[특허]Magnetron negative ion sputter source

[미국특허] Magnetron negative ion sputter source 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	H01J-027/02 H01J-027/00
출원번호	US-0568665 (2000-05-11)
발명자 / 주소	Kim, Steven Sohn, Minho
출원인 / 주소	Plasmion Corporation
대리인 / 주소	Morgan, Lewis Bockius LLP
인용정보	피인용 횟수 : 33 인용 특허 : 7

초록 ▼

A negative ion source is disclosed which includes an electrode, a target having a more negative electrical potential than the electrode, a supply of electrical energy for generating a discharge between the electrode and the target, and at least one magnet positioned so as to confine electrons, generated as a result of said discharge, in close proximity to a first surface of the target. The negative ion source further includes a delivery system for delivering cesium to a second surface of the target, and a distribution chamber interposed between the delivery system and the target for uniformly distributing cesium on the second surface of said target. The cesium diffuses through openings in the target from the first surface to the second surface. The negative ion source may comprise a conventional magnetron sputter source that has been retrofitted to include a cesium distribution system.

대표청구항 ▼

1. A negative ion source, comprising: an electrode; a target having a more negative electrical potential than said electrode; a supply of electrical energy for generating a discharge between said electrode and said target; at least one magnet positioned so as to generate a magnetic field to confine electrons, generated as a result of said discharge, in close proximity to a first surface of said target; and a delivery system for delivering cesium to a second surface of said target, said second surface opposing said first surface, wherein said target further comprises a plurality of circular openings through which said cesium diffuses from said second surface to said first surface through a distribution chamber interposed between said delivery system and said target for uniformly distributing cesium on said second surface of said target. 2. The negative ion source of claim 1 wherein said delivery system has been retrofitted to a conventional magnetron sputter source. 3. The negative ion source of claim 1 wherein said distribution chamber further comprises a heater for bringing said cesium to a uniform temperature allowing said cesium to be uniformly distributed in said distribution chamber. 4. The negative ion source of claim 1 wherein said distribution chamber further comprises a porous insert disposed inside said distribution chamber for causing a uniform distribution of cesium throughout said distribution chamber. 5. The negative ion source of claim 1 wherein said delivery system further comprises: a supply of cesium detachably coupled to a first port; a reservoir coupled to said first port, said first port for conveying cesium to said reservoir; a heater in close proximity to said reservoir for heating cesium in said reservoir; a second port coupled to said reservoir for allowing said reservoir to be subject to a vacuum; and a valve for metering a flow of cesium from said reservoir to said distribution chamber. 6. The negative ion source of claim 1 wherein said supply of electrical energy supplies RF energy. 7. The negative ion source of claim 1 wherein said supply of electrical energy supplies direct current. 8. The negative ion source of claim 1 wherein the shape of said distribution chamber, said target, and said magnetic field is non circular. 9. A method of depositing ion on a substrate, comprising the steps: generating a discharge between an electrode and a target; confining electrons, generated as a result of said discharge, to a first area in close proximity to a first surface of said target; delivering cesium to a second surface of said target through a distribution chamber for uniformly distributing cesium on said second surface; and diffusing said cesium through a plurality of circular openings in said target from said second surface to said first surface. 10. The method of claim 9, wherein said step of delivering further comprises the step of heating said cesium to a uniform temperature allowing said cesium to be uniformly distributed in said distribution chamber. 11. The method of claim 9, wherein said step of delivering cesium through a distribution chamber further comprises a porous insert disposed inside said distribution chamber for causing a uniform distribution of cesium throughout said distribution chamber.

