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An electroplating apparatus prevents anode-mediated degradation of electrolyte additives by creating a mechanism for maintaining separate anolyte and catholyte and preventing mixing thereof within a plating chamber. The separation is accomplished by interposing a porous chemical transport barrier be

An electroplating apparatus prevents anode-mediated degradation of electrolyte additives by creating a mechanism for maintaining separate anolyte and catholyte and preventing mixing thereof within a plating chamber. The separation is accomplished by interposing a porous chemical transport barrier between the anode and cathode. The transport barrier limits the chemical transport (via diffusion and/or convection) of all species but allows migration of ionic species (and hence passage of current) during application of sufficiently large electric fields within electrolyte.

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An electroplating apparatus prevents anode-mediated degradation of electrolyte additives by creating a mechanism for maintaining separate anolyte and catholyte and preventing mixing thereof within a plating chamber. The separation is accomplished by interposing a porous chemical transport barrier be

An electroplating apparatus prevents anode-mediated degradation of electrolyte additives by creating a mechanism for maintaining separate anolyte and catholyte and preventing mixing thereof within a plating chamber. The separation is accomplished by interposing a porous chemical transport barrier between the anode and cathode. The transport barrier limits the chemical transport (via diffusion and/or convection) of all species but allows migration of ionic species (and hence passage of current) during application of sufficiently large electric fields within electrolyte. e processor including the coil of claim 6. 8. A vacuum plasma workpiece processor including the coil of claim 1. 9. A radio frequency excitation coil arrangement for a vacuum plasma workpiece processor, the coil arrangement being adapted to be positioned outside a planar window of a vacuum chamber of the processor and in sufficient proximity to the window to couple electromagnetic energy into the chamber through the window, the coil arrangement comprising at least one winding, opposite first and second ends of the winding being planar, the winding when positioned outside the window to couple electromagnetic energy into the chamber being positioned so the opposite ends thereof extend substantially parallel to the planar window, first and second excitation terminals providing connections for current flowing between an RF plasma excitation source and the opposite ends of the winding, a first metal connection structure having a first end connected to the first excitation terminal and a second end connected to the first end of the winding, a second metal connection structure having a first end connected to the second excitation terminal and a second end connected to the second end of the winding, the first and second metal connecting structures extending gradually and smoothly without sharp ends between the ends thereof. 10. The radio frequency excitation coil arrangement of claim 9, wherein the ends of the connection structures connected to the ends of the winding are co-planar with the ends of the winding. 11. The coil of claim 10 in combination with a vacuum plasma workpiece processor including a vacuum chamber having a planar window, the window being positioned outside the planar window as stated in claim 10. 12. The radio frequency excitation coil arrangement of claim 9 wherein the winding includes at least one planar turn, the winding when positioned outside the window to couple electromagnetic energy into the chamber being positioned so the planar turn extends substantially parallel to the planar window, the winding including a segment stacked with respect to a portion of the planar turn, the stacked segment being displaced from the plane of the planar turn, the stacked segment having a first end, the planar turn having a first end, a third metal connection structure having first and second ends respectively connected to the first end of the stacked segment and to the first end of the planar turn, the third metal connecting structure extending gradually and smoothly without sharp bends between the ends thereof. 13. The coil of claim 12 in combination with a vacuum plasma workpiece processor including a vacuum chamber having a planar window, the coil being positioned outside the planar window as stated in claim 11. 14. The coil of claim 9 in combination with a vacuum plasma workpiece processor including a vacuum chamber having a planar window, the coil being positioned outside the planar window as stated in claim 9. 15. A radio frequency excitation coil for a vacuum plasma workpiece processor, the coil being arranged to be positioned above a window of a vacuum chamber of the processor, the coil comprising at least one winding having multiple turns, at least one of the turns being substantially planar, a segment of the at least one winding being stacked with only a portion of the planar turn so the segment is spaced from the plane of the planar turn, the stacked segment being connected with the planar turn, a metal connection structure having first and second ends respectively connected to a first portion of the planar turn and an end of the stacked segment, the connection structure being arranged so it extends gradually and smoothly without sharp bends between the first and second ends thereof. 16. The coil of claim 15 wherein the first portion of the planar turn is at a first end of the planar turn. 17. The coil of claim 16 wherein the stacked segment extends across an interconnection gap between two planar turns of the wind ing and in opposite directions from the gap. 18. The coil of claim 17 wherein the metal connection structure loops from the first end of the planar turn away from the gap. 19. The coil of claim 17 wherein the metal connection structure loops from the first end of the planar turn away from the gap so it extends in a direction away from the gap to a point that is farther from the gap than the end of the stacked segment. 20. The coil of claim 19 wherein the second end of the metal connection structure extends tangentially relative to the end of the stacked segment. 21. The coil of claim 10 in combination with a vacuum plasma workpiece processor including a vacuum chamber having a planar window, the coil being positioned outside the planar window as stated in claim 10. 22. A radio frequency excitation coil for a vacuum plasma workpiece processor, the coil being arranged to be positioned above a window of a vacuum chamber of the processor, the coil comprising at least one winding having multiple turns, at least one of the turns being substantially planar, a segment stacked with a portion of the planar turn so it is spaced from the plane of the planar turn, the stacked segment of the at least one winding being connected with the planar turn, the planar turn including first and second end portions that are spatially close to each other and spaced by a gap from each other, the stacked segment extending across the gap so first and second ends of the stacked segment are on opposite sides of the gap. 23. The coil of claim 22 wherein the first and second ends of the stacked segment are displaced by approximately equal angles from the gap. 24. The coil of claim 22 wherein the first and second ends of the stacked segment are arranged so the second end has an angular displacement from the gap that is substantially greater than the angular displacement from the gap of the first end. 25. The coil of claim 22 wherein the stacked segment is arranged and the first end thereof is connected to the first end of the planar turn for causing current to flow between the first end of the stacked segment and a portion of the stacked segment overlying the gap in the same direction that current flows in the planar turn between a portion of the planar turn overlaid by the first end of the stacked segment and the first end of the planar turn. 26. The coil of claim 25 wherein the connection between the first end of the planar turn and the first end of the stacked segment is provided by a connecting structure that extends gradually and smoothly without sharp bends between the first end of the planar turn and the first end of the stacked segment. 27. The coil of claim 26 wherein the connecting structure is arranged for causing current in a first portion thereof extending spatially between the first end of the planar turn and a region above the plane of the planar turn aligned with the first end of the stacked segment to flow in a direction opposite to the direction of current flow in the planar turn between the portion of the planar turn overlaid by the first end of the stacked segment and the first end of the planar turn. 28. The coil of claim 26 wherein the connecting structure and the stacked segment are arranged for causing current to flow therein in the same direction as current flows in the portions of the planar turn that are overlaid by the connecting structure and the stacked segment on both sides of the gap. 29. The coil of claim 25 wherein the connection between the first end of the planar turn and the first end of the stacked segment is provided by a connecting structure, the connecting structure being arranged for causing current in a first portion thereof extending spatially between the first end of the planar turn and a region above the plane of the planar turn aligned with the first end of the stacked segment to flow in a direction opposite to the direction of current flow in the planar turn between the portion of the planar turn overlaid by the