IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0533254
(2000-03-23)
|
우선권정보 |
KR-0045506 (1999-10-20); KR-0045507 (1999-10-20); KR-0045508 (1999-10-20); KR-0045509 (1999-10-20); KR-0045510 (1999-10-20) |
발명자
/ 주소 |
- Kim, Byung Hwan
- Lee, Kyoo Han
- Kim, Jeong Woo
|
출원인 / 주소 |
- Daewoo Electronics Corporation
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
10 인용 특허 :
2 |
초록
▼
A noise reduction device has a side branch silencer. The side branch silencer is formed within a discharge valve assembly which includes is divided into a discharge muffler, a gasket, a discharge valve piece and a valve plate. The side branch silencer is provided with a cutout formed through the gas
A noise reduction device has a side branch silencer. The side branch silencer is formed within a discharge valve assembly which includes is divided into a discharge muffler, a gasket, a discharge valve piece and a valve plate. The side branch silencer is provided with a cutout formed through the gasket to communicate with a discharge passage formed through the gasket. The cutout is blocked vertically by both a lower surface of a muffler plate of the discharge muffler and an upper surface of the discharge valve piece.
대표청구항
▼
A noise reduction device has a side branch silencer. The side branch silencer is formed within a discharge valve assembly which includes is divided into a discharge muffler, a gasket, a discharge valve piece and a valve plate. The side branch silencer is provided with a cutout formed through the gas
A noise reduction device has a side branch silencer. The side branch silencer is formed within a discharge valve assembly which includes is divided into a discharge muffler, a gasket, a discharge valve piece and a valve plate. The side branch silencer is provided with a cutout formed through the gasket to communicate with a discharge passage formed through the gasket. The cutout is blocked vertically by both a lower surface of a muffler plate of the discharge muffler and an upper surface of the discharge valve piece. on, 141/059; US-5868175, 19990200, Duff et al., 141/059; US-5878790, 19990300, Janssen, 141/059; US-5889202, 19990300, Alapati et al., 073/064.45; US-5898108, 19990400, Mieczkowski et al., 073/118.1; US-5911248, 19990600, Keller, 141/059; US-5913343, 19990600, Andersson, 141/059; US-5942980, 19990800, Hoben et al., 340/618; US-5944067, 19990800, Andersson, 141/059; US-5956259, 19990900, Hartsell, Jr. et al., 364/528.37; US-5988232, 19991100, Koch et al., 141/059; US-5992395, 19991100, Hartsell, Jr. et al., 123/516; US-6026866, 20000200, Nanaji, 141/059; US-6037184, 20000300, Matilainen et al., 436/177; US-6038922, 20000300, Mauze et al., 073/335.08; US-6047745, 20000400, Fournier, 141/059; US-6065507, 20000500, Nanaji, 141/059; US-6070453, 20000600, Myers, 073/040.5R; US-6082415, 20000700, Rowland et al., 141/059; US-6102085, 20000800, Nanaji, 141/083; US-6103532, 20000800, Koch et al., 436/055; US-
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