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Adjustable clean-air flow environment 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-046/00
출원번호 US-0018209 (2001-10-26)
국제출원번호 PCT/US00/11736 (2000-04-28)
국제공개번호 WO00/64562 (2000-11-02)
발명자 / 주소
  • Siemers, Warren G.
  • Hamor, Gary D.
출원인 / 주소
  • Stratotech Corporation
대리인 / 주소
    Santangelo Law Offices, P.C.
인용정보 피인용 횟수 : 16  인용 특허 : 109

초록

Enclosures having adjustable clean gas flow environments and methods of enclosed pressure differential distribution technology. Specifically, clean gas flow enclosures, which provide for the isolation of materials from airborne micro-particulate contamination. An embodiment of the invention utilizes

대표청구항

Enclosures having adjustable clean gas flow environments and methods of enclosed pressure differential distribution technology. Specifically, clean gas flow enclosures, which provide for the isolation of materials from airborne micro-particulate contamination. An embodiment of the invention utilizes

이 특허에 인용된 특허 (109)

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이 특허를 인용한 특허 (16)

  1. Kirstein, Uwe; Lennartz, Klaus, Device and method for separation of microparticles in particular biohazardous and hazardous materials.
  2. Okamoto, Yasutoshi; Yamada, Fumio; Mochizuki, Akihiro, Draft chamber.
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