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Supercritical fluid delivery and recovery system for semiconductor wafer processing 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/10
출원번호 US-0837507 (2001-04-18)
발명자 / 주소
  • Costantini, Michael A.
  • Chandra, Mohan
  • Moritz, Heiko D.
  • Jafri, Ijaz H.
  • Mount, David J.
  • Heathwaite, Rick M.
출원인 / 주소
  • S.C. Fluids, INC
대리인 / 주소
    Maine & Asmus
인용정보 피인용 횟수 : 37  인용 특허 : 17

초록

A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical car

대표청구항

A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical car

이 특허에 인용된 특허 (17)

  1. A. Duane Preston ; Jon R. Turner ; Charles Svoboda, Carbon dioxide dry cleaning system.
  2. Sewter Bruce R. (Browns Mills NJ) Clemons ; Jr. Lester (Monroeville PA) Battaglia Joseph A. (Forest Hills PA) DeBarber Thomas A. (Cayucos CA), Continuous circulation water wash apparatus and method for cleaning radioactively contaminated garments.
  3. Dewees Thomas G. (Pleasanton CA) Knafelc Frank M. (Lafayette CA) Mitchell James D. (Alamo CA) Taylor R. Gregory (Pleasanton CA) Iliff Robert J. (Oakley CA) Carty Daniel T. (Danville CA) Latham James , Liquid/supercritical carbon dioxide dry cleaning system.
  4. Paranjpe Ajit P. (Plano TX), Method for cleaning semiconductor wafers using liquified gases.
  5. Matthews John C. (Gaithersburg MD) Wooten Robert D. (Rockville MD) Ferris David S. (Washington DC) Rounds Stuart N. (Germantown MD), Method for photoresist stripping using reverse flow.
  6. Stucker John F., Method for rejuvenating pressurized fluid solvent used in cleaning a fabric article.
  7. Smith ; Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA), Method of cleaning workpiece with solvent and then with liquid carbon dioxide.
  8. Smith ; Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA), Precision cleaning vessel.
  9. Wetmore Paula M. (5 S. Webster St. Bradford MA 01835) Krukonis Val J. (287 Emerson Rd. Lexington MA 02173) Coffey Michael P. (5 Blood Rd. Townsend MA 01469), Pressure pulse cleaning.
  10. Malchow Gregory L. ; Harris Stephen L. ; Kegler Andrew, Pressure vessel door operating apparatus.
  11. Ranes Randy L. (League City TX), Pressurized closed flow cleaning system.
  12. Chao Sidney C. ; Beach Robert W. ; Sorbo Nelson W. ; Purer Edna M., Process for cleaning, disinfecting, and sterilizing materials using the combination of dense phase gas and ultraviolet radiation.
  13. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Residue removal by supercritical fluids.
  14. Moslehi Mehrdad M. (Dallas TX), Semiconductor wafer cleaning using condensed-phase processing.
  15. Lansberry Don D. (Kaysville UT) Council Thomas G. (Camarillo CA), Supercritical fluid recirculating system for a precision inertial instrument parts cleaner.
  16. Farmer Robert B. ; Jones Bernard D. ; Gupta Kedar P. ; Jafri Ijaz H. ; Dispensa Derek M., Supercritical phase wafer drying/cleaning system.
  17. McClain James B. ; Brainard David E. ; Cole Michael E. ; Worm Steve L., System for the control of a carbon dioxide cleaning apparatus.

