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Edge bead removal/spin rinse dry (EBR/SRD) module 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/02
출원번호 US-0350212 (1999-07-09)
발명자 / 주소
  • Stevens, Joe
  • Olgado, Donald
  • Ko, Alex
  • Mok, Yeuk-Fai Edwin
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Moser, Patterson & Sheridan
인용정보 피인용 횟수 : 176  인용 특허 : 72

초록

The present invention provides an apparatus for etching a substrate, comprising: a container; a substrate support disposed in the container; a rotation actuator attached to the substrate support; and a fluid delivery assembly disposed in the container to deliver an etchant to a peripheral portion of

대표청구항

The present invention provides an apparatus for etching a substrate, comprising: a container; a substrate support disposed in the container; a rotation actuator attached to the substrate support; and a fluid delivery assembly disposed in the container to deliver an etchant to a peripheral portion of

이 특허에 인용된 특허 (72)

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