초록

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a diamond containing surface and process for manufacture thereof.

대표청구항 ▼

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a diamond containing surface and process for manufacture thereof. about 4.5 parts per million soluble phosphorus and at least about 40 percent by volume alum-containing residual solids; and tops

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a diamond containing surface and process for manufacture thereof. about 4.5 parts per million soluble phosphorus and at least about 40 percent by volume alum-containing residual solids; and topsoil components. 13. The blended topsoil of claim 12, wherein the alum-containing water treatment residual comprises at least about 55 percent by volume alum-containing residual solids. 14. The blended topsoil of claim 12, wherein the blended topsoil comprises up to about 50 percent by volume alum-containing water treatment residual. 15. The blended topsoil of claim 12, further comprising: less than 50,00 mg of aluminum per kilogram of said blended topsoil; less than 60 mg of copper per kilogram of said bleded topsoil; less than 50 mg of lead per kilogram of said blended topsoil; less than 100 mg of zinc per kilogram of said blended topsoil; and less than 1,000 mg of manganese per kilogram of said blended topsoil. 16. The blended topsoil of claim 12 having a pH greater than or equal to 5.5. 17. The blended topsoil of claim 12, wherein the alum-containing water treatment residual comprises at least about 4.5 parts per million soluble phosphorus without supplemental fertilization. 18. A method for producing a blended topsoil comprising the steps of: subjecting alum-containing water treatment residual produced by a water treatment facility to dewatering and at least one process selected from the group consisting of conditioning by aging and periodic turning, until the residual is at least about 40 volume percent alum-containing residual solid material and has a soluble phosphorus level of at least about 4.5 parts per million; and blending said alum-containing water treatment residual with at least one topsoil component to produce a blended topsoil containing up to about 50 percent alum-containing water treatment residual by volume. 19. The method of claim 18, further comprising the steps of: testing said blended topsoil for the levels of aluminum, copper, lead, zinc, and manganese; testing said blended topsoil for a pH of at least 5.5; and adjusting the percentage of alum-containing water treatment residual blended with said at least one topsoil component such that the pH level of said blended topsoil is greater than or equal to 5.5, and concentrations of trace elements are below the following levels: less than 50,000 mg of aluminum per kilogram of said blended topsoil; less than 60 mg of copper per kilogram of said blended topsoil; less than 50 mg of lead per kilogram of said blended topsoil; less than 100 mg of zinc per kilogram of said blended topsoil; and less than 1,000 mg of manganese per kilogram of said blended topsoil. 20. The method of claim 19, additionally comprising testing the concentration of at least one trace element selected from the group consisting of arsenic, barium, beryllium, boron, bromine, cadmium, calcium, cesium, chlorine, chromium, cobalt, fluorine, gallium, germanium, iodine, iron, lanthanum, lithium, magnesium, mercury, molybdenum, nickel, nitrogen, potassium, rubidium, scandium, selenium, silicon, silver, sodium, strontium, tin, titanium, vanadium, yttrium, and zirconium; and comparing said concentration of at least one trace element to a predetermined level. 21. The method of claim 18, further comprising the steps of: testing said alum-containing water treatment residual for concentrations of trace elements other than phosphorus; and testing said alum-containing water treatment residual for a pH level of at least 6. 22. The method of claim 18, wherein the alum-containing water treatment residual subjected to dewatering and at least one process selected from the group consisting of conditioning by aging and periodic turning, has a soluble phosphorus level of at least about 4.5 parts per million without supplemental fertilization. 23. An alum-containing water treatment residual comprising at least about 40 percent by volume alum-containing residual solid material, wherein said alum-containing water treatment residual does not bind nutrie