Nozzle design for generating fluid streams useful in the manufacture of microelectronic devices
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
F25D-017/02
B05C-005/00
B05B-015/00
B05B-017/00
A62C-031/02
출원번호
US-0820281
(2001-03-28)
발명자
/ 주소
Kunkel, Pam
Narayanswani, Natraj
Patrin, John C.
출원인 / 주소
FSI International, Inc.
대리인 / 주소
Kagan Binder, PLLC
인용정보
피인용 횟수 :
8인용 특허 :
14
초록▼
Improved nozzle design that discharges more powerful, more focused fluid streams through a series of nozzle orifices distributed along a length of the nozzle. The present invention may be incorporated into a wide range of microelectronic device manufacturing processes and equipment types for which a
Improved nozzle design that discharges more powerful, more focused fluid streams through a series of nozzle orifices distributed along a length of the nozzle. The present invention may be incorporated into a wide range of microelectronic device manufacturing processes and equipment types for which an array of more forceful, more focused process streams are desired for treating microelectronic workpieces. The present invention is particularly useful to cryogenically clean microelectronic workpieces, where the improvements allow the conventionally more troublesome smaller contaminant particles to be cleaningly removed with greater particle removal efficiency.
대표청구항▼
Improved nozzle design that discharges more powerful, more focused fluid streams through a series of nozzle orifices distributed along a length of the nozzle. The present invention may be incorporated into a wide range of microelectronic device manufacturing processes and equipment types for which a
Improved nozzle design that discharges more powerful, more focused fluid streams through a series of nozzle orifices distributed along a length of the nozzle. The present invention may be incorporated into a wide range of microelectronic device manufacturing processes and equipment types for which an array of more forceful, more focused process streams are desired for treating microelectronic workpieces. The present invention is particularly useful to cryogenically clean microelectronic workpieces, where the improvements allow the conventionally more troublesome smaller contaminant particles to be cleaningly removed with greater particle removal efficiency. 1. A method for cooling a product made from a material, said method comprising: forcing said material through a die; directing a gas from a cryogenic fluid through said die; and subjecting said material to said gas as said material exits said die. 2. The method of claim 1 wherein said cryogenic fluid has a temperature below about -250 degrees Fahrenheit. 3. The method of claim 2 wherein said cryogenic fluid is selected from liquid oxygen, liquid nitrogen, liquid neon, liquid hydrogen, and liquid helium. 4. The method of claim 1 wherein said gas is vapor. 5. The method of claim 1 wherein: said product has an interior surface; and said interior surface is subjected to said gas. 6. The method of claim 5 wherein said interior surface defines a hollow. 7. The method of claim 1 wherein an exterior surface of said product is subjected to said gas. 8. The method of claim 1 wherein said material is forced through said die by extrusion. 9. The method of claim 1 further comprising subjecting said product to a liquid bath. 10. The method of claim 9 wherein said liquid bath is comprised of water. 11. The method of claim 1 wherein said material is selected from the group consisting of cellulosic/polymer composites, plastics, polymers, thermoplastics, foamed plastics, plastic compositions, inorganic-filled plastic compositions, metals, metallic compositions, alloys, and mixtures including any of the aforementioned materials. 12. A method of cooling a product having a hollow portion, said method comprising: directing a gas from a cryogenic fluid through a die; and subjecting said hollow portion to said gas as said product exits said die. 13. The method of claim 12 wherein said cryogenic fluid has a temperature below about -250 degrees Fahrenheit. 14. The method of claim 13 wherein said cryogenic fluid is selected from liquid oxygen, liquid nitrogen, liquid neon, liquid hydrogen, and liquid helium. 15. The method of claim 12 wherein said gas is vapor. 16. The method of claim 12 further comprising subjecting an exterior surface of said product to said gas. 17. The method of claim 12 further comprising forcing said product out of said die by extrusion. 18. The method of claim 12 further comprising subjecting said product to a liquid bath. 19. The method of claim 12 wherein said product is made from a material selected from the group consisting of cellulosic/polymer composites, plastics, polymers, thermoplastics, foamed plastics, plastic compositions, inorganic-filled plastic compositions, metals, metallic compositions, alloys, and mixtures including any of the aforementioned materials.
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이 특허에 인용된 특허 (14)
Narayanswami Natraj ; Wagener Thomas J. ; Siefering Kevin L. ; Cavaliere William A., Aerodynamic aerosol chamber.
Whitlock Walter H. (Peapack NJ) Weltmer ; Jr. William R. (Murray Hill NJ) Clark James D. (Mountainside NJ), Apparatus and method for removing minute particles from a substrate.
Bauer Tibor L. (Hopewell Junction NY) Cavaliere William A. (Verbank NY) Dart ; II Charles R. (Coral Springs FL) Freebern Timothy H. (LaGrangeville NY) Linnell David C. (Poughkeepsie NY) Miller James , Apparatus for producing cryogenic aerosol.
Arnaud Alain (Versailles FRX) Morin Claude (Puteaux FRX), Apparatus for the distribution of pulverulent solids onto the surface of a substrate in order to coat it.
McDermott Wayne T. (Allentown PA) Wu Jin J. (Ossining NY) Ockovic Richard C. (Northampton PA), Apparatus to clean solid surfaces using a cryogenic aerosol.
McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Allentown PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Millwood NY) Schwarz Alexander (Allentown PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using a cryogenic aerosol.
McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Northampton PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Milwood NY) Schwarz Alexander (Bethlehem PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using an argon or nitrogen aerosol.
Savas, Stephen E.; Wiesnoski, Allan B.; Galewski, Carl, Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrier.
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