Valve assembly for a beverage container, container for beverage and method for filling and emptying a beverage container
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B65B-001/04
B65B-003/00
B67C-003/00
출원번호
US-0743648
(2001-05-04)
우선권정보
NL-19981009654 (1998-07-15)
국제출원번호
PCT/NL99/00454
(1999-07-15)
국제공개번호
WO00/03944
(2000-01-27)
발명자
/ 주소
Timp, Piet Hein Willem
van Baal, Patrick Michael
출원인 / 주소
Heineken Technical Services B.V.
대리인 / 주소
Pearne & Gordon LLP
인용정보
피인용 횟수 :
12인용 특허 :
0
초록▼
Valve assembly for a container for beverage, in particular carbonated beverage such as beer, comprising a housing and a beverage channel with a valve body, wherein operating means are provided for moving the valve body, said operating means comprising: first coupling means for coupling the beverage
Valve assembly for a container for beverage, in particular carbonated beverage such as beer, comprising a housing and a beverage channel with a valve body, wherein operating means are provided for moving the valve body, said operating means comprising: first coupling means for coupling the beverage channel to beverage dispensing means for emptying a container through or along the valve body; and second coupling means for coupling the beverage channel to a filling device for filling a container through or along the valve body.
대표청구항▼
Valve assembly for a container for beverage, in particular carbonated beverage such as beer, comprising a housing and a beverage channel with a valve body, wherein operating means are provided for moving the valve body, said operating means comprising: first coupling means for coupling the beverage
Valve assembly for a container for beverage, in particular carbonated beverage such as beer, comprising a housing and a beverage channel with a valve body, wherein operating means are provided for moving the valve body, said operating means comprising: first coupling means for coupling the beverage channel to beverage dispensing means for emptying a container through or along the valve body; and second coupling means for coupling the beverage channel to a filling device for filling a container through or along the valve body. strate, so that fluid flows therealong to a lower edge of the first shield. 3. The apparatus of claim 2 further comprising a higher pressure region closest to the first side of the substrate, and a lower pressure region closest to the second side of the substrate. 4. The apparatus of claim 2 wherein the first shield has a non-substrate-facing surface having a raised edge closest to the first side of the substrate. 5. The apparatus of claim 1 wherein the first shield is horizontally moveable so as to allow overhead substrate loading and unloading to and from the substrate support. 6. The apparatus of claim 1, wherein the first shield is adapted to reflect the received fluid out of a plane defined by the substrate positioned on the substrate support. 7. The apparatus of claim 1, wherein the first shield comprises a hydrophilic substrate facing surface. 8. A vertical SRD comprising: a substrate support for holding and rotating a vertically oriented substrate; a source of fluid adapted to supply fluid to the surface of a substrate positioned on the substrate support; and at least a first shield positioned to receive fluid displaced from a substrate rotating on the substrate support, and comprising a hydrophilic substrate facing surface. 9. The apparatus of claim 8 wherein the first shield's substrate facing surface is smooth, and is angled from a higher elevation closest to a first side of the substrate to a lower elevation closest to a second side of the substrate so that fluid flows therealong to a lower edge thereof. 10. The apparatus of claim 9 further comprising a higher pressure region closest to the first side of the substrate, and a lower pressure region closest to the second side of the substrate. 11. The apparatus of claim 10 wherein the first shield is adapted to reflect the received fluid away from the substrate positioned on the substrate support. 12. The apparatus of claim 9 wherein the first shield has a non-substrate-facing surface having a raised edge closest to the first side of the substrate. 13. The apparatus of claim 8 wherein the first shield is horizontally moveable so as to allow overhead substrate loading to and from the substrate support. 14. A vertical SRD comprising: a substrate support for holding and rotating a vertically oriented substrate; a source of fluid adapted to supply fluid to the surface of a substrate positioned on the substrate support; and a shield system comprising a plurality of vertically and horizontally staggered shields positioned to receive fluid flung from a substrate rotating on the substrate support, and adapted to carry fluid away from the center axis of the substrate. 