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Pressure-based mass flow controller system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06F-019/00
출원번호 US-0748472 (2000-12-26)
발명자 / 주소
  • Grosshart, Paul Francis
출원인 / 주소
  • MKS Instruments, Inc.
인용정보 피인용 횟수 : 38  인용 특허 : 7

초록

A pressure based mass flow controller includes a flow path for connection to a fluid source, a flow restrictor dividing the flow path into an upstream reservoir and a downstream reservoir, an upstream pressure measurement device connected to the upstream reservoir, and a flow valve connected to the

대표청구항

A pressure based mass flow controller includes a flow path for connection to a fluid source, a flow restrictor dividing the flow path into an upstream reservoir and a downstream reservoir, an upstream pressure measurement device connected to the upstream reservoir, and a flow valve connected to the

이 특허에 인용된 특허 (7)

  1. Hokynar Jiri (Fraunhoferstasse 11 8033 Martinsried DEX), Control device for fluid flow.
  2. Loan James F. ; Salerno Jack P., Film processing system.
  3. Higgs Robert E. (10266 Basin St. Newburgh IN 47630), Flow metering injection controller.
  4. Schmitt Jacques,FRX ; Turlot Emmanuel,LIX ; Leblanc Frangois,JPX, Method for monitoring the flow of a gas into a vacuum reactor.
  5. Delajoud Pierre R. (109 Rue de Longchamp 92200 Neuilly sur Seine FRX), Precision gas mass flow measurement apparatus and method maintaining constant fluid temperature in thin elongated flow p.
  6. Nishino Koji,JPX ; Ikeda Nobukazu,JPX ; Morimoto Akihiro,JPX ; Minami Yukio,JPX ; Kawada Koji,JPX ; Dohi Ryosuke,JPX ; Fukuda Hiroyuki,JPX, Pressure type flow rate control apparatus.
  7. Loan James ; LeFavour John ; Lischer D. Jeffrey ; Sullivan Laura A. ; Planchard David, Pressure-based mass flow controller.

이 특허를 인용한 특허 (38)

  1. Homan, Jeffrey J.; Arno, Jose I.; Sweeney, Joseph D., Apparatus and process for integrated gas blending.
  2. Seiwart, Johannes; Brammer, Ulrich; Gottschalk, Christiane; Lohr, Joachim, Devices, systems, and methods for carbonation of deionized water.
  3. Nasu, Masayuki; Sano, Masaki; Nunoshige, Yu, Film forming apparatus, gas supply device and film forming method.
  4. Mudd, Daniel T.; Mudd, Patti J., Flow control system, method, and apparatus.
  5. Nagaoka, Hideki; Koizumi, Hiroshi; Ooyabu, Jun; Shimazu, Tsuyoshi; Endo, Hiroki; Ito, Keiki; Hayashi, Daisuke, Flow rate control system and shower plate used for partial pressure control system.
  6. Itoh, Kazutoshi; Nishimura, Yasunori, Fluid mixing system and fluid mixing apparatus.
  7. Arno,Jose I.; Dietz,James A., In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration.
  8. Ding, Junhua; Benedict, Scott; Pisera, Jaroslaw, Method and apparatus for multiple-channel pulse gas delivery system.
  9. Lull, John M.; Valentine, William S., Method and apparatus for providing a determined ratio of process fluids.
  10. Lull, John M.; Valentine, William S., Method and apparatus for providing a determined ratio of process fluids.
  11. Lull,John M.; Valentine,William S., Method and apparatus for providing a determined ratio of process fluids.
  12. Lull,John M.; Valentine,William S., Method and apparatus for providing a determined ratio of process fluids.
  13. Lull,John M; Valentine,William S, Method and apparatus for providing a determined ratio of process fluids.
  14. Tinsley,Kenneth E.; Tariq,Faisal, Method and system for a mass flow controller with reduced pressure sensitivity.
  15. Lull, John Michael; Wang, Chiun; Saggio, Jr., Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  16. Lull,John Michael; Wang,Chiun; Saggio, Jr.,Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  17. Lull,John Michael; Wang,Chiun; Saggio, Jr.,Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  18. Lull,John Michael; Wang,Chiun; Saggio, Jr.,Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  19. Nagaoka,Hideki; Koizumi,Hiroshi; Ooyabu,Jun; Shimazu,Tsuyoshi; Endo,Hiroki; Ito,Keiki; Hayashi,Daisuke, Partial pressure control system, flow rate control system and shower plate used for partial pressure control system.
  20. Arno, Jose I., Photometrically modulated delivery of reagents.
  21. Arno, Jose I., Photometrically modulated delivery of reagents.
  22. Arno, Jose I., Photometrically modulated delivery of reagents.
  23. Arno,Jose I., Photometrically modulated delivery of reagents.
  24. Arno,Jose I., Photometrically modulated delivery of reagents.
  25. Horwitz, Christopher Max, Pressure-based gas flow controller with dynamic self-calibration.
  26. Clark, William R., Pulsed mass flow delivery system and method.
  27. Shajii, Ali; Nagarkatti, Siddharth P.; Besen, Matthew Mark; Clark, William R.; Smith, Daniel Alexander; Akgerman, Bora, Pulsed mass flow delivery system and method.
  28. Shajii, Ali; Nagarkatti, Siddharth P.; Besen, Matthew Mark; Clark, William R.; Smith, Daniel Alexander; Akgerman, Bora, Pulsed mass flow delivery system and method.
  29. Shajii, Ali; Nagarkatti, Siddharth P.; Besen, Matthew Mark; Clark, William R.; Smith, Daniel Alexander; Akgerman, Bora, Pulsed mass flow delivery system and method.
  30. Kono,Tetsujiro; Doi,Hiroki; Ito,Minoru; Nagaoka,Hideki; Ito,Keiki; Endo,Hiroki; Shimazu,Tsuyoshi; Hirose,Jun; Katsumata,Osamu; Miura,Kazuyuki; Kitazawa,Takashi, Relative pressure control system and relative flow control system.
  31. Lull, John M.; Wang, Chiun; Valentine, William S.; Saggio, Jr., Joseph A., System and method for a mass flow controller.
  32. Lull,John M.; Wang,Chiun; Valentine,William S.; Saggio, Jr.,Joseph A., System and method for a mass flow controller.
  33. Lull,John M; Wang,Chiun; Valentine,William S; Saggio, Jr.,Joseph A, System and method for a mass flow controller.
  34. Lull,John M; Wang,Chiun; Valentine,William S; Saggio, Jr.,Joseph A, System and method for a mass flow controller.
  35. Buchanan, Daryl; Tariq, Faisal; Mei, Hai; Tison, Stuart, System and method for producing and delivering vapor.
  36. Ding, Junhua, System for and method of fast pulse gas delivery.
  37. Ding, Junhua; L'Bassi, Michael; Lee, Tseng-Chung, System for and method of fast pulse gas delivery.
  38. Ding, Junhua, System for and method of multiple channel fast pulse gas delivery.
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