초록 ▼

A method of chemically polishing a metal layer on a substrate is provided. The metal layer is chemically polished using an electrochemical polishing (ECP) process. In the ECP process, the substrate is immersed in a chemical polishing solution including a surfactant. The surfactant in the polishing s

A method of chemically polishing a metal layer on a substrate is provided. The metal layer is chemically polished using an electrochemical polishing (ECP) process. In the ECP process, the substrate is immersed in a chemical polishing solution including a surfactant. The surfactant in the polishing solution covers the surface of the substrate such that only topographic portions of the substrate surface are exposed to the chemical polishing solution. Thereafter, an electrical potential applied to the substrate removes topographic portions of the substrate that are exposed to the polishing solution.

대표청구항 ▼

1. An electrolyte composition for removing at least a portion of a metal layer, consisting essentially of: one or more surfactants selected from the group consisting of benzopyran-containing materials, thiourea-containing materials, and aliphatic ether-containing materials; one or more chemical

1. An electrolyte composition for removing at least a portion of a metal layer, consisting essentially of: one or more surfactants selected from the group consisting of benzopyran-containing materials, thiourea-containing materials, and aliphatic ether-containing materials; one or more chemical etchants; and one or more corrosion inhibitors. 2. The electrolyte composition of claim 1, wherein the concentration of the one or more surfactants is in the range of about 0.1 wt. % to about 30 wt. %. 3. The electrolyte composition of claim 1, wherein the one or more chemical etchants comprise one or more oxidizers. 4. The electrolyte composition of claim 3, wherein the one or more oxidizers are selected from the group consisting of hydrogen peroxide, ferric nitrate, iodate-containing materials, acetic acid, phosphoric acid, oxalic acid, and combinations thereof. 5. The electrolyte composition of claim 3, wherein the concentration of the one or more etchants is in the range of about 0.1 wt. % to about 50 wt. %. 6. The electrolyte composition of claim 1, wherein the one or more corrosion inhibitors are selected from the group consisting of benzotriazole (BTA), 5-methyl-1-benzotriazole (TTA), and combinations thereof. 7. The electrolyte composition of claim 6, wherein the concentration of the one or more corrosion inhibitors is in the range of about 0.1 wt. % to about 25 wt. %. 8. A method of removing a portion of a metal layer on a substrate, comprising: immersing a substrate having a metal layer thereon in an electrolyte composition comprising: one or more surfactants selected from the group consisting of benzopyran-containing materials, thiourea-containing materials, and aliphatic ether-containing materials; one or more chemical etchants; and one or more corrosion inhibitors; rotating the substrate relative to the electrolyte composition to form a protective layer on portions of the surface of the metal layer; applying an electrochemical potential between the substrate and a anode immersed in the electrolyte composition; and removing portions of the metal layer. 9. The method of claim 8, wherein the metal layer comprises copper. 10. The method of claim 8, wherein the concentration of the one or more surfactants is in the range of about 0.1 wt. % to about 30 wt. %. 11. The method of claim 8, wherein the one or more etchants comprise one or more oxidizers. 12. The method of claim 11, wherein the one or more oxidizers are selected from the group consisting of hydrogen peroxide, ferric nitrate, iodate-containing materials, acetic acid, phosphoric acid, oxalic acid, and combinations thereof. 13. The method of claim 11, wherein the concentration of the one or more etchants is in the range of about 0.1 wt. % to about 50 wt. %. 14. The method of claim 8, further comprising chemical mechanical polishing the metal layer after removing portions of the metal layer. 15. The method of claim 14, wherein the one or more corrosion inhibitors are selected from the group consisting of benzotriazole (BTA), 5-methyl-1-benzotriazole (TTA), and combinations thereof. 16. The method of claim 14, wherein the concentration of the one or more corrosion inhibitors is in the range of about 0.1% by weight to about 25% by weight. 17. The method of claim 8, wherein the substrate rotates relative to the electrolyte composition at a velocity greater than about 5,000 rpm. 18. The method of claim 8, wherein the metal layer is disposed on a barrier layer on the substrate. 19. The method of claim 18, further comprising removing the barrier layer from the substrate surface after removing portions of the metal layer. 20. The method of claim 8, wherein the electrochemical potential is within a range of about 0.2 volts to about 5 volts.