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Methods for cleaning surfaces substantially free of contaminants 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-001/00
출원번호 US-0636265 (2000-08-10)
발명자 / 주소
  • Ahmadi, Goodarz
  • Lewis, Paul E.
  • Tannous, Adel George
  • Makhamreh, Khalid
  • Compton, Keith H.
출원인 / 주소
  • Nanoclean Technologies Inc
대리인 / 주소
    Loudermilk & Associates
인용정보 피인용 횟수 : 32  인용 특허 : 42

초록 ▼

A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The nozzle is driven in an oscillatory manner at a predetermined amplitude and frequency

대표청구항 ▼

A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The nozzle is driven in an oscillatory manner at a predetermined amplitude and frequency

이 특허에 인용된 특허 (42)

  1. Hashish Mohamed (Kent WA) Marvin Mark (Tacoma WA), Abrasive swivel assembly and method.
    상세보기
  2. Kosic Thomas J., Apparatus and method for cleaning large glass plates using linear arrays of carbon dioxide (CO.sub.2) jet spray nozzles.
    상세보기
  3. Ogawa Mitsuhiro (Yao JPX) Ouno Toshiki (Fukuoka JPX) Ejima Taizou (Fukuoka JPX) Kotou Satoru (Amagasaki JPX), Apparatus and method for cleaning semiconductor wafers.
    상세보기
  4. Whitlock Walter H. (Peapack NJ) Weltmer ; Jr. William R. (Murray Hill NJ) Clark James D. (Mountainside NJ), Apparatus and method for removing minute particles from a substrate.
    상세보기
  5. Brandt Werner V. ; Bowers Charles W., Apparatus for cleaning and testing precision components of hard drives and the like.
    상세보기
  6. Yie Gene G., Apparatus for generating oscillating fluid jets.
    상세보기
  7. Shepherd John D., Apparatus for rapid repetitive motion of an ultra high pressure liquid stream.
    상세보기
  8. McDermott Wayne T. (Allentown PA) Wu Jin J. (Ossining NY) Ockovic Richard C. (Northampton PA), Apparatus to clean solid surfaces using a cryogenic aerosol.
    상세보기
  9. Goenka Lakhi N. (Ann Arbor MI), CO2 nozzle and method for cleaning pressure-sensitive surfaces.
    상세보기
  10. Kotani Hiroyuki,JPX ; Urai Naoki,JPX ; Akaki Tetsuji,JPX ; Ueno Tamotsu,JPX, Carbon dioxide gas laser oscillation apparatus.
    상세보기
  11. Kosic Thomas J., Carbon dioxide jet spray disk cleaning system.
    상세보기
  12. Krone-Schmidt Wilfried, Carbon dioxide jet spray pallet cleaning system.
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  13. Brandt Elwood Steven ; Simpson Brian A., Carbon dioxide jet spray polishing of metal surfaces.
    상세보기
  14. Borden Michael R. ; Kosic Thomas J., Carbon dioxide liquid and gas sensor apparatus for use with jet spray cleaning systems.
    상세보기
  15. Henzler Gregory W. (Naperville IL), Carbon dioxide pellet blast and carrier gas system.
    상세보기
  16. Goffnett David M. (Alma MI) Richardson Mark D. (Hemlock MI) Bielby Eugene F. (Saginaw MI), Cleaning of CVD reactor used in the production of polycrystalline silicon by impacting with carbon dioxide pellets.
    상세보기
  17. Treiber John H. (Huntington Beach CA), Closed-loop multistage system for cleaning printed circuit boards.
    상세보기
  18. Bowers Charles W., Electrostatic discharge protection of static sensitive devices cleaned with carbon dioxide spray.
    상세보기
  19. Matossian Jesse N. ; Williams John D. ; Krone-Schmidt Wilfried, Heat treatment by plasma electron heating and solid/gas jet cooling.
    상세보기
  20. Zito Richard R., High dispersion carbon dioxide snow apparatus.
    상세보기
  21. Bowers Charles W., Integrated circuit chip module cleaning using a carbon dioxide jet spray.
    상세보기
  22. Chao Sidney C. ; Purer Edna M. ; Sorbo Nelson W., Liquid carbon dioxide cleaning using jet edge sonic whistles at low temperature.
    상세보기
  23. Townsend Carl W. (Los Angeles CA) Purer Edna M. (Los Angeles CA), Liquid carbon dioxide dry cleaning system having a hydraulically powered basket.
    상세보기
  24. Jon Min-Chung (Princeton Junction NJ) Nicholl Hugh (Berthoud CO) Read Peter Hartpence (Morrisville PA), Method and apparatus for CO2 cleaning with mitigated ESD.
    상세보기
  25. Gasparrini Charles R. (Portchester NY), Method and apparatus for carbon dioxide cleaning of graphic arts equipment.
    상세보기
  26. Bingham Dennis N. (Idaho Falls ID), Method and apparatus for cutting and abrading with sublimable particles.
    상세보기
  27. Bingham Dennis N. ; Swainston Richard C. ; Palmer Gary L., Method and apparatus for cutting, abrading, and drilling with sublimable particles and vaporous liquids.
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  28. Neese Edward D. ; Kullen Peter S. ; Valentine Eugene, Method and apparatus for removing coatings and oxides from substrates.
    상세보기
  29. Jepsen Erik Lund,DKX, Method and apparatus for the cleaning of closed compartments.
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  30. Sneed John D. (Long Beach CA) Krone-Schmidt Wilfried (Fullerton CA) Slattery Michael J. (Gardena CA) Bowen Howard S. (Los Angeles CA), Method for cleaning surface by heating and a stream of snow.
    상세보기
  31. Lloyd Daniel L. (Mason OH), Method for removal of surface coatings.
    상세보기
  32. Smith ; Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA), Method of cleaning workpiece with solvent and then with liquid carbon dioxide.
    상세보기
  33. Goenka Lakhi Nandlal, Method of mitigating electrostatic charge during cleaning of electronic circuit boards.
    상세보기
  34. Douglas Monte A. (Coppell TX) Wallace Robert M. (Dallas TX), Method of unsticking components of micro-mechanical devices.
    상세보기
  35. Goenka Lakhi N. (Ann Arbor MI), Nozzle for enhanced mixing in CO2 cleaning system.
    상세보기
  36. Heyns Garrett J. (Boulder CO) McClure Terry R. (Kersey CO) Nicholl Hugh (Berthoud CO) Read Peter H. (Morrisville PA) Schulte Steven M. (Westminster CO) Tabrizi Mohammad F. (Westminster CO), Probemat cleaning system using CO2 pellets.
    상세보기
  37. Bowen Howard S. ; Lee Richard M. ; Bowen John H., Solid/gas carbon dioxide spray cleaning system.
    상세보기
  38. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Allentown PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Millwood NY) Schwarz Alexander (Allentown PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using a cryogenic aerosol.
    상세보기
  39. Peterson Ronald V. (Thousand Oaks CA) Krone-Schmidt Wilfried (Fullerton CA), System for precision cleaning by jet spray.
    상세보기
  40. Patrin John C. ; Heitzinger John M., Treating substrates by producing and controlling a cryogenic aerosol.
    상세보기
  41. Bowers Charles W., Wafer cassette cleaning using carbon dioxide jet spray.
    상세보기
  42. Borden Michael R. ; Kosic Thomas J. ; Bowers Charles W., Wafer cleaning using a laser and carbon dioxide snow.
    상세보기

