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Refillable ampule and method re same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F17C-013/00
출원번호 US-0906161 (2001-07-16)
발명자 / 주소
  • Siegele, Stephen H.
  • Noah, Craig M.
  • Gregg, John N.
출원인 / 주소
  • Advanced Technology Materials, Inc.
대리인 / 주소
    Ryann, William F.Chappuis, Margaret
인용정보 피인용 횟수 : 8  인용 특허 : 24

초록

A highly reliable bulk chemical delivery system for high purity chemicals employing a manifold that ensures contamination free operation and canister change outs with a minimum of valves and tubing.

대표청구항

A highly reliable bulk chemical delivery system for high purity chemicals employing a manifold that ensures contamination free operation and canister change outs with a minimum of valves and tubing. ression release valve; and wherein said cylinder head defines a second passage connecting said outle

이 특허에 인용된 특허 (24)

  1. Smith Dresden G. (1621 English Dr. San Jose CA 95129), Air and water volume control apparatus for hydropneumatic tanks.
  2. Geatz Tobin (Durham NC), Apparatus and method for the transfer and delivery of high purity chemicals.
  3. Fair David L. (Rockford IL), Bubbler container automatic refill system.
  4. Fair David L. (Rockford IL), Bubbler container automatic refill system.
  5. Siegele Stephen H. (Campbell CA) Noah Craig M. (Mountain View CA) Gregg John N. (Marble Falls TX), Bulk containers for high purity chemical delivery systems.
  6. Lipisko Bruce A. (Carlsbad CA) Schumacher John C. (Rancho Santa Fe CA) Howard Richard E. (Escondido CA) Randke Peter T. (San Marcos CA) Sandu Adrian (La Mesa CA) Fletcher Robert E. (Vista CA) Graf Ha, Chemical refill system.
  7. Lipisko Bruce A. (Carlsbad CA) Schumacher John C. (Rancho Santa Fe CA) Howard Richard E. (Escondido CA) Randtke Peter T. (San Marcos CA) Sandu Adrian (La Mesa CA) Fletcher Robert E. (Vista CA) Graf H, Chemical refill system.
  8. Sawada Ryoji (Mori JPX) Yamamoto Satoshi (Mori JPX), Fluid level indicator for small watercraft.
  9. Morales Gerald A. (Simi Valley CA), Jet level sensor for fuel tanks.
  10. McKiernan Edward (Big Prairie OH) Bailey Ronald J. (Big Prairie OH) Sigler James A. (Big Prairie OH), Level indicating in vehicle holding tanks.
  11. Senghaas Karl A. (434 Forrest Hill San Antonio TX 78209) Senghaas Peter (334 Olney San Antonio TX 78209), Liquid level measuring apparatus.
  12. Bongort Edgar A. (Southfield MI) Cruickshank William T. (Pontiac MI), Liquid level sensor.
  13. Bongort Edgar A. (Southfield MI) Cruickshank William T. (Pontiac MI), Liquid level sensor.
  14. Miyazaki Shinji (Yokohama JPX) Tsunashima Yoshitaka (Tokyo JPX), Liquid source container device.
  15. Schumacher John C. (Oceanside CA) Lagendijk Andre (Oceanside CA), Liquid source material container and method of use for semiconductor device manufacturing.
  16. Lew Hyok S. (7890 Oak St. Arvada CO 80005), Magnetically activated multiple switch level detector.
  17. Yamazaki Masahiro (Yokohama JPX) Iizuka Shigeru (Yokohama JPX) Kamiya Shigemitsu (Kawasaki JPX) Oka Yoshiro (Yokohama JPX) Fujino Katsuhiro (Yokohama JPX), Method and apparatus for feeding drug liquid from hermetic returnable can.
  18. Jones Michael E. (Barsted GB3) Kenward Andrew J. (London GB3), Method of and apparatus for packaging a beverage in a container.
  19. Schumacher John C. (Oceanside CA) Lagendijk Andre (Oceanside CA), Method of shipping and using semiconductor liquid source materials.
  20. Rowe ; Jr. Edward A. (North Perry OH), Process for removing undesirable substances from electrical devices.
  21. Lee Sung C. (Bridgeport CT) Crum James N. (Stonington CT), System for removing foreign matter from a plate cylinder of a printing press.
  22. Randtke Peter T. (La Costa CA) Graf Hans-Juergen (Oceanside CA), Ultra high purity reagent container with large breakseal.
  23. McMenamin Joseph C. (Oceanside CA), Vapor mass flow control system.
  24. Foster Leonard W. (Richardson TX) Millis Edwin G. (Dallas TX), Vented vacuum semiconductor wafer cassette.

이 특허를 인용한 특허 (8)

  1. Chandrachood, Madhavi R.; Grimbergen, Michael N.; Nguyen, Khiem K.; Lewington, Richard; Ibrahim, Ibrahim M.; Panayil, Sheeba J.; Kumar, Ajay, Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors.
  2. Lewington, Richard; Grimbergen, Michael N.; Nguyen, Khiem K.; Bivens, Darin; Chandrachood, Madhavi R.; Kumar, Ajay, Mask etch plasma reactor with cathode providing a uniform distribution of etch rate.
  3. Chandrachood, Madhavi R.; Grimbergen, Michael N.; Nguyen, Khiem K.; Lewington, Richard; Ibrahim, Ibrahim M.; Panayil, Sheeba J.; Kumar, Ajay, Mask etch plasma reactor with variable process gas distribution.
  4. Chandrachood, Madhavi R.; Grimbergen, Michael N.; Nguyen, Khiem K.; Lewington, Richard; Ibrahim, Ibrahim M.; Panayil, Sheeba J.; Kumar, Ajay, Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside.
  5. Lewington, Richard; Grimbergen, Michael N.; Nguyen, Khiem K.; Bivens, Darin; Chandrachood, Madhavi R.; Kumar, Ajay, Plasma reactor for processing a workpiece and having a tunable cathode.
  6. Chandrachood, Madhavi R.; Grimbergen, Michael N.; Nguyen, Khiem K.; Lewington, Richard; Ibrahim, Ibrahim M.; Panayil, Sheeba J.; Kumar, Ajay, Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall.
  7. Lewington, Richard; Grimbergen, Michael N.; Nguyen, Khiem K.; Bivens, Darin; Chandrachood, Madhavi R.; Kumar, Ajay, Process for etching a transparent workpiece including backside endpoint detection steps.
  8. Chism, Richard D.; Krell, Andy, Refillable ampoule with purge capability.
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