IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0862039
(2001-05-21)
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발명자
/ 주소 |
- Glynn, Christopher Charles
- Wallace, Thomas Tracy
- Dickman, Ronald Arthur
- Shelton, Monty Lee
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출원인 / 주소 |
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대리인 / 주소 |
Young, Rodney M.Conte, Francis L.
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인용정보 |
피인용 횟수 :
16 인용 특허 :
2 |
초록
▼
A turbine cooling circuit includes a flow sleeve having an aft end for adjoining the rim of a turbine disk. A seal rotor is spaced from the aft end adjacent a row of inlet holes. An inducer has an outlet disposed radially outwardly from the sleeve inlet holes. And, a seal stator surrounds the seal r
A turbine cooling circuit includes a flow sleeve having an aft end for adjoining the rim of a turbine disk. A seal rotor is spaced from the aft end adjacent a row of inlet holes. An inducer has an outlet disposed radially outwardly from the sleeve inlet holes. And, a seal stator surrounds the seal rotor to define a rotary seal disposed radially inwardly from the inducer outlet.
대표청구항
▼
A turbine cooling circuit includes a flow sleeve having an aft end for adjoining the rim of a turbine disk. A seal rotor is spaced from the aft end adjacent a row of inlet holes. An inducer has an outlet disposed radially outwardly from the sleeve inlet holes. And, a seal stator surrounds the seal r
A turbine cooling circuit includes a flow sleeve having an aft end for adjoining the rim of a turbine disk. A seal rotor is spaced from the aft end adjacent a row of inlet holes. An inducer has an outlet disposed radially outwardly from the sleeve inlet holes. And, a seal stator surrounds the seal rotor to define a rotary seal disposed radially inwardly from the inducer outlet. r said substrates in said processing chamber; a preliminary chamber which is to be charged with inert gas; and a substrate transferring apparatus for transferring, in said preliminary chamber, said substrate or said substrates between said substrate supporting member and a cassette which accommodates said substrate or said substrates, wherein said cassette is allowed to be inserted into said preliminary chamber through a lower wall of said preliminary chamber from below. 11. The substrate processing apparatus according to claim 10, wherein said lower wall of said preliminary chamber is a bottom wall of said preliminary chamber. 12. The substrate processing apparatus according to claim 10, wherein an inside surface of said preliminary chamber is adjacent to said substrate transferring apparatus both above and below said substrate transferring apparatus such that a volume of said inert gas needed to fill said preliminary chamber is reduced. 13. The substrate processing apparatus according to claim 10, wherein said preliminary chamber has a cassette port through which said cassette is inserted into said preliminary chamber. 14. The substrate processing apparatus according to claim 13, further comprising a gas injection tube provided in said preliminary chamber which injects additional inert gas toward said cassette port. 15. The substrate processing apparatus according to claim 14, wherein said gas injection tube injects said additional inert gas only when said cassette is transferred through said cassette port. 16. The substrate processing apparatus according to claim 13, further comprising a shutter for covering said cassette port when said cassette is outside of said preliminary chamber. 17. The substrate processing apparatus according to claim 13, further comprising a cassette elevator having a cap for covering said cassette port when said cassette is inside of said preliminary chamber, wherein said cassette is inserted into said preliminary chamber from below by said cassette elevator. 18. A substrate processing apparatus, comprising: a preliminary chamber; and a substrate transferring apparatus disposed in said preliminary chamber for transferring substrate or substrates in and out of a cassette which accommodates said substrate or said substrates, wherein said cassette is allowed to be inserted into said preliminary chamber through a lower wall of said preliminary chamber from below. 19. The substrate processing apparatus according to claim 18, wherein said lower wall of said preliminary chamber is a bottom wall of said preliminary chamber. 20. The substrate processing apparatus according to claim 18, wherein an inside surface of said preliminary chamber is adjacent to said substrate transferring apparatus both above and below said substrate transferring apparatus such that a volume of gas needed to fill said preliminary chamber is reduced. 21. The substrate processing apparatus according to claim 18, wherein said preliminary chamber has a cassette port through which said cassette is inserted into said preliminary chamber. 22. The substrate processing apparatus according to claim 21, further comprising a shutter for covering said cassette port when said cassette is outside of said preliminary chamber. 23. The substrate processing apparatus according to claim 21, further comprising a cassette elevator having a cap for covering said cassette port when said cassette is inside of said preliminary chamber, wherein said cassette is inserted into said preliminary chamber from below by said cassette elevator. .; US-5363867, 19941100, Kawano et al.; US-5391035, 19950200, Krueger; US-5399531, 19950300, Wu; US-5425611, 19950600, Hughes et al., 414/940; US-5462397, 19951000, Iwabuchi; US-5464313, 19951100, Ohsawa; US-5468112, 19951100, Ishii et al., 414/217; US-5527390, 19960600, Ono et al.; US-5536128, 19960700, Shimoyashiro et al.; US-5562383, 19961000, Iwai et al.; US-5570990, 19961100, Bonora et al.; US-5586585, 19961200, Bonora et al.; US-5603777, 19970200, Ohasi, 414/940; US-5628604, 19970500, Murata et al.; US-5655869, 19970800, Scheier et al.; US-5788448, 19980800, Wakamori et al.; US-5829939, 19981100, Iusai et al., 414/940; US-5957648, 19990900, Bachrach, 414/217; US-5980183, 19991100, Fosnight
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