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A system for handling a bulk particulate material generally consisting of a vessel for holding a mass of such material; a first elongated tube formed of a gas permeable material, having an inlet communicating with such vessel; a second elongated tube formed of a gas impervious material encompassing

A system for handling a bulk particulate material generally consisting of a vessel for holding a mass of such material; a first elongated tube formed of a gas permeable material, having an inlet communicating with such vessel; a second elongated tube formed of a gas impervious material encompassing the first tube and spaced therefrom about the periphery of the first tube; a plurality of transversely disposed, longitudinally spaced partitions disposed between said first and second tubes, forming a plurality of isolated chambers encompassing the first tube; each of such isolated chambers having means for selectively introducing a fluidizing gas therein independently of the other of such chambers, at variable volumes and pressures whereby the volume and pressure of fluidizing gas diffused through the first tube may be modulated along the length thereof; and means for injecting a flow inducing gas into the first tube.

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A system for handling a bulk particulate material generally consisting of a vessel for holding a mass of such material; a first elongated tube formed of a gas permeable material, having an inlet communicating with such vessel; a second elongated tube formed of a gas impervious material encompassing

A system for handling a bulk particulate material generally consisting of a vessel for holding a mass of such material; a first elongated tube formed of a gas permeable material, having an inlet communicating with such vessel; a second elongated tube formed of a gas impervious material encompassing the first tube and spaced therefrom about the periphery of the first tube; a plurality of transversely disposed, longitudinally spaced partitions disposed between said first and second tubes, forming a plurality of isolated chambers encompassing the first tube; each of such isolated chambers having means for selectively introducing a fluidizing gas therein independently of the other of such chambers, at variable volumes and pressures whereby the volume and pressure of fluidizing gas diffused through the first tube may be modulated along the length thereof; and means for injecting a flow inducing gas into the first tube. he rest station is approximately the same as the elevation of the cooling station. 7. A substrate processing system comprising: a substrate handling chamber; a load lock chamber having a gated inlet for the transfer of a substrate into and out of the load lock chamber, and having a gated port for transferring a substrate between the load lock chamber and the substrate handling chamber; a staging shelf in the handling chamber positioned above the load lock chamber; and a first substrate handler in the substrate handling chamber for moving a substrate between the load lock chamber and the staging shelf; wherein the staging shelf is supported on an upper wall of the load lock chamber. 8. A substrate processing system comprising: a substrate handling chamber; a load lock chamber having a gated inlet for the transfer of a substrate into and out of the load lock chamber, and having a gated port for transferring a substrate between the load lock chamber and the substrate handling chamber; a staging shelf in the handling chamber positioned above the load lock chamber; and a first substrate handler in the substrate handling chamber for moving a substrate between the load lock chamber and the staging shelf; wherein the load lock chamber is defined by a bottom wall that mates with a recessed area formed in a bottom wall of the substrate handler chamber. 9. A substrate processing system comprising: a substrate handling chamber; a load lock chamber having a gated inlet for the transfer of a substrate into and out of the load lock chamber, and having a gated port for transferring a substrate between the load lock chamber and the substrate handling chamber; a staging shelf in the handling chamber positioned above the load lock chamber; and a first substrate handler in the substrate handling chamber for moving a substrate between the load lock chamber and the staging shelf, wherein the substrate handling chamber comprises a housing having a bottom wall and at least one vertically extending side wall, and the bottom wall and portions of said side wall form a recess that forms an upper wall and portions of a side wall of the load lock chamber. 10. A method of processing semiconductor substrates comprising: placing a first substrate at a load lock station that is located inside a load lock; moving the first substrate from the load lock station to a staging shelf located above the load lock station and inside a substrate handling chamber; moving a second substrate from a cooling station in the substrate handling chamber to the load lock station; moving a third substrate from a substrate processing chamber to the cooling station; and moving the first substrate from the staging shelf to the processing chamber. 11. The method of claim 10, wherein moving the first substrate from the load lock to the staging shelf includes moving a first substrate carrier from the load lock to the staging shelf with the substrate positioned on the carrier. 12. The method of claim 10, wherein moving the third substrate from the substrate processing module to the cooling station includes removing the third substrate from the processing module with a second substrate handler and transferring the third substrate from the second substrate handler to a first substrate handler. 