초록 ▼

A lid and a container using the lid are disclosed, the lid having a central panel of paperboard with a resilient plastic skirt joined about its perimeter. A metal foil membrane having heat activated adhesive layers is attached to the lid and the rim of the container by inductive heating. Detents pro

A lid and a container using the lid are disclosed, the lid having a central panel of paperboard with a resilient plastic skirt joined about its perimeter. A metal foil membrane having heat activated adhesive layers is attached to the lid and the rim of the container by inductive heating. Detents project from an inside surface of the skirt and cooperate with the rim on the container to hold the lid in an open position. A stacking lip extends from the skirt and interfits within an identical lid to allow the lids to be stacked for shipment. A hinge extends transversely across the central panel and divides the lid into movable and fixed portions. Weakened regions on the skirt separate when the lid is opened and provide evidence of potential tampering.

대표청구항 ▼

A lid and a container using the lid are disclosed, the lid having a central panel of paperboard with a resilient plastic skirt joined about its perimeter. A metal foil membrane having heat activated adhesive layers is attached to the lid and the rim of the container by inductive heating. Detents pro

A lid and a container using the lid are disclosed, the lid having a central panel of paperboard with a resilient plastic skirt joined about its perimeter. A metal foil membrane having heat activated adhesive layers is attached to the lid and the rim of the container by inductive heating. Detents project from an inside surface of the skirt and cooperate with the rim on the container to hold the lid in an open position. A stacking lip extends from the skirt and interfits within an identical lid to allow the lids to be stacked for shipment. A hinge extends transversely across the central panel and divides the lid into movable and fixed portions. Weakened regions on the skirt separate when the lid is opened and provide evidence of potential tampering. the substrate, respectively correcting non-linear distortions of the image of the pattern within the projection area of said projection optical system. 5. An exposure apparatus exposing a substrate by projecting an image of a pattern of a mask onto the substrate, comprising: a projection optical system, which is arranged between the mask and the substrate, and which projects the image of the pattern of the mask onto the substrate; and a coma correction plate, which is arranged between the mask and the substrate, which corrects a non-linear coma characteristic of the image of the pattern, comatic aberration of the image of a plurality of positions within the projection area of said projection optical system having a non-linear relation with each other. 6. The exposure apparatus according to claim 5, further comprising a measurement device, which is arranged on an image plane side of said projection optical system, measuring the comatic aberration at each of the plurality of positions within the projection area. 7. The exposure apparatus according to claim 5, further comprising an image plane curvature correction member, which is arranged between the mask and the substrate, correcting non-linear image plane curvatureof the image of the pattern within the projection area of said projection optical system. 8. The exposure apparatus according to claim 5, further comprising: a distortion correction member, which is arranged between the mask and the substrate, respectively correcting non-linear distortions of the image of the pattern within the projection area of said projection optical system. 9. A projection exposure apparatus which scan-exposes a substrate with a pattern on a mask, comprising: a projection optical system having a predetermined image formation characteristic; a driving mechanism which moves the mask and the substrate in a one-dimensional scanning direction relative to said projection optical system; a restricting mechanism that restricts an image of the pattern, which is projected on an image plane side of said projection optical system, to within a projection area having a predetermined width in the one-dimensional scanning direction; and at least one optical correction element which is arranged within said projection optical system, and is optically processed to correct an average vector obtained by averaging image distortion vectors at a plurality of image points existing along the one-dimensional scanning within the projection area at each of a plurality of positions in a non-scanning direction intersecting the one-dimensional scanning direction within the projection area. 10. The apparatus according to claim 9, wherein said optical correction element is arranged in a telecentric space where a principal ray becomes almost vertical to an object plane or an image plane of said projection optical system in an image formation optical path of said projection optical system. 11. The apparatus according to claim 10, wherein said optical correction element is made of a transparent optical glass material arranged at least one of the object plane side and the image plane side, and a surface portion corresponding to the projection area of the transparent optical glass material is optically processed to have a locally different surface shape in order to make the average vector at each of the plurality of positions in the non-scanning direction almost identical. 12. The apparatus according to claim 11, wherein the transparent optical glass material is held in a state of being parallel to the object plane or the image plane of said projection optical system, or a state of being tilted relative to the object plane or the image plane. 13. The apparatus according to claim 11, wherein a surface shape of a surface of the transparent optical glass material is optically and locally processed so that a random error component obtained by removing a linear error component from the avera ge vector at each of the plurality of positions in the non-scanning direction is within ±(Δr/10), if a minimum size of a pattern image which can be resolved on the image plane side through said projection optical system is Δr.