초록 ▼

The present invention provides an inexpensive and sensitive device and method for detecting and quantifying analytes present in a medium. The device comprises a metalized film upon which is printed a specific, predetermined pattern of an antibody-binding proteins. Upon attachment of a target analyte

The present invention provides an inexpensive and sensitive device and method for detecting and quantifying analytes present in a medium. The device comprises a metalized film upon which is printed a specific, predetermined pattern of an antibody-binding proteins. Upon attachment of a target analyte to select areas of the plastic film upon which the protein is printed, diffraction of transmitted and/or reflected light occurs via the physical dimensions and defined, precise placement of the analyte. A diffraction image is produced which can be easily seen with the eye or, optionally, with a sensing device.

대표청구항 ▼

The present invention provides an inexpensive and sensitive device and method for detecting and quantifying analytes present in a medium. The device comprises a metalized film upon which is printed a specific, predetermined pattern of an antibody-binding proteins. Upon attachment of a target analyte

The present invention provides an inexpensive and sensitive device and method for detecting and quantifying analytes present in a medium. The device comprises a metalized film upon which is printed a specific, predetermined pattern of an antibody-binding proteins. Upon attachment of a target analyte to select areas of the plastic film upon which the protein is printed, diffraction of transmitted and/or reflected light occurs via the physical dimensions and defined, precise placement of the analyte. A diffraction image is produced which can be easily seen with the eye or, optionally, with a sensing device. layout includes a plurality of mask layout features and the mask includes a plurality of mask features corresponding to the plurality of mask layout features. 15. The method of claim 1, wherein the mask layout is an optical proximity corrected mask layout. 16. A method of improving the manufacture of a mask, comprising: providing a mask layout, the mask layout including a mask layout feature; writing a mask, the mask including a mask feature corresponding to the mask layout feature; determining an area loss for a portion of the mask feature, the area loss comprising substantially a difference between the portion of the mask feature and a corresponding portion of the mask layout feature; generating one or more sizing corrections in accordance with the area loss; and storing the one or more sizing corrections in a database. 17. The method of claim 16, wherein the area loss is determined by an edge detection technique. 18. The method of claim 17, wherein the edge detection technique includes detecting one or more edges of the portion of the mask feature with a scanning electron microscope. 19. The method of claim 18, further comprising determining one or more edge data by the edge detection technique. 20. The method of claim 19, wherein determining the one or more edge data includes determining one or more radii of a portion of the detected edge. 21. The method of claim 20, further comprising inputting the one or more edge data into a processor, the processor calculating the area loss. 22. The method of claim 21, wherein the portion of the mask feature is an optical proximity correction feature. 23. The method of claim 16, wherein the one or more sizing corrections are generated by inputting the area loss into a processor, the processor calculating the one or more sizing correction data. 24. The method of claim 23, wherein the portion of the mask feature is an optical proximity correction feature. 25. The method of claim 16, further comprising: modifying the mask layout in accordance with the one or more sizing corrections stored in the database; and writing a corrected mask from the modified mask layout. 26. A mask created by the method of claim 16. 27. The method of claim 16, wherein the mask layout includes a plurality of mask layout features and the mask includes a plurality of mask features corresponding to the plurality of mask layout features. 28. The method of claim 16, wherein the mask layout is an optical proximity corrected mask layout. 29. A data storage medium, comprising: one or more sizing correction data, the one or more sizing correction data corresponding to one or more area loss data, the one or more area loss data comprising substantially a difference between a portion of a mask layout feature and a portion of a mask feature. 30. The data storage medium of claim 29, wherein the one or more area loss data is determined by an edge detection technique. 31. The data storage medium of claim 30, wherein the edge detection technique includes detecting one or more edges of the portion of the mask feature with a scanning electron microscope. 32. The data storage medium of claim 30, wherein the edge detection technique further includes generating one or more edge data. 33. The data storage medium of claim 32, wherein the one or more edge data includes one or more radii of the portion of the mask feature. 34. The data storage medium of claim 32, wherein the one or more area loss data is determined by inputting the one or more edge data into a processor, the processor operatively coupled to an algorithm for calculating the one or more area loss data. 35. The data storage medium of claim 34, wherein the portion of the mask feature is an optical proximity correction feature. 36. The data storage medium of claim 30, wherein the one or more sizing corrections are determined by inputting the one or more area loss data to a processor, the processor operatively coupled to an algorithm for calculating the one or more sizing correction data. 37. The data storage medium of claim 29, wherein a second mask layout is modified in accordance with the one or more sizing correction data stored in the data storage medium. 38. The data storage medium of claim 37, wherein a corrected mask is written from the modified second mask layout. 39. The data storage medium of claim 29, wherein the portion of the mask feature is an optical proximity correction feature. 40. The data storage medium of claim 37, wherein the second mask layout is an optical proximity corrected mask layout.