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Regeneration of plating baths and system therefore 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C25D-021/18
  • C02F-001/32
출원번호 US-0651016 (2000-08-30)
발명자 / 주소
  • Belongia, Brett Matthew
  • Lin, Zhen Wu
  • Pillion, John E.
  • Shyu, Jieh-Hwa
출원인 / 주소
  • Mykrolis Corporation
대리인 / 주소
    Mykrolis Corporation
인용정보 피인용 횟수 : 29  인용 특허 : 21

초록

The present invention provides a system and method for selectively removing one or more organic and also preferably one or more inorganic contaminants from plating baths. More particularly, the invented method relates to the use of a source of energy in combination with chemical oxidants, alone or i

대표청구항

The present invention provides a system and method for selectively removing one or more organic and also preferably one or more inorganic contaminants from plating baths. More particularly, the invented method relates to the use of a source of energy in combination with chemical oxidants, alone or i

이 특허에 인용된 특허 (21)

  1. Sassa Robert L. ; Hobson Alex R. ; Towler Jeffrey C. ; Bushong James H., Catalyst retaining apparatus and use in an ozone filter.
  2. Buchwald Claus (6596 de la Rivire Val Morin ; (Qubec) J0T 2R0 CAX), Device for purifying a flow of liquid by means of ultraviolet radiation.
  3. Groeger H. Gunter (Charlotte NC) Serad George A. (Charlotte NC) Felton Clinton D. (Charlotte NC), Fibrous structures containing immobilized particulate matter.
  4. Martin Sylvia (Shelby Township ; Macomb County MI), Functional fluid additives for acid copper electroplating baths.
  5. Hill David J. (Lincoln Park MI) Hoitash Frederick J. (Ypsilanti MI), Method and apparatus for using ozone in a pressure vessel to treat stream of pollutants.
  6. Akao Kenichiro (Chiba JPX) Ogata Hajime (Chiba JPX) Kikuchi Toshihiro (Chiba JPX) Mochizuki Kazuo (Chiba JPX) Yamato Koji (Chiba JPX), Method for recovering and reproducing tinning liquid.
  7. Macur George J. (Endwell NY) Pratt W. Robert (Binghamton NY) Sharkness James E. (Ithaca NY), Method for treating waste compositions.
  8. Bauer Bernd (Stuttgart DEX) Erlmann Wolfgang (Herrenberg DEX), Method of continuously removing and obtaining ethylene diamine tetracetic acid (EDTA) from the process water of electrol.
  9. Zeff Jack D. (MarinaDelRey CA) Leitis Eriks (Canoga Park CA), Oxidation of toxic compounds in water.
  10. Adiga Mahabala R.,CAXITX K2B 7T5, Plating waste water treatment and metals recovery system.
  11. Saieva Carl J. (94-21 85th St. Ozone Park NY 11416), Process and apparatus for recovering metals from dilute solutions.
  12. Bissinger Werner D. (Sindelfingen DEX), Process for regenerating an electroless copper plating bath.
  13. Yang Xinyu (23 Laoyang Zhuang Chengbei ; Zaoqiang County ; Hebei 053100 CNX), Process of removing cyanide from waste water.
  14. Rao ; G. R. Mohan ; Stanczak ; John S. ; Lien ; Jih-Chang ; Bhatia ; Shy am, Semiconductor integrated circuit with implanted resistor element in polycrystalline silicon layer.
  15. Ohsono Kohei (Saitama JPX) Iwatsuka Yoshihisa (Sizuoka JPX), Stepless transmission control device.
  16. Pahmeier Max C. (Renton WA) Edwards Joseph D. (Seattle WA), System for removing toxic organics and metals from manufacturing wastewater.
  17. Cater Stephen R. (Willowdale CAX) Brown Pauline M. (Toronto CAX) Buckley J. Adele (Willowdale CAX) Stevens R. D. Samuel (Aurora CAX), Treating contaminated effluents and groundwaters.
  18. Foeckler ; Jr. Eugene P. (Richmond VA) Lal Sudarshan (Glen Rock NJ), Treatment of electroless plating waste streams.
  19. Alpaugh Warren A. (Chenango Forks NY) Macur George J. (Endwell NY) Sharkness James E. (Ithaca NY), Treatment of waste compositions.
  20. Egozy Yair (Lexington MA) Foley Adam D. (Westwood MA) O\Neill Gary A. (Tyngsborough MA), Water purification method and apparatus.
  21. Nachtman Charles T. ; Chomka Chester E. ; Edwards James R., Water purifier.

