  11. Pelletier, Michael T., Controlled coating apparatus, systems, and methods.
  12. Behm, Philip E.; McDermott, Wayne Thomas; Xiao, Manchao; Pearlstein, Ronald Martin; Lo, Sai-Hong A.; Derecskei-Kovacs, Agnes, Cylinder surface treated container for monochlorosilane.
  13. Brambilla, Nicolò Michele; Martini, Fabrizio; Ramachandra, Kavya; Signorelli, Riccardo; Corripio Luna, Oscar Enrique, Energy storage media for ultracapacitors.
  14. Martini, Fabrizio; Brambilla, Nicolo Michele; Signorelli, Riccardo, High power and high energy electrodes using carbon nanotubes.
  15. Brambilla, Nicolò Michele; Signorelli, Riccardo; Martini, Fabrizio; Corripio Luna, Oscar Enrique, In-line manufacture of carbon nanotubes.
  16. Jacksier, Tracey; Benesch, Robert, Increased stability low concentration gases, products comprising same, and methods of making same.
  17. Smith,David A.; Barone,Gary A.; Higgins,Martin E.; Kendall,Bruce R. F.; Lavrich,David J., Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments.
  18. Betz, William R.; Linton, Christopher M., Polysilazane thermosetting polymers for use in chromatographic systems and applications.
  19. Betz, William R.; Linton, Christopher M., Polysilazane thermosetting polymers for use in chromatographic systems and applications.
  20. Betz, William R.; Linton, Christopher M., Polysilazane thermosetting polymers for use in chromatographic systems and applications.
  21. Betz, William R.; Linton, Christopher M., Polysilazane thermosetting polymers for use in chromatographic systems and applications.
  22. Cooley, John J.; Signorelli, Riccardo; Green, Morris; Kuttipillai, Padmanaban Sasthan; Deane, Christopher John Sibbald; Wilhelmus, Lindsay A., Power system for high temperature applications with rechargeable energy storage.
  23. Cooley, John; Signorelli, Riccardo; Green, Morris; Kuttipillai, Padmanaban Sasthan; Deane, Christopher; Wilhelmus, Lindsay A., Power system for high temperature applications with rechargeable energy storage.
  24. Chaubey, Trapti; Chen, Yudong; Gagliano, Robert, Process for decreasing or eliminating unwanted hydrocarbon and oxygenate products caused by Fisher Tropsch Synthesis reactions in a syngas treatment unit.
  25. Chen, Yudong; Monereau, Christian; Chaubey, Trapti; Rodrigues, Guillaume, Process for decreasing or eliminating unwanted hydrocarbon and oxygenate products caused by Fisher Tropsch Synthesis reactions in a syngas treatment unit.
  26. Chaubey, Trapti; Chen, Yudong, Process for decreasing or eliminating unwanted hydrocarbon and oxygenate products caused by Fisher Tropsch synthesis reactions in a syngas treatment unit.
  27. Smith, David A.; Barone, Gary A.; Higgins, Martin E., Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures.
  28. Jacksier, Tracey; Benesch, Robert; Haouchine, Malik, Reactive gases with concentrations of increased stability and processes for manufacturing same.
  29. Jacksier, Tracey; Benesch, Robert; Haouchine, Malik, Reactive gases with concentrations of increased stability and processes for manufacturing same.
  30. Jacksier,Tracey; Benesch,Robert; Kuhn,John, Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions, and processes for manufacturing same.
  31. Jacksier,Tracey; Benesch,Robert; Kuhn,John, Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions, and processes for manufacturing same.
  32. Carney, Kenneth, Sampling device for substance detection instrument.
  33. Mattzela, James B., Semiconductor fabrication process.
  34. Sinha, Ashwini K.; Heiderman, Douglas C.; Brown, Lloyd A.; Campeau, Serge M.; Shih, Robert; Lu, Dragon; Chiu, Wen-Pin; Kao, Chien-Kang, Storage and sub-atmospheric delivery of dopant compositions for carbon ion implantation.
  35. Martin, Joel L.; Askew, Jim B., System and method for reducing fouling in a reactor.
  36. Hasselbrink,Ernest F.; Libardoni,Mark; Stewart, legal representative,Kristine; Waite,J. Hunter; Block,Bruce P.; Sacks, deceased,Richard D., Thermal modulation for gas chromatography.
  37. Hasselbrink,Ernest F.; Libardoni,Mark; Stewart, legal representative,Kristine; Waite,J. Hunter; Block,Bruce P.; Sacks, deceased,Richard D., Thermal modulation for gas chromatography.
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