$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Multi-lens type electrostatic lens, electron beam exposure apparatus and charged beam applied apparatus using the lens, and device manufacturing method using these apparatuses 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G21K-007/00
  • G01N-023/00
출원번호 US-0688223 (2000-10-16)
우선권정보 JP-0295698 (1999-10-18)
발명자 / 주소
  • Okunuki, Masahiko
출원인 / 주소
  • Canon Kabushiki Kaisha
대리인 / 주소
    Fitzpatrick, Cella, Harper & Scinto
인용정보 피인용 횟수 : 31  인용 특허 : 2

초록

Each of a plurality of electrostatic lens has inner walls of a plurality of lens apertures, which are formed by an electrode laid out around each beam axis, and high-resistance portions which are bonded to the electrode and are laid out on two sides of the electrode in the beam axis direction, and a

대표청구항

Each of a plurality of electrostatic lens has inner walls of a plurality of lens apertures, which are formed by an electrode laid out around each beam axis, and high-resistance portions which are bonded to the electrode and are laid out on two sides of the electrode in the beam axis direction, and a

이 특허에 인용된 특허 (2)

  1. Muraki Masato,JPX ; Gotoh Susumu,JPX, Electron beam exposure apparatus and method, and device manufacturing method.
  2. Tsukamoto Takeo (Atsugi JPX) Miyawaki Mamoru (Tokyo JPX) Kaneko Tetsuya (Yokohama JPX) Suzuki Akira (Yokohama JPX) Shimoda Isamu (Zama JPX) Takeda Toshihiko (Tokyo JPX) Okunuki Masahiko (Tokyo JPX), Electron emission device.

이 특허를 인용한 특허 (31)

  1. Blanding,Curt; Stovall,Scott C., Beam blanker driver system and method.
  2. Yamashita, Hiroshi; Matsumoto, Hiroshi; Chiba, Kazuhiro, Blanking aperture array and charged particle beam writing apparatus.
  3. Winkler, Dieter; Petrov, Igor, Charged particle beam device with dynamic focus and method of operating thereof.
  4. Van Veen, Alexander Hendrik Vincent; Urbanus, Willem Henk, Charged particle lithography system and beam generator.
  5. Zonnevylle, Aernout Christiaan; Kruit, Pieter, Charged particle multi-beam apparatus including a manipulator device for manipulation of one or more charged particle beams.
  6. Berry, III, Ivan L.; Lill, Thorsten; Reynolds, Kenneth Reese, Differentially pumped reactive gas injector.
  7. Yamada, Shuji, Electrode of electrostatic lens and method of manufacturing the same.
  8. Yagi, Takayuki; Ono, Haruhito; Shimada, Yasuhiro, Electron optical system array, charged-particle beam exposure apparatus using the same, and device manufacturing method.
  9. Shimada, Yasuhiro; Yagi, Takayuki; Ono, Haruhito, Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method.
  10. Shimada, Yasuhiro; Yagi, Takayuki; Ono, Haruhito; Maehara, Hiroshi, Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method.
  11. Ono, Haruhito; Yagi, Takayuki, Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method.
  12. Ono, Haruhito; Muraki, Masato, Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method.
  13. Ono,Haruhito; Muraki,Masato, Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method.
  14. Ono,Haruhito; Muraki,Masato, Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method.
  15. Sando, Kazuhiro, Electrostatic lens.
  16. Noguchi, Yukio, Electrostatic lens and charged particle beam apparatus using the same.
  17. Steenbrink, Stijn Willem Herman Karel; Koning, Johan Joost; Veltman, Peter, Electrostatic lens structure.
  18. Van Veen, Alexander Hendrik Vincent; Urbanus, Willem Henk, High voltage shielding and cooling in a charged particle beam generator.
  19. Desieres, Yohan; Nicolas, Pierre; Gillot, Charlotte; Gidon, Serge; Martin, Jean-Luc, Hybrid multibeam electronic emission device with controlled divergence.
  20. Lill, Thorsten; Berry, III, Ivan L.; Ricci, Anthony, Ion beam etching utilizing cryogenic wafer temperatures.
  21. Berry, III, Ivan L.; Lill, Thorsten, Ion injector and lens system for ion beam milling.
  22. Berry, III, Ivan L.; Lill, Thorsten, Ion injector and lens system for ion beam milling.
  23. Dorai, Rajesh; Kurunczi, Peter F.; Perel, Alexander S.; Platow, Wilhelm P., Method and apparatus for controlling beam current uniformity in an ion implanter.
  24. Nagae,Kenichi; Ono,Haruhito; Tanimoto,Sayaka, Multi-charged beam lens and charged beam exposure apparatus using the same.
  25. Ono, Haruhito; Nagae, Kenichi; Takakuwa, Masaki; Nakayama, Yoshinori; Muto, Harunobu, Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method.
  26. Wieland, Marco Jan-Jaco; Urbanus, Willem Henk, Multi-electrode electron optics.
  27. Urbanus, Willem Henk; Wieland, Marco Jan-Jaco, Multi-electrode stack arrangement.
  28. Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximilian; Casares, Antonio; Rogers, Steven, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
  29. Wu, Ching, Practical ion mobility spectrometer apparatus and methods for chemical and/or biological detection.
  30. Wu, Ching, Practical ion mobility spectrometer apparatus and methods for chemical and/or biological detection.
  31. Berry, III, Ivan L.; Lill, Thorsten, Use of ion beam etching to generate gate-all-around structure.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로