초록 ▼

A method for preparing a semiconductor wafer surface is provided which includes providing a plurality of source inlets and a plurality of source outlets and applying isopropyl alcohol (IPA) vapor gas through the plurality of source inlets to the wafer surface when the plurality of source inlets and

A method for preparing a semiconductor wafer surface is provided which includes providing a plurality of source inlets and a plurality of source outlets and applying isopropyl alcohol (IPA) vapor gas through the plurality of source inlets to the wafer surface when the plurality of source inlets and outlets are in close proximity to the wafer surface. The method also includes applying a fluid through the plurality of source inlets to the wafer surface while applying the IPA vapor gas, and removing the applied IPA vapor gas and fluid from the wafer surface through the plurality of source outlets.

대표청구항 ▼

A method for preparing a semiconductor wafer surface is provided which includes providing a plurality of source inlets and a plurality of source outlets and applying isopropyl alcohol (IPA) vapor gas through the plurality of source inlets to the wafer surface when the plurality of source inlets and

A method for preparing a semiconductor wafer surface is provided which includes providing a plurality of source inlets and a plurality of source outlets and applying isopropyl alcohol (IPA) vapor gas through the plurality of source inlets to the wafer surface when the plurality of source inlets and outlets are in close proximity to the wafer surface. The method also includes applying a fluid through the plurality of source inlets to the wafer surface while applying the IPA vapor gas, and removing the applied IPA vapor gas and fluid from the wafer surface through the plurality of source outlets. said articulated suction duct are further suctioned downstream through said remote plenum unit, and further suctioned downstream through said elongated duct where they are suctioned into said main unit. 7. A portable airborne contamination control system as claimed in claim 6 wherein said articulated suction duct has a proximal downstream side and an upstream distal side, said articulated suction duct proximal downstream side is attached to said remote plenum unit upstream entrance port. 8. A portable airborne contamination control system as claimed in claim 7 wherein said articulated suction duct upstream distal side includes a mounting means adapted for mounting a filter thereto, whereby said filter acts a pre-filter, collecting the overspray and the errant particles thereon. 9. A portable airborne contamination control system as claimed in claim 6 wherein a filter system is located intermediate said main unit upstream inlet port and said main unit downstream outlet port. 10. A portable airborne contamination control system as claimed in claim 6 wherein said main unit downstream exhaust port is adapted to include an exhaust duct mounting means, said exhaust duct mounting means having an elongated exhaust duct mounted thereon. 11. A portable airborne contamination control system as claimed in claim 10 wherein said elongated exhaust duct has a proximal upstream end and a downstream distal end, said downstream distal end being placed at an appropriate location away from said main unit permitting the suctioned air, overspray, and errant particles to be conveyed away from main unit. 12. A portable airborne contamination control system as claimed in claim 6 wherein said remote plenum unit and said main unit are both adapted to be rolled on wheels.