초록 ▼

A dual inlaid copper interconnect structure uses a plasma enhanced nitride (PEN) bottom capping layer and a silicon rich silicon oxynitride intermediate etch stop layer. The interfaces (16a, 16b, 20a, and 20b) between these layers (16 and 20) and their adjacent dielectric layers (18 and 22) are posi

A dual inlaid copper interconnect structure uses a plasma enhanced nitride (PEN) bottom capping layer and a silicon rich silicon oxynitride intermediate etch stop layer. The interfaces (16a, 16b, 20a, and 20b) between these layers (16 and 20) and their adjacent dielectric layers (18 and 22) are positioned in the stack (13) independent of the desired aspect ratio of trench openings of the copper interconnect in order to improve optical properties of the dielectric stack (13). Etch processing is then used to position the layers (16) and (20) at locations within the inlaid structure depth that result in one or more of reduced DC leakage current, improved optical performance, higher frequency of operation, reduced cross talk, increased flexibility of design, or like improvements.

대표청구항 ▼

1. A method for forming an interconnect, the method comprising the steps of: forming a first etch stop layer; forming a first dielectric layer over the first etch stop layer; forming a second etch stop layer; forming a second dielectric layer over the second etch stop layer; etching a first o

1. A method for forming an interconnect, the method comprising the steps of: forming a first etch stop layer; forming a first dielectric layer over the first etch stop layer; forming a second etch stop layer; forming a second dielectric layer over the second etch stop layer; etching a first opening entirely through a portion of the second dielectric layer; depositing a third dielectric layer within the first opening; etching the third dielectric layer to form a sidewall spacer within the first opening; etching a second opening through the first etch stop layer and the first dielectric layer wherein the second opening is contiguous with the first opening; and filling both the first opening and second opening with a metal interconnect. 2. The method of claim 1 wherein the metal interconnect comprises a copper-based material and a copper barrier layer. 3. The method of claim 1 wherein the first etch stop layer is a plasma enhanced nitride (PEN) layer and the second etch stop layer is a silicon rich silicon oxynitride layer. 4. The method of claim 1, wherein the second dielectric layer is a low-k dielectric. 5. The method of claim 4, wherein the third dielectric layer is silicon nitride. 6. The method of claim 1, wherein the first opening is an interconnect trench and the second opening is a via portion.