Device processing apparatus and method having positive pressure with two partitions to minimize leakage
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
A61L-009/00
A61L-002/00
G05B-001/00
B08B-003/12
B08B-003/00
출원번호
US-0675951
(2000-09-29)
발명자
/ 주소
Lin, Szu-Min
Agamohamadi, Mitch
출원인 / 주소
Ethicon, Inc.
인용정보
피인용 횟수 :
15인용 특허 :
79
초록▼
A method and an apparatus are disclosed to effectively flow the fluid through the lumen device during the cleaning, disinfecting or sterilizing process, preferably with the use of two interfaces and two sources of fluid. By flowing the fluid into two adjacent compartments, the loss of the fluid due
A method and an apparatus are disclosed to effectively flow the fluid through the lumen device during the cleaning, disinfecting or sterilizing process, preferably with the use of two interfaces and two sources of fluid. By flowing the fluid into two adjacent compartments, the loss of the fluid due to the gap can be reduced or eliminated.
대표청구항▼
A method and an apparatus are disclosed to effectively flow the fluid through the lumen device during the cleaning, disinfecting or sterilizing process, preferably with the use of two interfaces and two sources of fluid. By flowing the fluid into two adjacent compartments, the loss of the fluid due
A method and an apparatus are disclosed to effectively flow the fluid through the lumen device during the cleaning, disinfecting or sterilizing process, preferably with the use of two interfaces and two sources of fluid. By flowing the fluid into two adjacent compartments, the loss of the fluid due to the gap can be reduced or eliminated. 92; US-4761844, 19880800, Turchan, 010/140; US-4766040, 19880800, Hillert et al., 428/552; US-4778486, 19881000, Csillag et al., 051/309; US-4784023, 19881100, Dennis, 076/108.A; US-4784662, 19881100, Muller, 623/022; US-4789251, 19881200, McPherson et al., 384/317; US-4797241, 19890100, Peterson et al., 264/063; US-4797326, 19890100, Csillag, 428/552; US-4808185, 19890200, Penenberg et al., 623/020; US-4813959, 19890300, Cremascoli, 623/022; US-4822355, 19890400, Bhuvaneshwar, 623/002; US-4822368, 19890400, Collier, 623/022; US-4824442, 19890400, Cerceau, 051/293; US-4840631, 19890600, Mathys, 623/022; US-4842605, 19890600, Sonnerat et al., 623/022; US-4846839, 19890700, Noiles, 623/018; US-4861350, 19890800, Phaal et al., 051/307; US-4865603, 19890900, Noiles, 623/018; US-4865606, 19890900, Rehder, 623/020; US-4866885, 19890900, Dodsworth, 051/293; US-4878917, 19891100, Kranz et al., 623/018; US-4892547, 19900100, Brown, 623/020; US-4922298, 19900500, Folkins et al., 427/038; US-4922898, 19900500, Dunn, 606/085; US-4925701, 19900500, Jansen et al., 427/038; US-4931068, 19900600, Dismukes et al., 051/293; US-4934040, 19900600, Turchan, 029/566; US-4935200, 19900600, LaSalle et al., 420/003; US-4940404, 19900700, Ammon et al., 419/028; US-4944756, 19900700, Kenna, 623/020; US-4957510, 19900900, Cremascoli, 623/023; US-4959066, 19900900, Dunn et al., 606/089; US-4959071, 19900900, Brown et al., 623/020; US-4961383, 19901000, Fishman et al., 102/517; US-4964766, 19901000, Turchan et al., 409/225; US-4964868, 19901000, Bloebaum, 623/020; US-4966750, 19901000, LaSalle et al., 420/003; US-4969910, 19901100, Frey et al., 623/022; US-4979957, 19901200, Hodorek, 623/020; US-5002578, 19910300, Luman, 623/023; US-5002579, 19910300, Copf et al., 623/023; US-5002580, 19910300, Noble et al., 623/023; US-5002581, 19910300, Paxson et al., 623/023; US-5009673, 19910400, Cho, 051/293; US-5011515, 19910400, Frushour, 051/307; US-5019103, 19910500, Van Zile et al., 623/020; US-5022894, 19910600, Vagarali et al., 051/293; US-5030233, 19910700, Ducheyne, 623/016; US-5037423, 19910800, Kenna, 606/088; US-5037439, 19910800, Albrektsson et al., 623/020; US-5037451, 19910800, Burnand et al., 051/293; US-5047060, 19910900, Henssge et al., 623/023; US-5047062, 19910900, Pappas et al., 623/023; US-5052339, 19911000, Vakerlis et al., 118/723; US-5054246, 19911000, Phaal et al., 051/204; US-5054682, 19911000, Mistry, 228/194; US-5055318, 19911000, Deutchman et al., 427/038; US-RE33767, 19911200, Christini et al., 428/544; US-5080685, 19920100, Bolesky et al., 623/023; US-5080752, 19920100, Kabacoff et al., 156/603; US-5082359, 19920100, Kirkpatrick, 359/642; US-5092687, 19920300, Hall, 384/303; US-5092895, 19920300, Albrektsson et al., 623/020; US-5092898, 19920300, Bekki et al., 623/022; US-5108432, 19920400, Gustavson, 623/016; US-5108451, 19920400, Forte, 623/023; US-5108452, 19920400, Lallin et al., 623/023; US-5116380, 19920500, Hewka et al., 623/023; US-5120327, 19920600, Dennis, 051/293; US-5127923, 19920700, Bunting et al., 051/293; US-5128146, 19920700, Hirayama et al., 424/484; US-5133757, 19920700, Sioshansi et al., 623/018; US-5133758, 19920700, Hollister, 623/020; US-5133763, 19920700, Mullers, 623/022; US-5152794, 19921000, Davidson, 623/016; US-5152795, 19921000, Soishansi et al., 623/016; US-5154023, 19921000, Sioshansi, 051/323; US-5154245, 19921000, Waldenstrom et al., 175/420.2; US-5156624, 19921000, Barnes, 623/022; US-5163963, 19921100, Hewka et al., 623/023; US-5171282, 19921200, Pequignot, 623/020; US-5171283, 19921200, Pappas et al., 623/020; US-5181926, 19930100, Koch et al., 623/022; US-5181928, 19930100, Bolesky et al., 623/023; US-5192323, 19930300, Shetty et al., 623/016; US-5194066, 19930300, Van Zile, 623/020; US-5197987, 19930300, Koch et al., 623/020; US-5211726, 19930500, Slutz et al., 051/293; US-5217081, 19930600, Waldenstrom et al., 175/420.2; US-5248317, 19930900, Tank et al., 051/293; US-5258022, 19931100, Davidson, 6
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이 특허에 인용된 특허 (79)
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Childers Robert W. (Garner NC) Gagne Donald R. (Raleigh NC), Method of enhanced penetration of low vapor pressure chemical vapor sterilants during sterilization.
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