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Lots dispatching method for variably arranging processing equipment and/or processing conditions in a succeeding process according to the results of a preceding process and apparatus for the same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06F-019/00
출원번호 US-0644294 (2000-08-23)
우선권정보 KR-0046227 (1999-10-23)
발명자 / 주소
  • Cho, Dae-Sik
  • Chae, Hee-Sun
  • Kim, Seok-Hyun
  • Tong, Seung-Hoon
  • Yoon, Tae-Yang
  • Kwak, Doh-Soon
  • Kang, Hee-Se
  • Park, Yll-Seug
  • Oh, Jae-Seok
출원인 / 주소
  • Samsung Electronics Co., Ltd.
대리인 / 주소
    Volentine Francos, PLLC
인용정보 피인용 횟수 : 43  인용 특허 : 8

초록

A lot dispatching method and system for variably applying the most suitable processing equipment and/or processing condition in a succeeding process of a semiconductor manufacturing process, wherein the succeeding process is influenced by the result of a preceding process. A lot processed by the pre

대표청구항

A lot dispatching method and system for variably applying the most suitable processing equipment and/or processing condition in a succeeding process of a semiconductor manufacturing process, wherein the succeeding process is influenced by the result of a preceding process. A lot processed by the pre

이 특허에 인용된 특허 (8)

  1. Chen Ming Chun ; Steffan Paul J. ; Zika Steven J., Automatic defect classification individual defect predicate value retention.
  2. Rosenthal Peter A. ; Solomon Peter R. ; Bonanno Anthony S. ; Eikleberry William J., Cell control method and apparatus.
  3. La Tho Le ; Shiau Ying, Defect management system for productivity and yield improvement.
  4. Yang Terry H.,TWX ; Chu Harry L.,TWX, Method and apparatus for dispatching lots in a factory.
  5. Iwasaki Takemasa (Yokohama JPX) Shimoyashiro Sadao (Fujisawa JPX) Ohya Haruo (Yokohama JPX) Kikuchi Hiroshi (Kanagawa JPX) Takahashi Tsutomu (Yokohama JPX) Watanabe Masahiro (Yokohama JPX), Production system with order of processing determination.
  6. Hattori Nobuyoshi,JPX ; Yamana Kaoru,JPX ; Tamada Tomoki,JPX, Quality management system and recording medium.
  7. Ban Cozy,JPX ; Demizu Kiyoshi,JPX, Semiconductor manufacturing non-processing apparatuses with storage equipment.
  8. Saka Nobuo (Kanazawa JPX) Oda Junichi (Kahoku JPX) Ishiyama Yasuaki (Kahoku JPX) Miyasaka Kazumi (Kahoku JPX) Sasaki Katsunao (Kahoku JPX) Terabayashi Eiichi (Kahouku JPX) Terashima Hiroyoshi (Kanaza, Versatile production system and pallet used for the system.

이 특허를 인용한 특허 (43)