이 특허에 인용된 특허 (7) 인용/피인용 타임라인 분석

Roberts Thomas G. (Huntsville AL) Strickland Brian R. (Huntsville AL), HF sustained, DC discharge driven negative ion source with automatic control system.
상세보기
Siess Harold E., Method and apparatus for generating ions.
상세보기
Verney Marthe B. (Paris FRX) Doucet Henri J. (Les Molires FRX), Negative ion source.
상세보기
Hershcovitch, Ady; Prelec, Krsto, Negative ion source with hollow cathode discharge plasma.
상세보기
Kim Seong I. (438 Andre Ave. North Vale NJ 07647), Negative ion sputtering beam source.
상세보기
Kim Seong I. (438 Andre Ave. North Vale NJ 07647), Solid state cesium ion gun.
상세보기
Wolfe John C. (Houston TX) Chau Yat-lung R. (Houston TX) Ho Wong-sik S. (Stafford TX), Sputtering method.
상세보기

이 특허를 인용한 특허 (33) 인용/피인용 타임라인 분석

Murata, Takashi; Hirata, Takuya; Kano, Makoto; Mabuchi, Yutaka; Hamada, Takahiro; Yamaguchi, Masashi, Chain drive system.
상세보기
Ricatto, Pascal J.; Houston, Edward J.; Crowe, Richard, Chemical processing using non-thermal discharge plasma.
상세보기
Ricatto,Pascal J.; Houston,Edward J.; Crowe,Richard, Electrode discharge, non-thermal plasma device (reactor) for the pre-treatment of combustion air.
상세보기
Crowe,Richard; Babko Malyi,Sergei; Kovach,Kurt; Tropper,Seth, Electrode for use with atmospheric pressure plasma emitter apparatus and method for using the same.
상세보기
Hamada,Takahiro; Mabuchi,Yutaka; Kano,Makoto; Miyake,Hidenori, Engine piston-pin sliding structure.
상세보기
Hamada,Takahiro; Mabuchi,Yutaka; Kano,Makoto; Azuma,Yuuji, Fuel injection valve.
상세보기
Okamoto, Yusuke; Yasuda, Yoshiteru; Yamaguchi, Takuro; Kano, Makoto, Gear.
상세보기
Crowe,Richard; Korfiatis,George; Babko Malyi,Sergei, In situ sterilization and decontamination system using a non-thermal plasma discharge.
상세보기
Konishi, Shozaburo; Kano, Makoto; Yasuda, Yoshiteru; Mabuchi, Yutaka; Hamada, Takahiro; Takeshima, Shigeki; Tsushima, Kenji, Low-friction sliding mechanism.
상세보기
Konishi,Shozaburo; Kano,Makoto; Yasuda,Yoshiteru; Mabuchi,Yutaka; Hamada,Takahiro; Takeshima,Shigeki; Tsushima,Kenji, Low-friction sliding mechanism.
상세보기
Martin, Jean Michel; Takeshima, Shigeki; Konishi, Shozaburo; Kano, Makoto; Mabuchi, Yutaka; Ishikawa, Takao; Ueno, Takafumi; Nakamura, Kiyotaka; Hamada, Takahiro, Low-friction sliding mechanism, low-friction agent composition and method of friction reduction.
상세보기
Martin, Jean Michel; Kano, Saihei; Kano, Makoto; Yasuda, Yoshiteru; Okamoto, Yusuke; Mabuchi, Yutaka; Ueno, Takafumi, Low-friction sliding member and low-friction sliding mechanism using same.
상세보기
Ishikawa, Takao; Nakamura, Kiyotaka; Kano, Makoto; Ueno, Takafumi, Low-friction sliding member in transmission, and transmission oil therefor.
상세보기
Ishikawa,Takao; Nakamura,Kiyotaka; Kano,Makoto; Ueno,Takafumi, Low-friction sliding member in transmission, and transmission oil therefor.
상세보기
Horsky, Thomas N.; Milgate, III, Robert W.; Sacco, Jr., George P.; Jacobson, Dale Conrad; Krull, Wade Allen, Method and apparatus for extracting ions from an ion source for use in ion implantation.
상세보기
McTeer,Allen, Methods of depositing silver onto a metal selenide-comprising surface and methods of depositing silver onto a selenium-comprising surface.
상세보기
McTeer, Allen, Methods of forming a resistance variable element.
상세보기
McTeer,Allen, Methods of forming a resistance variable element.
상세보기
Nivon, Uzia; Niv, Yehuda, Multi-plane optical apparatus.
상세보기
Nishimura,Kimio; Mabuchi,Yutaka; Hamada,Takahiro; Kano,Makoto; Miyake,Hidenori; Ota,Tomohito, Piston for internal combustion engine.
상세보기
Ueno,Takafumi; Kano,Makoto; Hamada,Takahiro, Refrigerant compressor and friction control process therefor.
상세보기
Kano,Makoto; Mabuchi,Yutaka; Hamada,Takahiro, Rolling element.
상세보기
Christodoulatos, Christos; Korfiatis, George; Crowe, Richard; Kunhardt, Erich E, Segmented electrode capillary discharge, non-thermal plasma apparatus and process for promoting chemical reactions.
상세보기
Miyake,Shojiro; Yasuda,Yoshiteru; Kano,Makoto; Mabuchi,Yutaka, Slidably movable member and method of producing same.
상세보기
Hamada, Takahiro; Kano, Makoto; Mabuchi, Yutaka, Sliding member and production process thereof.
상세보기
Hamada,Takahiro; Kano,Makoto; Mabuchi,Yutaka, Sliding member and production process thereof.
상세보기
Hamada,Takahiro; Mabuchi,Yutaka; Kano,Makoto; Yasuda,Yoshiteru; Okamoto,Yusuke, Sliding structure for automotive engine.
상세보기
Houston, Jr., Edward J.; Kovach, Kurt; Crowe, Richard; Tropper, Seth; Epstein, Michael, Slot discharge non-thermal plasma apparatus and process for promoting chemical reaction.
상세보기
Nishimura,Kimio; Mabuchi,Yutaka; Murata,Takashi; Hirata,Takuya; Kano,Makoto; Hamada,Takahiro; Yamaguchi,Masashi, Structure for connecting piston to crankshaft.
상세보기
Kovach,Kurt M.; Tropper,Seth; Crowe,Richard; Houston,Edward J.; Korfiatis,George; Kunhardt,Erich, Use of self-sustained atmospheric pressure plasma for the scattering and absorption of electromagnetic radiation.
상세보기
Nomura,Shin; Miura,Takahiro; Kano,Makoto; Mabuchi,Yutaka; Hamada,Takahiro; Murakami,Miki, Valve train for internal combustion engine.
상세보기
Niv,Yehuda; Nivon,Uzia; Cohen,Tal, Wide field-of-view binocular device.
상세보기
Niv,Yehuda; Nivon,Uzia; Cohen,Tal, Wide field-of-view binocular device, system and kit.
상세보기

