$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Method of manufacturing spacer, method of manufacturing image forming apparatus using spacer, and apparatus for manufacturing spacer 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-009/24
출원번호 US-0399811 (1999-09-21)
우선권정보 JP-0266965 (1998-09-21); JP-0262674 (1999-09-16)
발명자 / 주소
  • Ito, Nobuhiro
  • Sakai, Kunihiro
  • Fushimi, Masahiro
출원인 / 주소
  • Canon Kabushiki Kaisha
대리인 / 주소
    Fitzpatrick, Cella, Harper & Scinto
인용정보 피인용 횟수 : 30  인용 특허 : 16

초록

This invention has as its object to easily form a low-cost spacer having a low-resistance film (electrode) without using any exhaust device. This invention provides a method of manufacturing a spacer interposed between the first substrate having an image forming member and the second substrate havin

대표청구항

This invention has as its object to easily form a low-cost spacer having a low-resistance film (electrode) without using any exhaust device. This invention provides a method of manufacturing a spacer interposed between the first substrate having an image forming member and the second substrate havin

이 특허에 인용된 특허 (16)

  1. Tsukamoto Takeo (Atsugi JPX) Miyawaki Mamoru (Tokyo JPX) Kaneko Tetsuya (Yokohama JPX) Suzuki Akira (Yokohama JPX) Shimoda Isamu (Zama JPX) Takeda Toshihiko (Tokyo JPX) Okunuki Masahiko (Tokyo JPX), Electron emission device.
  2. Yoshioka Seishiro (Hiratsuka JPX) Nomura Ichiro (Yamato JPX) Suzuki Hidetoshi (Atsugi JPX) Takeda Toshihiko (Tokyo JPX) Kaneko Tetsuya (Yokohama JPX) Banno Yoshikazu (Atsugi JPX) Yokono Kojiro (Yokoh, Electron-emitting device with electron-emitting region insulated from electrodes.
  3. Brodie Ivor (Palo Alto CA) Gernick Henry R. (Pleasanton CA) Holland Christopher E. (Redwood City CA) Moessner Helmut A. (Saratoga CA), Field emission cathode based flat panel display having polyimide spacers.
  4. Roman Daniel,FRX ; Bonnetin Alain,FRX, Glass polyhedrons.
  5. Xie Chenggang, High breakdown field emission device with tapered cylindrical spacers.
  6. Spindt Christopher J. ; Morris David L., Metallized high voltage spacers.
  7. Brodie Ivor (Palo Alto CA) Gurnick Henry R. (Pleasanton CA) Holland Christopher E. (Redwood City CA) Moessner Helmut A. (Saratoga CA), Method for providing polyimide spacers in a field emission panel display.
  8. Lowrey Tyler A. (Boise ID) Doan Trung T. (Boise ID) Cathey David A. (Boise ID) Rolfson J. Brett (Boise ID), Method to form high aspect ratio supports (spacers) for field emission display using micro-saw technology.
  9. Spindt Christopher J. ; Morris David L. ; Fahlen Theodore S. ; Schmid Anthony P. ; Lovoi Paul A., Methods for fabricating a flat panel display having high voltage supports.
  10. Hashemi Amin Hamid (Farmington Hills MI) Heilman David Norman (Monroe MI), Plate glass edge strength.
  11. Koitabashi Noribumi (Yokohama JPX) Ikeda Masami (Yokohama JPX) Sugama Sadayuki (Tsukuba JPX) Asai Naohito (Yokohama JPX) Hirabayashi Hiromitsu (Yokohama JPX) Abe Tsutomu (Isehara JPX) Sato Hiroshi (Y, Replaceable ink cartridge.
  12. Schmid Anthony P. (Solana Beach CA) Spindt Christopher J. (Menlo Park CA) Morris David L. (San Jose CA) Fahlen Theodore S. (San Jose CA) Sun Yu Nan (Sunnyvale CA), Spacer structures for use in flat panel displays and methods for forming same.
  13. Cathey David A. (Boise IA) Yu Chris C. (Boise IA) Doan Trung T. (Boise IA) Lowrey Tyler A. (Boise IA) Rolfson J. Brett (Boise IA), Spacers for field emission display fabricated via self-aligned high energy ablation.
  14. Lowe Anthony (Braishfield GBX), Spacers for flat panel displays.
  15. Cathey David A. (Boise ID) Hofmann James J. (Boise ID) Dynka Danny (Boise ID) Stansbury Darryl M. (Boise ID), Spacers for large area displays.
  16. Spindt Christopher J. (Menlo Park CA) Morris David L. (San Jose CA) Fahlen Theodore S. (San Jose CA) Schmid Anthony P. (Solana Beanch CA) Lovoi Paul A. (Saratoga CA), Structure and operation of high voltage supports.

