초록 ▼

A process and a plant for removing the gaseous fluorocompounds or fluorosulphur compounds, such as CF4,C2F6,and SF6,present in a stream of xenon and/or krypton, by permeation via one or more membranes, such as polymer membranes. The xenon and/or krypton thus produced may then be further purified or

A process and a plant for removing the gaseous fluorocompounds or fluorosulphur compounds, such as CF4,C2F6,and SF6,present in a stream of xenon and/or krypton, by permeation via one or more membranes, such as polymer membranes. The xenon and/or krypton thus produced may then be further purified or separated by cryogenic distillation. Prior to the permeation step, the other impurities, particularly the hydrocarbons, may be removed by oxidative catalysis and subsequent adsorption of the carbon dioxides and of the water produced. The xenon, the krypton and the xenon/krypton mixtures free of gaseous fluorocompounds or fluorosulphur compounds and purified by such process can be used as plasma propulsion gas, especially for satellites, or as inter-pane insulation gas for a sealed unit, particularly for double-glazing windows.

대표청구항 ▼

A process and a plant for removing the gaseous fluorocompounds or fluorosulphur compounds, such as CF4,C2F6,and SF6,present in a stream of xenon and/or krypton, by permeation via one or more membranes, such as polymer membranes. The xenon and/or krypton thus produced may then be further purified or

A process and a plant for removing the gaseous fluorocompounds or fluorosulphur compounds, such as CF4,C2F6,and SF6,present in a stream of xenon and/or krypton, by permeation via one or more membranes, such as polymer membranes. The xenon and/or krypton thus produced may then be further purified or separated by cryogenic distillation. Prior to the permeation step, the other impurities, particularly the hydrocarbons, may be removed by oxidative catalysis and subsequent adsorption of the carbon dioxides and of the water produced. The xenon, the krypton and the xenon/krypton mixtures free of gaseous fluorocompounds or fluorosulphur compounds and purified by such process can be used as plasma propulsion gas, especially for satellites, or as inter-pane insulation gas for a sealed unit, particularly for double-glazing windows. o about 2% by weight of the refrigerant of a hydrophobic naphthenic lubricating oil that is miscible with the mixture of the chlorodifluoroethane and tetrafluoroethane wherein no more than 5% by weight of the hydrophobic lubricating oil is hydrophilic lubricant. 2. The refrigerant of claim 1 wherein: the amount by weight of chlorodifluoroethane is about 20%; and the amount by weight of tetrafluoroethane is about 80%. 3. The refrigerant of claim 1 wherein: the amount by weight of chlorodifluoroethane is about 15% to about 20%; and the amount by weight of tetrafluoroethane is about 80% to about 85%. 4. The refrigerant of claim 1 wherein: the amount by weight of chlorodifluoroethane is about 40%; and the amount by weight of tetrafluoroethane is about 60%. 5. The refrigerant of claim 1, wherein the lubricating oil is also miscible with dichlorodifluoromethane. 6. The refrigerant of claim 1, wherein no more than 2% by weight of the hydrophobic lubricating oil is hydrophilic lubricant. 7. The refrigerant of claim 1, consisting of: (a) about 15% to about 40% by weight chlorodifluoroethane; (b) about 60% to about 85% by weight tetrafluoroethane; and (c) about 0.5% to about 2% by weight of the refrigerant of the hydrophobic lubricating oil that is miscible with the mixture of the chlorodifluoroethane and tetrafluoroethane. 8. The refrigerant of claim 1, wherein the hydrophobic lubricating oil is present in an amount of 1.50-1.75% by weight of the refrigerant. 9. The refrigerant of claim 1, wherein the hydrophobic lubricating oil contains no hydrophilic lubricant. 10. The refrigerant of claim 1, wherein the lubricating oil has a viscosity of 5-500 centistokes. 11. The refrigerant of claim 1, wherein the lubricating oil has a viscosity of 5-10 centistokes. 12. The refrigerant of claim 1, further comprising a corrosion inhibitor for anhydrous systems. 13. In an apparatus for refrigerating that is designed for use with ozone layer-damaging dichlorodifluoromethane refrigerant, the improvement comprising substituting at least a part of the dichlorodifluoromethane with the refrigerant of claim 1. 14. A method for refilling an apparatus for refrigeration that is designed for use with ozone layer-damaging dichlorodifluoromethane refrigerant, the method comprising: (1) supplying the refrigerant of claim 1 under pressure, in an aerosol can fitted with an outlet compatible with a dichlorodifluoromethane recharging manifold of the apparatus; and (2) adding to said apparatus via the manifold the refrigerant of claim 1. 15. In an apparatus for automobile air-conditioning designed for use with ozone layer-damaging dichlorodifluoromethane refrigerant the improvement comprising substituting at least a portion of the dichlorodifluoromethane with the refrigerant of claim 1. 16. A method for refilling an apparatus for automobile air-conditioning that is designed for use with ozone layer-damaging dichlorodifluoromethane refrigerant, the method comprising: (1) supplying the refrigerant of claim 1 under pressure in an aerosol can fitted with an outlet compatible with a dichlorodifluoromethane recharging manifold of the apparatus; and (2) adding to said apparatus via the manifold the refrigerant of claim 1.