활용도 분석정보

상세보기

다운로드

내보내기

활용도 Top5 특허

해당 특허가 속한 카테고리에서 활용도가 높은 상위 5개 콘텐츠를 보여줍니다.
더보기 버튼을 클릭하시면 더 많은 관련자료를 살펴볼 수 있습니다.

IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표IPC 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 공고번호, 공고일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표출원인, 출원인국적, 출원인주소, 발명자, 발명자E, 발명자코드, 발명자주소, 발명자 우편번호, 발명자국적, 대표IPC, IPC코드, 요약, 미국특허분류, 대리인주소, 대리인코드, 대리인(한글), 대리인(영문), 국제공개일자, 국제공개번호, 국제출원일자, 국제출원번호, 우선권, 우선권주장일, 우선권국가, 우선권출원번호, 원출원일자, 원출원번호, 지정국, Citing Patents, Cited Patents
저장형식	Text(ASCII format) Excel format PIAS분석(.xls)
메일정보	받는사람 (필수) @ 보내는사람 (선택) @ 제목 내용 KISTI 검색결과 이메일 서비스
안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

연합인증

[미국특허] Magnetron negative ion sputter source 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

이 특허에 인용된 특허 (7) 인용/피인용 타임라인 분석

이 특허를 인용한 특허 (33) 인용/피인용 타임라인 분석

활용도 분석정보

활용도 Top5 특허

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

연합인증

[미국특허] Magnetron negative ion sputter source 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

전체(0) 논문(0) 특허(0) 보고서(0)

전체(0) 논문(0) 특허(0) 보고서(0)

이 특허에 인용된 특허 (7) 인용/피인용 타임라인 분석

이 특허를 인용한 특허 (33) 인용/피인용 타임라인 분석

활용도 분석정보

활용도 Top5 특허 더보기

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

활용도 Top5 특허