Finder optical system and image pickup apparatus using the same
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G02B-023/00
G02B-005/04
출원번호
US-0657517
(2000-09-07)
우선권정보
JP-0252535 (1999-09-07)
발명자
/ 주소
Kamo, Yuji
출원인 / 주소
Olympus Optical Co., Ltd.
대리인 / 주소
Pillsbury Winthrop LLP
인용정보
피인용 횟수 :
24인용 특허 :
4
초록▼
A high-performance real-image finder optical system reduced in size, particularly in thickness, includes a positive objective optical system, an image-inverting optical system for erecting an intermediate image formed by the objective optical system, and a positive ocular optical system. The objecti
A high-performance real-image finder optical system reduced in size, particularly in thickness, includes a positive objective optical system, an image-inverting optical system for erecting an intermediate image formed by the objective optical system, and a positive ocular optical system. The objective optical system has at least two movable units moving when zooming is performed. A prism is placed on the object side of the intermediate image. At least one reflecting surface of the prism has a rotationally asymmetric surface configuration. At least one reflecting surface of the image-inverting optical system is formed from a roof surface. The finder optical system satisfies the following condition: 1.0W·tanθW·Z)Wis the focal length of the objective optical system at the wide-angle end; θWis the maximum field angle of the objective optical system at the wide-angle end; and Z is a zoom ratio.
대표청구항▼
A high-performance real-image finder optical system reduced in size, particularly in thickness, includes a positive objective optical system, an image-inverting optical system for erecting an intermediate image formed by the objective optical system, and a positive ocular optical system. The objecti
A high-performance real-image finder optical system reduced in size, particularly in thickness, includes a positive objective optical system, an image-inverting optical system for erecting an intermediate image formed by the objective optical system, and a positive ocular optical system. The objective optical system has at least two movable units moving when zooming is performed. A prism is placed on the object side of the intermediate image. At least one reflecting surface of the prism has a rotationally asymmetric surface configuration. At least one reflecting surface of the image-inverting optical system is formed from a roof surface. The finder optical system satisfies the following condition: 1.0W·tanθW·Z)Wis the focal length of the objective optical system at the wide-angle end; θWis the maximum field angle of the objective optical system at the wide-angle end; and Z is a zoom ratio. lity of holes about the central line of the substrate such that each hole with its corresponding aperture through to the second surface of the substrate at a defined distance from the central point has a corresponding area located the same distance on the other side of the central point that defines a reflective solid surface. 2. The beam splitter of claim 1 wherein each hole has a longitudinal axis that is aligned with an average propagation direction of the electromagnetic radiation. 3. The beam splitter of claim 1 wherein each hole has a substantially square cross section with rounded corners. 4. The beam splitter of claim 1 wherein the pattern has a pie-shaped perimeter and the total number of holes plus the corresponding reflective solid surfaces are equal to 4N-2, wherein N is a positive integer. 5. The beam splitter of claim 4 wherein each hole has a pie-slice configuration and each reflective solid surface has pie-slice configuration. 6. The beam splitter of claim 1 wherein the substrate is made of a ceramic material. 7. The beam splitter of claim 1 wherein the pattern has at least 3 holes. 8. The beam splitter of claim 1 wherein each of the at least one hole defines an area that ranges from 10 mm2to 2500 mm2and the substrate has a thickness that ranges from 1 mm to 10 mm. 9. The beam splitter of claim 1 wherein the electromagnetic radiation used for alignment is visible light. 10. The beam splitter of claim 1 wherein all of the apertures of the substrate are antisymmetric about the central line on the substrate and are symmetric in the perpendicular direction. 11. A device for mask-to-wafer alignment that comprises: a source of electromagnetic radiation for alignment; optics means for delivering radiation from the source of radiation to a reflective mask; a camera to image an alignment pattern on the reflective mask through a beam splitter to a wafer plane wherein the beam splitter comprises a substrate having a first surface facing the camera and a second surface that is reflective of said electromagnetic radiation, wherein the substrate includes a number of apertures with at least a majority of the apertures defining a hole pattern about a central point of the substrate, and wherein the pattern defines a plurality of holes that defines a hole pattern about the central point of the substrate such that each hole with its corresponding aperture through to the second surface of the substrate at a defined distance from the central point has a corresponding area located the same distance on the other side of the central point that defines a reflective solid surface; means for projecting electromagnetic radiation containing a roughly centered image of the mask alignment pattern toward the first surface of the substrate; a wafer having a complementary alignment pattern on its surface wherein the wafer is positioned downstream from the beam splitter substrate so that electromagnetic radiation that passes through the at least one hole of the substrate is reflected from the wafer to produce reflected electromagnetic radiation containing superimposed images of the mask pattern and of the wafer pattern toward the reflective second surface of the substrate; and means for detecting the superimposed images reflected from the second surface. 12. The device of claim 11 wherein the means for projecting electromagnetic radiation comprises a camera. 13. The device of claim 12 wherein the means for detecting the superimposed images comprises an imaging lens system that focuses electromagnetic radiation containing the superimposed images wherein the camera has a numerical aperture that is less than that of the imaging lens system. 14. The device of claim 11 wherein the means for detecting the superimposed images comprises an array video camera or charge-coupled device. 