이 특허를 인용한 특허 (37)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Shrinivasan,Krishnan; Banerjee,Souvik; Juarez,Francisco; Reinhardt,Karen A.; Gopinath,Sanjay, Apparatus and methods for processing semiconductor substrates using supercritical fluids.
  3. Homan, Jeffrey J.; Arno, Jose I.; Sweeney, Joseph D., Apparatus and process for integrated gas blending.
  4. Leitch, Kelly; Hartigan, Gavin; D'Orazio, Robert, CO2 recovery process for supercritical extraction.
  5. Kinomura,Yoshitaka; Hiraoka,Teruo; Ohkawa,Kojiro, Cleaning apparatus.
  6. Yoshida, Takashi; Iwasaki, Motoaki; Yano, Tatsuro; Habaya, Kurao; Shiroma, Takahiro, Cleaning method and apparatus.
  7. Irie,Yousuke; Morita,Kiyoyuki; Suzuki,Masaaki; Adachi,Akihisa; Hashimoto,Masahiko, Cleaning method and cleaning apparatus.
  8. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  9. DeYoung,James P.; McClain,James B.; Gross,Stephen M., Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems.
  10. Cotte,John M.; McCullough,Kenneth John; Moreau,Wayne Martin; Petrarca,Kevin; Simons,John P.; Taft,Charles J.; Volant,Richard, Dielectric material.
  11. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  12. Leitch, Kelly; Silveira, Danny, High pressure CO2 purification and supply system.
  13. Leitch,Kelly; Silveira,Danny, High pressure COpurification and supply system.
  14. Jones, William D., High pressure fourier transform infrared cell.
  15. Yamagata, Masahiro; Oshiba, Hisanori; Sakashita, Yoshihiko; Inoue, Yoichi; Muraoka, Yusuke; Saito, Kimitsugu; Mizobata, Ikuo; Kitakado, Ryuji, High pressure processing apparatus.
  16. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  17. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  18. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  19. Arno,Jose I.; Dietz,James A., In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration.
  20. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  21. Pawloski, Adam R.; Abdo, Amr Y.; Amblard, Gilles R.; LaFontaine, Bruno M.; Lalovic, Ivan; Levinson, Harry J.; Schefske, Jeffrey A.; Tabery, Cyrus E.; Tsai, Frank, Method for removal of immersion lithography medium in immersion lithography processes.
  22. Elliott, David J.; Millman, Jr., Ronald P.; Tardif, Murray; Aiello, Krista, Method for surface cleaning.
  23. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  24. Arno, Jose I., Photometrically modulated delivery of reagents.
  25. Arno, Jose I., Photometrically modulated delivery of reagents.
  26. Arno,Jose I., Photometrically modulated delivery of reagents.
  27. Arno,Jose I., Photometrically modulated delivery of reagents.
  28. Hansen,Brian Nils; Crouch,Samuel Wesley; Hybertson,Brooks Michael, Pressure processing apparatus with improved heating and closure system.
  29. Wuester,Christopher D., Process flow thermocouple.
  30. Billingham,John Frederic; Bergman, Jr.,Thomas John; Kelly,Richard Martin; Burgers,Kenneth Leroy; Kobayashi,William Thoru, Process for carbon dioxide recovery from a process tool.
  31. Cotte,John M.; McCullough,Kenneth John; Moreau,Wayne Martin; Petrarca,Kevin; Simons,John P.; Taft,Charles J.; Volant,Richard, Process of insulating a semiconductor device using a polymeric material.
  32. Inoue, Yuki; Fukunaga, Akira; Ogawa, Takahiro, Substrate processing method, substrate processing apparatus, and control program.
  33. Lee, Ho Kyung; Lee, In Gyoo; Park, Myung Jun; Koo, Kee-Kahb; Kim, Jae-Kyeong, System and method for recycling high-boiling-point waste photoresist stripper.
  34. Lee, Ho Kyung; Lee, In Gyoo; Park, Myung Jun; Koo, Kee-Kahb; Kim, Jae-Kyeong, System and method for recycling high-boiling-point waste photoresist stripper.
  35. Gershtein,Vladimir Yliy; Mattiola,Paul Anthony, System for supply and delivery of carbon dioxide with different purity requirements.
  36. Gershtein,Vladimir Yliy; Mattiola,Paul Anthony; Cirucci,John Frederick; Ivankovits,John Christopher, System for supply and delivery of high purity and ultrahigh purity carbon dioxide.
  37. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
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