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[미국특허] Catadioptric objective comprising two intermediate images 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02B-017/00
출원번호 US-0434702 (1999-11-05)
발명자 / 주소
  • Shafer, David R.
  • Herkommer, Alois
  • Schuster, Karl-Heinz
  • Furter, Gerd
  • von Bunau, Rudolf
  • Ulrich, Wilhelm
출원인 / 주소
  • Carl-Zeiss-Stiftung
인용정보 피인용 횟수 : 73  인용 특허 : 7

초록

An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a sec

대표청구항

An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a sec

이 특허에 인용된 특허 (7) 인용/피인용 타임라인 분석

  1. Shafer David R. ; Chuang Yung-Ho ; Tsai Bin-Ming B., Broad spectrum ultraviolet catadioptric imaging system.
  2. Haseltine Eric C. (Manhattan Beach CA) Jones Helene H. (Culver City CA), Catadioptric projector, catadioptric projection system and process.
  3. Takahashi Tomowaki,JPX, Catadioptric reduction projection optical system and exposure apparatus having the same.
  4. Elliott David J. (Wayland MA) Shafer David (Fairfield CT), Deep ultraviolet microlithography system.
  5. Allen Paul C., Magnification correction for small field scanning.
  6. Takahashi Tomowaki (Yokohama JPX), Optical apparatus.
  7. Weigel Wolfgang,DEX ; Roessel Wolfgang, Supplementary optical system for a camera.