15. The device of claim 11 wherein the electromagnetic radiation is visible light. 16. The device of claim 11 wherein each hole has a long itudinal axis that is aligned with an average propagation direction of the electromagnetic radiation. 17. The device of claim 11 wherein each hole has a square-like cross section with rounded corners. 18. The device of claim 11 wherein the antisymmetric hole pattern has a pie-shaped perimeter and the total number of holes plus the corresponding reflective solid surfaces are equal to 4N-2, wherein N is a positive integer. 19. The device of claim 18 wherein each hole has a pie-slice configuration and each reflective solid surface has pie-slice configuration. 20. The device of claim 11 wherein the substrate is made of a ceramic material. 21. The device of claim 11 wherein the pattern has at least 3 holes. 22. The device of claim 11 wherein each of the at least one hole defines an area that ranges from 10 mm2to 2500 mm2and the substrate has a thickness that ranges from 1 mm to 10 mm. 23. The device of claim 11 wherein all of the apertures of the substrate are antisymmetric about the central line on the substrate and are symmetric in the perpendicular direction. 24. A method for mask-to-wafer alignment that comprises the steps of: providing a mask that has an alignment pattern on its surface; providing a wafer that has a complementary alignment pattern on its surface; providing a source of electromagnetic radiation and delivering radiation from the source to the mask; providing a camera that images the alignment pattern on the mask through the beam splitter and onto the wafer; providing a beam splitter that comprises a substrate having a first surface facing the source of electromagnetic radiation and second surface that is reflective of said electromagnetic radiation, wherein the substrate includes a number of apertures with at least a majority of the apertures defining a hole pattern about a central point of the substrate, and wherein the pattern defines a plurality of holes that defines a hole pattern about the central point of the substrate such that each hole with its corresponding aperture in the second surface of the substrate at a defined distance from the central point has a corresponding area located the same distance on the other side of the central point that defines a reflective solid surface; projecting electromagnetic radiation from the source of electromagnetic radiation containing an image of the mask pattern through the beam splitter whereby electromagnetic radiation that traverses through at least one hole that is formed through the substrate is reflected off the wafer surface to form a reflected electromagnetic radiation containing superimposed images of the mask alignment pattern and of the complementary wafer alignment pattern that is directed toward the reflective second surface of the substrate; reflecting a combined signal off the second surface of the beam splitter; and detecting the superimposed images. 25. The method of claim 24 wherein each hole has longitudinal axis that is aligned with an average propagation direction of the electromagnetic radiation. 26. The method of claim 24 wherein the substrate defines a plurality of holes that defines a hole pattern about the central point of the substrate such that each hole with its corresponding aperture in the second surface of the substrate at a defined distance from the central point has a corresponding area located the same distance on the other side of the central point that defines a reflective solid surface. 27. The method of claim 24 wherein each hole has a substantially square cross-section with rounded corners. 28. The method of claim 24 wherein the antisymmetric hole pattern has a pie-shaped perimeter and the total number of holes plus the corresponding reflective solid surfaces are equal to 4N-2, wherein N is a positive integer. 29. The method of claim 24 wherein each hole has a pie-slice configuration and each reflective solid surface has pie-slice configuration. 30. The method of claim 24 wherein the substrate i s made of ceramic material. 31. The method of claim 24 wherein the hole pattern has at least 3 holes. 32. The method of claim 24 wherein each of the at least one hole defines an area that ranges from 10 mm2to 2500 mm2and the substrate has a thickness that ranges from 1 mm to 10 mm. 33. The method of claim 24 wherein the electromagnetic radiation is visible light. 34. The method of claim 24 wherein all of the apertures of the substrate are antisymmetric about the central line on the substrate and are symmetric in the perpendicular direction. (3), 221-223 (1992). L. Allen, M. W. Bejersbergen, R. J. C. Spreeuw, and J. P. Woerdman, "Orbital angular momentum of light and the transformation of Laguerre-Gaussian laser modes," Phys.Rev.A 45,8185-8189(1992). V. Yu. Bazhenov, M. S .Soskin, and M. V. Vasnetsov, "Screw dislocations in light wavefronts," J. Mod. Opt. 39, 985-990 (1992). M.S. Soskin, V. N. Vasnetsov. J. T. Malow, and N. R. Heckenbert, "Topological charge and angular momentum of light beams carrying optical vorticies," Phys. Rev. A 56 4064-4075 (1998). M. Harris, C. A. Hill and J. M. R. Vaughan, "Optical helices and spiral interference fringes," Opt. Commun. 106, 161-166 (1994). S. A. Ponomarenko, "A class of partially coherent beams carrying optical vortices," JOSA-A 18, 150-156 (2001). J. Courtial, K. Dholakia, D. A. Robertson, L Allen, M. J. Padgett, "Measurement of the rotational frequency shirt imparted to a rotating light beam possessing orbital angular momentum," Phys. Rev. Lett. 80 3217-3219 (1998). L.Allen, M. Babiker, W. L. Power,"Azimuthal Doppler shirt in light beams with orbital angular momentum," Opt. Commun. 112, 141-144 (1994). J. Courtial, K. Dholakia, L. Allen, M. J. Padgett, "Gaussian beams with very high orbital angular momentum," Opt. Commun. 144, 210-213 (1997). A. E. Siegman, Lasers (University Science Books, CA USA, 1986). R. L. Phillips, L. C. Andrew, Spot size and divergence for Laguerre Gaussian beams of any order Apl. Opt. 22, 643-644 (1983). hniques are provided to plumb positional laser transmitter systems. Still further, strobe beam configurations are provided for improved near/far performance and a vertical mode sensing scheme that allows switching to measuring tall structures when needed.
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