이 특허를 인용한 특허 (29)

  1. Coulter, Bruce Lee, Actinic radiation reactor.
  2. Balisky,Todd Alan; Cameron,Donald A.; Sun,Zhi Wen, Apparatus for plating solution analysis.
  3. Yong, Zhee Min Jimmy; Stibitz, David; Coulter, Bruce Lee; Hoosier, Michael Scott, Baffle plates for an ultraviolet reactor.
  4. Stowell, R. Marshall; Feng, Jingbin; Porter, David W., Electrofill vacuum plating cell.
  5. Dugas,Matthew P., Magnetic media having a non timing based servo track written with a patterned magnetic recording head and process for making the same.
  6. Dugas,Matthew P., Magnetic media having a servo track written with a patterned magnetic recording head.
  7. Ryu,Jae Jun; Kim,Kyung Dae; Gill,June Ing; Heo,Yong Woo, Method and apparatus for automatically measuring the concentration of TOC in a fluid used in a semiconductor manufacturing process.
  8. Sichel, Cosima, Method and arrangement for a water treatment.
  9. Coulter, Bruce Lee, Method and system for providing ultrapure water.
  10. Coulter, Bruce Lee, Method and system for providing ultrapure water.
  11. Belongia, Brett Matthew; Lin, Zhen Wu; Pillion, John E.; Shyu, Jieh-Hwa, Method and system for regenerating of plating baths.
  12. Tsuchida, Hideki; Kusaka, Masaru; Hayashi, Shinjiro, Method for electrolytic copper plating.
  13. Meyer, Heinrich; Thies, Andreas, Method for galvanically forming conductor structures of high-purity copper in the production of integrated circuits.
  14. Coulter, Bruce Lee, Method for measuring a concentration of a compound in a liquid stream.
  15. Kameyama, Koujiro, Method for recycling of plating solutions.
  16. Coulter, Bruce Lee, Method of irradiating a liquid.
  17. Dugas, Matthew P., Method of making a multi-channel time based servo tape media.
  18. Pearson, Trevor; Bray, Paul, Method of recycling electroless nickel waste.
  19. Lu, Kuo-Liang; Tseng, Wen-Song, Method to remove particulate contamination from a solution bath.
  20. Buckalew, Bryan L.; Mayer, Steven T.; Ponnuswamy, Thomas A.; Rash, Robert; Blackman, Brian Paul; Higley, Doug, Methods and apparatus for wetting pretreatment for through resist metal plating.
  21. Chua, Lee Peng; Buckalew, Bryan L.; Ponnuswamy, Thomas Anand; Blackman, Brian Paul; Hosack, Chad Michael; Mayer, Steven T., Methods and apparatus for wetting pretreatment for through resist metal plating.
  22. Chua, Lee Peng; Buckalew, Bryan L.; Ponnuswamy, Thomas Anand; Blackman, Brian; Hosack, Chad Michael; Mayer, Steven T., Methods and apparatus for wetting pretreatment for through resist metal plating.
  23. Dugas, Matthew P., Multichannel time based servo tape media.
  24. Thorum, Matthew S.; Mayer, Steven T., Pretreatment of nickel and cobalt liners for electrodeposition of copper into through silicon vias.
  25. Coulter, Bruce Lee, System and method for measuring and treating a liquid stream.
  26. Hoermann, Alexander F.; Rabinovich, Yevgeniy; Ta, Kathryn P., System and methods for measuring chemical concentrations of a plating solution.
  27. Coulter, Bruce Lee, System for controlling introduction of a reducing agent to a liquid stream.
  28. Sitkiewitz, Steve Donald; Carmignani, Gary Michael; Fredrick, Lee William, Ultraviolet light activated oxidation process for the reduction of organic carbon in semiconductor process water.
  29. Mayer, Steven T.; Porter, David W.; Willey, Mark J., Wetting pretreatment for enhanced damascene metal filling.
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