15. The apparatus of claim 14 wherein the shield system comprises: a main shield having a substrate facing surface that is angled from a higher elevation closest to a first side of the substrate to a lower elevation closest to a second side of the substrate so that fluid flows therealong to a lower edge of the main shield; and a lower shield positioned at a lower elevation than the main shield, extending from a point beneath the main shield to a point beyond the lower edge of the main shield, and being angled from a higher elevation closest to the lower edge of the main shield, to a lower elevation farthest from the main shield. 16. The apparatus of claim 15 further comprising a higher pressure region closest to the first side of the substrate, and a lower pressure region closest to the second side of the substrate, and wherein the main shield and the lower shield are vertically spaced by a narrow distance such that the flow of gas from the higher pressure region to the lower pressure region assists the travel of fluid along the substrate facing surface of the main shield. 17. The apparatus of claim 16 further comprising: a higher shield positioned at a higher elevation than the main shield, extending from a point above the main shield to a point beyond the higher edge of the main shield an d being angled from a lower elevation closest to the higher edge of the main shield, to a higher elevation farthest from the main shield. 18. The apparatus of claim 17 wherein the main shield and the higher shield are vertically spaced by a narrow distance such that the flow of gas from the higher pressure region to the lower pressure region assists the travel of fluid along a substrate facing surface of the higher shield. 19. The apparatus of claim 17 wherein the main shield and the higher shield are vertically spaced by a narrow distance such that the flow of gas from the higher pressure region to the lower pressure region assists the travel of fluid along a substrate facing surface of the higher shield. 20. The apparatus of claim 15 wherein the non-substrate-facing surface of the main shield has a raised edge closest to the first side of the substrate. 21. The apparatus of claim 20 wherein the non-substrate-facing surface of the lower shield has a raised edge along the edge closest to the main shield. 22. The apparatus of claim 15 wherein the non-substrate-facing surface of the lower shield has a raised edge closest to the main shield. 23. The apparatus of claim 15 wherein the main shield is horizontally moveable so as to allow overhead substrate loading and unloading to and from the substrate support. 24. The apparatus of claim 14 wherein the shield system comprises: a main shield having a substrate facing surface that is angled from a higher elevation closest to a first side of the substrate to a lower elevation closest to a second side of the substrate so that fluid flows therealong to a lower edge of the main shield; and a higher shield positioned at a higher elevation than the main shield, extending from a point above the main shield, to a point beyond the higher edge of the main shield and being angled from a lower elevation closest to the higher edge of the main shield, to a higher elevation farthest from the main shield. 25. A vertical SRD comprising: a substrate support for holding and rotating a vertically oriented substrate; a source of fluid adapted to supply fluid to the surface of a substrate positioned on the substrate support; and a chamber which enclose the substrate support, the chamber having a lid portion that has a slope adapted to cause fluid to flow therealong away from the region above the substrate support. 26. A vertical SRD comprising: a substrate support for holding and rotating a vertically oriented substrate; a source of fluid adapted to supply fluid to the surface of a substrate positioned on the substrate support; and at least a first shield positioned to receive fluid displaced from a substrate rotating on the substrate support, and adapted to reflect the received fluid away from the substrate positioned on the substrate support, the first shield having an inclined substrate-facing surface. 27. The apparatus of claim 26 wherein the first shield has a smooth substrate facing surface that is angled from a higher elevation closest to a first side of the substrate to a lower elevation closest to a second side of the substrate, so that fluid flows therealong to a lower edge of the first shield. 28. The apparatus of claim 27 further comprising a higher pressure region closest to the first side of the substrate, and a lower pressure region closest to the second side of the substrate. 29. The apparatus of claim 27 wherein the first shield has a non-substrate-facing surface having a raised edge closest to the first side of the substrate. 30. The apparatus of claim 26 wherein the first shield is horizontally moveable so as to allow overhead substrate loading and unloading to and from the substrate support. 31. The apparatus of claim 26, wherein the first shield is adapted to reflect the received fluid out of a plane defined by the substrate positioned on the substrate support. 32. The apparatus of claim 26, wherein the first shield comprises a hydrophilic substrate facing surface
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