13. The method of claim 12, wherein transferring the third substrate from the second substrate handler to the second substrate handler occurs generally over a rest station. 14. The method of claim 10, wherein moving the first substrate from the staging shelf to the processing chamber includes transferring the first substrate from a first substrate handler to a second substrate handler. 15. The method of claim 14, wherein transferring the first substrate from the first substrate handler to the second substrate handler occurs generally over the rest station. 16. The method of claim 10, further comprising moving the third substrate from the cooling station to the load lock and removing the third substrate from the load lock. 17. A method of processing semiconductor substrates comprising: placing a first substrate at a load lock station that is located inside a load lock; moving the first substrate from the load lock station to a staging shelf located inside a substrate handling chamber; moving a second substrate from a cooling station in the substrate handling chamber to the load lock station; moving a third substrate from a substrate processing chamber to the cooling station; and moving the first substrate from the staging shelf to the processing chamber; wherein moving the third substrate from the substrate processing module to the cooling station includes removing the third substrate from the processing module with a second substrate handler and transferring the third substrate from the second substrate handler to a first substrate handler and wherein moving the third substrate from the substrate processing module to the cooling station further includes picking up a third substrate carrier from a rest station with the first substrate handler and placing the substrate on the third substrate carrier with the second substrate handler. 18. A method of processing semiconductor substrates comprising: placing a first substrate at a load lock station that is located inside a load lock; moving the first substrate from the load lock station to a staging shelf located inside a substrate handling chamber; moving a second substrate from a cooling station in the substrate handling chamber to the load lock station; moving a third substrate from a substrate processing chamber to the cooling station; and moving the first substrate from the staging shelf to the processing chamber; wherein moving the third substrate from the substrate processing module to the cooling station includes removing the third substrate from the processing module with a second substrate handler and transferring the third substrate from the second substrate handler to a first substrate handler and wherein moving the first substrate from the staging shelf to the processing chamber further includes moving a first substrate carrier with the first substrate from staging shelf station and placing the first substrate carrier at the rest station after the first substrate has been transferred to the second substrate handler. 19. The method of claim 18, wherein moving the first substrate from the staging shelf to the processing chamber occurs before removing the third substrate from the load lock. 20. A substrate processing system comprising a substrate handling chamber, a load lock port in a wall of the substrate handling chamber for the transfer of a substrate from a load lock chamber to the substrate handling chamber, a staging shelf, a rest station, a cooling station all within the substrate handling chamber, a first substrate handler configured to move the substrate to and from the load lock chamber, the staging shelf, the rest station and the cooling station and a second substrate handler within the substrate handling chamber that includes a paddle with a Bernoulli wand configured to pickup a substrate from the first substrate handler and move the substrate from the substrate handling chamber through a processing chamber port in a wall of the substrate handling chamber and into a substrate processing chamber. 21. The substrate processing system of claim 20, further comprising three substrate carriers that are configured to support substrates, the first substrate handler being configured to move the substrate carriers between the load lock, the staging shelf, the rest station and the cooling station. 22. A substrate processing system comprising a substrate handling chamber, a load lock port in a wall of the substrate handling chamber for transferring a substrate from a load lock chamber into the substrate handling chamber, a first substrate handler configured to rotate, extend and retract to move substrates to and f rom one or more positions within the substrate handling chamber and a second substrate handler positioned on a fixed track and including a Bernoulli wand for straight line movement to move a substrate into and out of a substrate processing chamber adjacent the substrate handling chamber, the first substrate handler and the second substrate handler configured such that a substrate can be positioned by the first substrate handler within the substrate handling chamber beneath the Bernoulli wand to transfer the substrate between the first substrate handler and the second substrate handler. 23. The substrate processing system of claim 22, wherein the first substrate handler is also configured to move in a vertical direction as well as horizontal directions. 24. The substrate processing system of claim 22, wherein the first substrate handler is configured to move a substrate carrier with a substrate positioned on the substrate carrier and the second substrate handler is arranged to lift a substrate from a substrate carrier.