이 특허를 인용한 특허 (32)

  1. Ulrich, Robert; Pritchard, Eric K., Adaptive nozzle system for high-energy abrasive stream cutting.
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  2. Ravkin,Mike; Boyd,John; Dordi,Yezdi N.; Redeker,Fred C.; de Larios,John M., Apparatus and method for depositing and planarizing thin films of semiconductor wafers.
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  3. Jackson,David P., Apparatus to treat and inspect a substrate.
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  4. Seasly, Elaine E.; Seasly, Zachariah A., Automated non-contact cleaning.
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  5. Korolik, Mikhail; de Larios, John M.; Ravkin, Mike; Farber, Jeffrey, Controls of ambient environment during wafer drying using proximity head.
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  6. Cheng, Wing Lau; Cheng, legal representative, Helen; Kholodenko, Arnold, Hybrid composite wafer carrier for wet clean equipment.
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  7. Compen, Rene Theodorus Petrus; Ottens, Joost Jeroen, Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus.
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  8. Woods,Carl; Garcia,James P.; de Larios,John, Meniscus, vacuum, IPA vapor, drying manifold.
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  9. Ravkin, Mike; Korolik, Mikhail; Wilcoxson, Mark, Method and apparatus for atomic layer deposition (ALD) in a proximity system.
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  10. Boyd,John M.; Ravkin,Mike; Redeker,Fred C.; de Larios,John, Method and apparatus for cleaning a substrate using megasonic power.
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  11. de Larios,John M.; Ravkin,Mike; Woods,Carl; Redeker,Fritz; Garcia,James P.; Nickhou,Afshin, Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces.
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  12. Magni, Enrico; Lenz, Eric, Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer.
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  13. Ravkin,Michael; Smith,Michael G. R.; de Larios,John M.; Redeker,Fritz; Korolik,Mikhail; DiPietro,Christian, Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer.
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  14. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
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  15. Boumerzoug,Mohamed; Tannous,Adel George, Methods for residue removal and corrosion prevention in a post-metal etch process.
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  16. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
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  17. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
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  18. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
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  19. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
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  20. Mikhaylichenko, Katrina; deLarios, John, Proximity head heating method and apparatus.
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  21. Ravkin, Michael; de Larios, John M.; Redeker, Fred C.; Korolik, Mikhail; Freer, Erik M., Proximity head with angled vacuum conduit system, apparatus and method.
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  22. Woods,Carl; Smith,Michael G. R.; Parks,John; Garcia,James P.; de Larios,John M., Proximity meniscus manifold.
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  23. Ravkin, Michael; de Larios, John M.; Korolik, Mikhail; Smith, Michael G. R.; Woods, Carl, Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same.
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  24. Lenz, Eric, Reclaim chemistry.
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  25. Ravkin, Mike; Kabansky, Alex; de Larios, John, Single phase proximity head having a controlled meniscus for treating a substrate.
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  26. Woods, Carl, Substrate meniscus interface and methods for operation.
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  27. Woods,Carl; Smith,Michael G. R.; Parks,John, Substrate proximity processing housing and insert for generating a fluid meniscus.
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  28. Woods,Carl; de Larios,John, System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold.
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  29. Boyd, John M.; Redeker, Fred C., System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology.
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  30. O'Donnell, Robert; Lin, Cheng-Yu (Sean); Kholodenko, Arnold, System, method and apparatus for maintaining separation of liquids in a controlled meniscus.
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  31. Panuska,Brian R.; Hammer,Joseph; Hammer,Ronald; Bachman,Wesley, Variable rate dispensing system for abrasive material and method thereof.
    상세보기
  32. Yun, Seokmin; Boyd, John M.; de Larios, John M.; Redeker, Fritz, Wafer edge surface treatment with liquid meniscus.
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