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특허 상세정보

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내보내기 페이스북 공유 카카오톡 공유

Apparatus and method for treating a cathode material provided on a thin-film substrate

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) H01M-006/00   
미국특허분류(USC) 029/623.1; 429/209; 429/231.95; 429/233
출원번호 US-0730054 (2000-12-05)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Crawford Maunu PLLC
인용정보 피인용 횟수 : 0  인용 특허 : 151
초록
▼

An apparatus and method for treating a cathode material provided on a surface of a continuous thin-film substrate and a treated thin-film cathode having increased smoothness are disclosed. A web of untreated cathode material is moved between a feed mechanism and a take-up mechanism, and passed through a treatment station. The web of cathode material typically includes areas having surface defects, such as prominences extending from the surface of the cathode material. The surface of the cathode material is treated with an abrasive material to reduce the ...

대표
청구항
▼

1. A method of treating a cathode material provided on a surface of a thin-film substrate, comprising: moving the thin-film substrate between a feed mechanism and a take-up mechanism, some of the cathode material including defects protruding from a surface of the cathode material; and treating the cathode material surface at a treatment station with an abrasive material to reduce a height of the defects so as to increase an 85 degree gloss value of the cathode material surface by at least approximately 10. 2. The method of claim 1, wherein treating...

이 특허에 인용된 특허 (151)

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