이 특허를 인용한 특허 (30)

  1. Hsiao,Ming Chun; Lee,Cheng Chung; Chang,Yu Yang, Anodic bonding of spacer for field emission display.
  2. Kawate,Shinichi; Tsukamoto,Takeo, Catalyst used to form carbon fiber, method of making the same and electron emitting device, electron source, image forming apparatus, secondary battery and body for storing hydrogen.
  3. Sutardja, Sehat, Crystal oscillator emulator.
  4. Sutardja, Sehat, Crystal oscillator emulator.
  5. Sutardja, Sehat, Crystal oscillator emulator.
  6. Sutardja, Sehat, Crystal oscillator emulator.
  7. Sutardja, Sehat, Crystal oscillator emulator.
  8. Sutardja, Sehat, Crystal oscillator emulator.
  9. Sutardja, Sehat, Crystal oscillator emulator.
  10. Sutardja, Sehat, Crystal oscillator emulator with externally selectable operating configurations.
  11. Nomura, Kazushi, Electron-emitting device, electron source, image forming apparatus, and electron-emitting apparatus.
  12. Kitamura, Shin; Tsukamoto, Takeo, Electron-emitting device, electron source, image-forming apparatus, and method for producing electron-emitting device and electron-emitting apparatus.
  13. Kitamura,Shin; Tsukamoto,Takeo, Electron-emitting device, electron source, image-forming apparatus, and method for producing electron-emitting device and electron-emitting apparatus.
  14. Kawate, Shinichi; Tsukamoto, Takeo, Electronic device having catalyst used to form carbon fiber according to Raman spectrum characteristics.
  15. Knechtel, Roy, Firm, insulating and electrically conducting connection of processed semiconductor wafers.
  16. Minami, Masaru, Flat display and manufacturing method thereof.
  17. Ito, Nobuhiro; Matsumoto, Mamo; Ishiwata, Kazuya, Hermetic container and manufacturing method of the same.
  18. Ando,Yoichi, Image display apparatus.
  19. Sutardja, Sehat, Integrated circuit package with glass layer and oscillator.
  20. Ito,Nobuhiro, Manufacturing method of electron beam apparatus and spacer, and electron beam apparatus.
  21. Ito, Nobuhiro; Matsumoto, Mamo, Manufacturing method of hermetic container.
  22. Ito, Nobuhiro; Matsumoto, Mamo, Manufacturing method of hermetic container.
  23. Matsumoto, Mamo; Saito, Tomohiro; Ito, Nobuhiro, Manufacturing method of hermetic container.
  24. Matsumoto, Mamo; Saito, Tomohiro; Ito, Nobuhiro, Manufacturing method of hermetically sealed container for holding therein atmosphere of reduced pressure.
  25. Ando, Yoichi; Fushimi, Masahiro, Method for manufacturing spacer for electron source apparatus, spacer, and electron source apparatus using spacer.
  26. Kitamura, Shin; Tsukamoto, Takeo, Method for producing electron-emitting device and electron-emitting apparatus.
  27. Nakata,Kohei, Method for producing spacer and spacer.
  28. Fushimi, Masahiro; Shioya, Yasushi; Shimizu, Yasushi, Method of manufacturing a spacer used in an electron beam generating device, an electron beam generating device using the spacer and image-forming apparatus.
  29. Sutardja, Sehat, Systems and methods for configuring a semiconductor device.
  30. Nozawa, Junichi, Touch panel and touch panel type display device.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로