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[미국특허] Catadioptric objective 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02B-017/00
  • G02B-023/00
출원번호 US-0741863 (2000-12-22)
우선권정보 DE-0039586 (1996-09-26); DE-0002626 (2000-01-22)
발명자 / 주소
  • Schuster, Karl Heinz
출원인 / 주소
  • Carl-Zeiss-Stiftung
대리인 / 주소
    Ottesen, Walter
인용정보 피인용 횟수 : 50  인용 특허 : 9

초록

An aspheric reduction objective has a catadioptric partial objective (L1), an intermediate image (IMI) and a refractive partial objective (L2). The catadioptric partial objective has an assembly centered to the optical axis and this assembly includes two mutually facing concave mirrors (M1, M2). The

대표청구항

An aspheric reduction objective has a catadioptric partial objective (L1), an intermediate image (IMI) and a refractive partial objective (L2). The catadioptric partial objective has an assembly centered to the optical axis and this assembly includes two mutually facing concave mirrors (M1, M2). The

이 특허에 인용된 특허 (9) 인용/피인용 타임라인 분석

  1. Shafer David (Fairfield CT), Catadioptric imaging system.
  2. Palmer John M. (Clwyd GB7), Catadioptric infrared lenses.
  3. Haseltine Eric C. (Manhattan Beach CA) Jones Helene H. (Culver City CA), Catadioptric projector, catadioptric projection system and process.
  4. Elliott David J. (Wayland MA) Shafer David (Fairfield CT), Deep ultraviolet microlithography system.
  5. Casas Raul E. (Danbury CT), Field corrector for two mirror objective systems.
  6. Wood Robert B. (Hillsboro OR), Head up display system.
  7. Sigler Robert D. (Cupertino CA), Infrared catadioptric zoom relay telescope.
  8. Hollman Richard F. (Chelmsford MA), Microlithographic projection system.
  9. Schoenmakers Wijnand P. (Belmont CA), Off-axis catadioptric projection system.

이 특허를 인용한 특허 (50) 인용/피인용 타임라인 분석

  1. Shafer, David R.; Herkommer, Alois; Schuster, Karl-Heinz; Füerter, Gerd; Büenau, Rudolph Von; Ulrich, Wilhelm, Catadioptric objective comprising two intermediate images.
  2. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  3. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  4. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  5. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  6. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  7. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  8. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  9. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  10. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  11. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
  12. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
  13. Shafer,David; Ulrich,Wilhelm; Dodoc,Aurelian; Von Buenau,Rudolf; Mann,Hans Juergen; Epple,Alexander, Catadioptric projection objective.
  14. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective including an aspherized plate.
  15. Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
  16. Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
  17. Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
  18. Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
  19. Epple, Alexander; Ulrich, Wilhelm; Dodoc, Aurelian; Mann, Hans-Juergen; Shafer, David, Catadioptric projection objective with mirror group.
  20. Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; von Buenau, Rudolf Murai; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective with parallel, offset optical axes.
  21. Omura, Yasuhiro, Catadioptric projection optical system, exposure apparatus, and exposure method.
  22. Singer,Wolfgang; Hainz,Joachim; Frasch,Hans Joachim; Wangler,Johannes; Wietzorrek,Joachim; Schultz,J철rg, Illumination system with field mirrors for producing uniform scanning energy.
  23. Mann, Hans-Juergen, Imaging optical system.
  24. Mann, Hans-Juergen, Imaging optical system.
  25. Mann, Hans-Juergen, Imaging optical system.
  26. Mann, Hans-Juergen, Imaging optical system and related installation and method.
  27. Mann, Hans-Juergen, Imaging optical system with at most 11.6% of the illuminated surfaces of the pupil plane being obscured.
  28. Shafer, David R.; Ulrich, Wilhelm; Dodoc, Aurelian; von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Immersion catadioptric projection objective having two intermediate images.
  29. Shafer, David R.; Hudyma, Russell; Ulrich, Wilhelm, Microlithographic reduction projection catadioptric objective.
  30. Schuster, Karl-Heinz; Clauss, Wilfried, Microlithography projection objective with crystal lens.
  31. Strahle, Fritz; Hauger, Christoph, Microscopy system.
  32. Kamenow,Vladimir; Kraehmer,Daniel; Totzeck,Michael; Gruner,Toralf; Dodoc,Aurelian; Shafer,David; Ulrich,Wilhelm; von Buenau,Rudolf; Mann,Hans Juergen; Epple,Alexander, Projection exposure apparatus.
  33. Beder, Susanne; Singer, Wolfgang; Schuster, Karl-Heinz, Projection objective having a high aperture and a planar end surface.
  34. Beder,Susanne; Singer,Wolfgang; Schuster,Karl Heinz, Projection objective having a high aperture and a planar end surface.
  35. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  36. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  37. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  38. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  39. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  40. Omura, Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  41. Omura,Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  42. Omura,Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  43. Omura,Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
  44. Omura, Yasuhiro, Reducing immersion projection optical system.
  45. Omura, Yasuhiro, Reducing immersion projection optical system.
  46. Omura, Yasuhiro, Reduction projection optical system, exposure apparatus, and exposure method.
  47. Omura, Yasuhiro, Reduction projection optical system, exposure apparatus, and exposure method.
  48. Omura, Yasuhiro, Reduction projection optical system, exposure apparatus, and exposure method.
  49. Shafer, David R.; Armstrong, J. Joseph; Chuang, Yung-Ho, Small ultra-high NA catadioptric objective using aspheric surfaces.
  50. Schuster,Karl Heinz, Very high-aperture projection objective.

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