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Hollow cathode array for plasma generation 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-007/24
출원번호 US-0856753 (2001-05-21)
국제출원번호 PCT/US99/28841 (1999-12-06)
국제공개번호 WO00/34979 (2000-06-15)
발명자 / 주소
  • Chen, Jyh-Hong Eric
  • Lin, Tyau-Jeen
출원인 / 주소
  • E. I. du Pont de Nemours and Company
인용정보 피인용 횟수 : 36  인용 특허 : 8

초록

A cathode assembly is described for use in the creation of a discharge plasma. The cathode comprises a plurality of electrically conductive hollow plasma generating cells in a cylindrically-shaped array, the cells being electrically connected to each other. The plasma generated can be used to modify

대표청구항

A cathode assembly is described for use in the creation of a discharge plasma. The cathode comprises a plurality of electrically conductive hollow plasma generating cells in a cylindrically-shaped array, the cells being electrically connected to each other. The plasma generated can be used to modify

이 특허에 인용된 특허 (8)

  1. Nagashima Kazufumi,JPX ; Shima Hideaki,JPX, Apparatus for and method of manufacturing plastic container coated with carbon film.
  2. Brown Robert W. (Ivanhoe AUX) Coopes Ian H. (Camberwell AUX) Fusca Joseph (Macleod West AUX) Gifkins Kenneth J. (Victoria AUX) Irvin John A. (Applecross AUX), Apparatus for plasma treatment of continuous material.
  3. Schoenbach Karl H. (Norfolk VA) Byszewski Wojciech W. (Boston MA) Peterkin Frank E. (Norfolk VA) Dharamsi Amin N. (Virginia Beach VA), Discharge device having cathode with micro hollow array.
  4. Jansen Frank (Walnut Creek CA) Krommenhoek Steven K. (Madison NJ) Belkind Abraham I. (North Plainfield NJ) Orban ; Jr. Zoltan (Franklin Park NJ), Hollow cathode array and method of cleaning sheet stock therewith.
  5. Bumble Bruce (Croton-on-Hudson NY) Cuomo Jerome J. (Lake Lincolndale NY) Logan Joseph S. (Poughkeepsie NY) Rossnagel Steven M. (White Plains NY), Hollow cathode enhanced plasma for high rate reactive ion etching and deposition.
  6. Gorin Georges J. (Emeryville CA) Hoog Josef T. (Novato CA), Plasma reactor apparatus.
  7. Mackowski Jean M. (Villeurbanne FRX), Process for depositing a thin layer of a material on the wall of a hollow body.
  8. Mundt Randall S. ; Kerr David R. ; Lenz Eric Howard, Topology induced plasma enhancement for etched uniformity improvement.

이 특허를 인용한 특허 (36)

  1. Hudson, Eric; Fischer, Andreas, Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber parts.
  2. Hudson, Eric; Fischer, Andreas, Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber parts.
  3. DeVries, Hindrik Willem; Bouwstra, Jan Bastiaan; Aldea, Eugen; Van De Sanden, Mauritius Cornelius Maria, Arrangement, method and electrode for generating a plasma.
  4. Rueger, Neal; Kramer, Stephen J., Assemblies for plasma-enhanced treatment of substrates.
  5. Suslov, Nikolay, Cathode assembly and method for pulsed plasma generation.
  6. Bainbridge, David W., Composite materials made from pretreated, adhesive coated beads.
  7. Denpoh, Kazuki; Ventzek, Peter L G; Xu, Lin; Chen, Lee, Hollow cathode device and method for using the device to control the uniformity of a plasma process.
  8. Denpoh, Kazuki; Ventzek, Peter L G; Xu, Lin; Chen, Lee, Hollow cathode device and method for using the device to control the uniformity of a plasma process.
  9. Chambers, John; Maschwitz, Peter, Hollow cathode ion source.
  10. Chambers, John; Maschwitz, Peter, Method of producing plasma by multiple-phase alternating or pulsed electrical current.
  11. Rueger, Neal R.; Kramer, Stephen J., Methods of forming plasma-generating structures; methods of plasma-assisted etching, and methods of plasma-assisted deposition.
  12. Suslov, Nikolay, Methods of sealing vessels using plasma.
  13. Sawyer,Daniel C.; Bowman,Lewis A.; Colonna,Renald W; Comperatore,Corey D, Multi-layered sports playing field with a water draining, padding layer.
  14. Chambers, John; Maschwitz, Peter, Plasma device driven by multiple-phase alternating or pulsed electrical current.
  15. Koshimizu, Chishio; Denpoh, Kazuki, Plasma processing apparatus having hollow electrode on periphery and plasma control method.
  16. Maschwitz, Peter, Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition.
  17. Maschwitz, Peter, Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition.
  18. Maschwitz, Peter, Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition.
  19. Maschwitz, Peter, Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition.
  20. Maschwitz, Peter, Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition.
  21. Nam, Sang Ki; Cho, Tae Seung; Godet, Ludovic; Nemani, Srinivas D., Plasma uniformity control by arrays of unit cell plasmas.
  22. Suslov, Nikolay, Plasma-generating device having a plasma chamber.
  23. Suslov, Nikolay, Plasma-generating device having a throttling portion.
  24. Suslov, Nikolay; Rubiner, Igor, Plasma-generating device, plasma surgical device and use of a plasma surgical device.
  25. Suslov, Nikolay; Rubiner, Igor, Plasma-generating device, plasma surgical device and use of a plasma surgical device.
  26. Suslov, Nikolay, Plasma-generating device, plasma surgical device and use of plasma surgical device.
  27. Suslov, Nikolay, Plasma-generating device, plasma surgical device, use of a plasma-generating device and method of generating a plasma.
  28. Rueger, Neal R.; Kramer, Stephen J., Plasma-generating structures and display devices.
  29. Rueger, Neal R.; Kramer, Stephen J., Plasma-generating structures, display devices, and methods of forming plasma-generating structures.
  30. Suslov, Nikolay, Pulsed plasma device and method for generating pulsed plasma.
  31. Suslov, Nikolay, Pulsed plasma device and method for generating pulsed plasma.
  32. Drouin, Jr., Donald V.; Schwimley, Scott Lee, Systems and methods for alleviating aircraft loads with plasma actuators.
  33. Miles, Richard B.; Macheret, Sergey O.; Shneider, Mikhail; Likhanskii, Alexandre; Silkey, Joseph Steven, Systems and methods for controlling flows with electrical pulses.
  34. Silkey, Joseph S.; Smereczniak, Philip, Systems and methods for controlling flows with pulsed discharges.
  35. Silkey, Joseph S.; Smereczniak, Philip, Systems and methods for controlling flows with pulsed discharges.
  36. Suslov, Nikolay, Volumetrically oscillating plasma flows.
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