  1. Higashide, Masanobu; Sadakuni, Gouki, Abnormality detection system and method of detecting abnormality.
  2. Paik,Young J., Adjusting manufacturing process control parameter using updated process threshold derived from uncontrollable error.
  3. Schwarm,Alexander T., Automated design and execution of experiments with integrated model creation for semiconductor manufacturing tools.
  4. Krishna,Murali; Deng,Yi; Varadhan,Aishwarya; Concelman,Joseph J.; Henkel,Zachary T.; Madson,Robert A., Automated, modular approach to assigning semiconductor lots to tools.
  5. Hsieh, Pei-Chen, Automatic production quality control method and system.
  6. Shin, Tomonori; Okamura, Kouji; Kaneko, Tomohiro; Miyata, Akira; Fujimaru, Syuzo, Coating and developing apparatus, operating method for same, and storage medium for the method.
  7. Arackaparambil,John F.; Chi,Tom; Chow,Billy; D'Souza,Patrick M.; Hawkins,Parris; Huang,Charles; Jensen,Jett; Krishnamurthy,Badri N.; Kulkarni,Pradeep M.; Kulkarni,Prakash M.; Lin,Wen Fong; Mohan,Shan, Computer integrated manufacturing techniques.
  8. Arackaparambil,John F.; Chi,Tom; Chow,Billy; D'Souza,Patrick M.; Hawkins,Parris; Huang,Charles; Jensen,Jett; Krishnamurthy,Badri N.; Kulkarni,Pradeep M.; Kulkarni,Prakash M.; Lin,Wen Fong; Mohan,Shan, Computer integrated manufacturing techniques.
  9. Paik, Young Joseph, Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life.
  10. Paik,Young Joseph, Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life.
  11. Chen,Yen Hung, Dispatch method and system.
  12. Ward, Nicholas A.; Danielson, Richard; Corey, David B., Dynamic control of wafer processing paths in semiconductor manufacturing processes.
  13. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
  14. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
  15. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
  16. Paik, Young Jeen, Dynamic offset and feedback threshold.
  17. Chi, Yueh-Shian; Hawkins, Parris C M; Huang, Charles Q., Dynamic subject information generation in message services of distributed object systems.
  18. Chi,Yueh shian T.; Hawkins,Parris C. M.; Huang,Charles Q., Dynamic subject information generation in message services of distributed object systems in a semiconductor assembly line facility.
  19. Stewart, Edward C., Dynamic tool scheduling based upon defects.
  20. Kuo,Wen Chang; Huang,Chien Chung; Yang,Huei Wen; Huang,Yi Lin, Experiment management system and method thereof in semiconductor manufacturing environment.
  21. Krishnamurthy,Badri N.; Hawkins,Parris C. M., Experiment management system, method and medium.
  22. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T.; Prabhu, Gopalakrishna B., Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles.
  23. Shanmugasundram,Arulkumar P.; Schwarm,Alexander T.; Prabhu,Gopalakrishna B., Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles.
  24. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T.; Iliopoulos, Ilias; Parkhomovsky, Alexander; Seamons, Martin J., Feedback control of plasma-enhanced chemical vapor deposition processes.
  25. Paik,Young Joseph, Feedforward and feedback control for conditioning of chemical mechanical polishing pad.
  26. Kawamura, Daisuke, Film forming apparatus, manufacturing management system and method of manufacturing semiconductor devices.
  27. Reiss,Terry P.; Shanmugasundram,Arulkumar P.; Schwarm,Alexander T., Integration of fault detection with run-to-run control.
  28. Lai, Mu-Hsuan, Message management system and method.
  29. Purdy, Matthew A., Method and apparatus for scheduling a plurality of processing tools.
  30. Ouyang, Xu; Gluschenkov, Oleg; Song, Yunsheng; Wong, Keith Kwong Hon, Method for optimizing the routing of wafers/lots based on yield.
  31. Shafer, Scott; Stockner, Alan; Tian, Ye, Method for predicting the quality of a product.
  32. Schwarm,Alexander T.; Shanmugasundram,Arulkumar P.; Pan,Rong; Hernandez,Manuel; Mohammad,Amna, Method of feedback control of sub-atmospheric chemical vapor deposition processes.
  33. Kokotov,Yuri; Entin,Efim; Seror,Jacques; Fisher,Yossi; Sarel,Shalomo; Shanmugasundram,Arulkumar P.; Schwarm,Alexander T.; Paik,Young Jeen, Method, system and medium for controlling manufacture process having multivariate input parameters.
  34. Al Bayati,Amir; Adibi,Babak; Foad,Majeed; Somekh,Sasson, Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements.
  35. Shanmugasundram,Arulkumar P.; Armer,Helen; Schwarm,Alexander T., Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities.
  36. Schwarm,Alexander T.; Shanmugasundram,Arulkumar P.; Seror,Jacques; Kokotov,Yuri; Entin,Efim, Method, system, and medium for handling misrepresentative metrology data within an advanced process control system.
  37. Krisnamuthi, Thangappan; Chik, Mohd Azizi; Ung, Tin Tin; Lim, Kian Wee; Markle, Stephen Todd, Methods and apparatus for white space reduction in a production facility.
  38. Helwig,Christofer C, Process control apparatus, systems, and methods.
  39. Paik,Young J., Process control by distinguishing a white noise component of a process variance.
  40. Paik,Young Jeen, Process control by distinguishing a white noise component of a process variance.
  41. Padhi,Deenesh; Gandikota,Srinivas; Naik,Mehul; Parikh,Suketu A.; Dixit,Girish A., Selective metal encapsulation schemes.
  42. Schwarm,Alexander T., System, method, and medium for monitoring performance of an advanced process control system.
  43. Surana,Rahul; Zutshi,Ajoy, Technique for process-qualifying a semiconductor manufacturing tool using metrology data.
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