이 특허를 인용한 특허 (73) 인용/피인용 타임라인 분석

  1. Mann, Hans-Juergen; Singer, Wolfgang, Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate.
  2. Shafer, David R.; Chuang, Yung-Ho, Broad band DUV, VUV long-working distance catadioptric imaging system.
  3. Shafer,David R.; Chuang,Yung Ho, Broad band DUV, VUV long-working distance catadioptric imaging system.
  4. Suenaga,Yutaka; Miyashita,Tomohiro; Yamaguchi,Kotaro, Catadioptric optical system and exposure apparatus equipped with the same.
  5. Nakano, Masatsugu, Catadioptric optical system with high numerical aperture.
  6. Nakano, Masatsugu; Sasian-Alvarado, Jose Manuel; Elazhary, Tamer T., Catadioptric optical system with multi-reflection element for high numerical aperture imaging.
  7. Epple, Alexander; Gruner, Toralf; Mueller, Ralf, Catadioptric projection objective.
  8. Epple,Alexander, Catadioptric projection objective.
  9. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  10. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  11. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  12. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  13. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  14. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  15. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  16. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  17. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  18. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  19. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  20. Shafer,David; Ulrich,Wilhelm; Dodoc,Aurelian; Von Buenau,Rudolf; Mann,Hans Juergen; Epple,Alexander, Catadioptric projection objective.
  21. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective including an aspherized plate.
  22. Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
  23. Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
  24. Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
  25. Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
  26. Epple, Alexander; Ulrich, Wilhelm; Dodoc, Aurelian; Mann, Hans-Juergen; Shafer, David, Catadioptric projection objective with mirror group.
  27. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; von Buenau, Rudolf Murai; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective with parallel, offset optical axes.
  28. Epple, Alexander, Catadioptric projection objective with pupil mirror, projection exposure apparatus and projection exposure method.
  29. Omura, Yasuhiro, Catadioptric projection optical system, exposure apparatus, and exposure method.
  30. Hudyma,Russell, Catadioptric projection system for 157 nm lithography.
  31. Takahashi,Tomowaki, Catadioptric system and exposure device having this system.
  32. Shafer, David R.; Chuang, Yung-Ho; Armstrong, J. Joseph, High performance catadioptric imaging system.
  33. Shafer,David R.; Chuang,Yung Ho; Armstrong,J. Joseph, High performance catadioptric imaging system.
  34. Dodoc, Aurelian, High-NA projection objective.
  35. Mann, Hans-Juergen, Imaging optical system and related installation and method.
  36. Shafer, David; Dodoc, Aurelian; Epple, Alexander; Mann, Hans-Juergen, Imaging system with mirror group.
  37. Shafer, David R.; Ulrich, Wilhelm; Dodoc, Aurelian; von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Immersion catadioptric projection objective having two intermediate images.
  38. Loering, Ulrich; Blahnik, Vladan; Ulrich, Wilhelm; Kraehmer, Daniel; Wabra, Norbert, Lithography projection objective, and a method for correcting image defects of the same.
  39. Loering, Ulrich; Blahnik, Vladan; Ulrich, Wilhelm; Kraehmer, Daniel; Wabra, Norbert, Lithography projection objective, and a method for correcting image defects of the same.
  40. Loering, Ulrich; Blahnik, Vladan; Ulrich, Wilhelm; Kraehmer, Daniel; Wabra, Norbert, Lithography projection objective, and a method for correcting image defects of the same.
  41. Conradi, Olaf; Feldmann, Heiko; Richter, Gerald; Bleidistel, Sascha; Frommeyer, Andreas; Gruner, Toralf; Hummel, Wolfgang, Method for improving the imaging properties of a projection objective, and such a projection objective.
  42. Conradi, Olaf; Feldmann, Heiko; Richter, Gerald; Bleidistel, Sascha; Frommeyer, Andreas; Gruner, Toralf; Hummel, Wolfgang, Method for improving the imaging properties of a projection objective, and such a projection objective.
  43. Mann, Hans-Juergen; Schoeppach, Armin; Zellner, Johannes, Microlithographic imaging optical system including multiple mirrors.
  44. Shafer, David R.; Hudyma, Russell; Ulrich, Wilhelm, Microlithographic reduction projection catadioptric objective.
  45. Schuster, Karl-Heinz; Clauss, Wilfried, Microlithography projection objective with crystal lens.
  46. Epple, Alexander; Mizkewicz, Ella; Feldmann, Heiko, Optical imaging device and imaging method for microscopy.
  47. Mann, Hans-Juergen; Feldmann, Heiko, Optical imaging device and imaging method for microscopy.
  48. Epple,Alexander; Gruner,Toralf; Singer,Wolfgang, Optical system for ultraviolet light.
  49. Kamenow,Vladimir; Kraehmer,Daniel; Totzeck,Michael; Gruner,Toralf; Dodoc,Aurelian; Shafer,David; Ulrich,Wilhelm; von Buenau,Rudolf; Mann,Hans Juergen; Epple,Alexander, Projection exposure apparatus.
  50. Rostalski, Hans-Juergen; Feldmann, Heiko; Ulrich, Wilhelm, Projection exposure apparatus, projection exposure method and projection objective.
  51. Fuerter, Gerhard; Wagner, Christian; Goedecke, Uwe; Mueller, Henriette, Projection exposure system having a reflective reticle.
  52. Beder, Susanne; Singer, Wolfgang; Schuster, Karl-Heinz, Projection objective having a high aperture and a planar end surface.
  53. Beder,Susanne; Singer,Wolfgang; Schuster,Karl Heinz, Projection objective having a high aperture and a planar end surface.
  54. Yuuki, Hiroyuki; Kato, Takashi, Projection optical system.
  55. Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
  56. Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
  57. Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
  58. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  59. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  60. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  61. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  62. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  63. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  64. Omura,Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  65. Omura,Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  66. Omura,Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  67. Mann, Hans-Juergen, Projection optics for microlithography.
  68. Shafer,David, Projection system, in particular for a microlithographic projection exposure apparatus.
  69. Omura, Yasuhiro, Reducing immersion projection optical system.
  70. Omura, Yasuhiro, Reducing immersion projection optical system.
  71. Omura, Yasuhiro, Reduction projection optical system, exposure apparatus, and exposure method.
  72. Omura, Yasuhiro, Reduction projection optical system, exposure apparatus, and exposure method.
  73. Omura, Yasuhiro, Reduction projection optical system, exposure apparatus, and exposure method.

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