초록 ▼

A portable modular solar battery charger of the lap top style is disclosed. The module includes two body members hingedly interconnected with each body member having a solar panel attached thereto. A circuit is provided for transferring the energy from the solar panels to a battery charger which, in

A portable modular solar battery charger of the lap top style is disclosed. The module includes two body members hingedly interconnected with each body member having a solar panel attached thereto. A circuit is provided for transferring the energy from the solar panels to a battery charger which, in turn, official charges a battery. The modular unit is interconnectable with additional similar modules by both a physical link and an electrical link.

대표청구항 ▼

A portable modular solar battery charger of the lap top style is disclosed. The module includes two body members hingedly interconnected with each body member having a solar panel attached thereto. A circuit is provided for transferring the energy from the solar panels to a battery charger which, in

A portable modular solar battery charger of the lap top style is disclosed. The module includes two body members hingedly interconnected with each body member having a solar panel attached thereto. A circuit is provided for transferring the energy from the solar panels to a battery charger which, in turn, official charges a battery. The modular unit is interconnectable with additional similar modules by both a physical link and an electrical link. lied to coils to generate forces between the magnet array and the coil array in first and second directions; determining a resultant torque between the magnet array and the coil array generated by the forces generated by the determined currents; determining current adjustments to compensate for the resultant torque such that a total torque between the magnet array and the coil array becomes a desired value; and applying a sum of the determined currents and determined current adjustments to the coils to interact with the magnetic fields of the magnet array to control the planar electric motor. 2. The method for controlling a planar electric motor of claim 1, wherein the magnetic fields of the magnet array are adjacent to a portion of the coil array. 3. The method for controlling a planar electric motor of claim 2, wherein the current adjustments are determined for each coil in the portion of the coil array. 4. The method for controlling a planar electric motor of claim 2, wherein currents to be applied to the coils is determined only for coils in the portion of the coil array. 5. The method for controlling a planar electric motor of claim 2, wherein the sum of the determined currents and determined current adjustments to the coils is applied only to coils in the portion of the coil array. 6. The method for controlling a planar electric motor of claim 5, wherein the coils in the portion of the coil array includes coils partially within the magnetic fields of the magnet array. 7. The method for controlling a planar electric motor of claim 1, wherein the magnet array is at least as large as eight coils of the coil array. 8. The method for controlling a planar electric motor of claim 1, further comprising determining the position of the magnet array relative to the coil array and using the position of the magnet array in determining currents, resultant torque or current adjustments. 9. The method for controlling a planar electric motor of claim 1, wherein currents to be applied to coils in a predetermined portion of the coil array are sinusoidal, triangular or square waveforms. 10. The method for controlling a planar electric motor of claim 1, further comprising determining forces to be generated between the magnet array and the coil array in the first and second directions to result in forces in the first and second directions or torque about a third direction, generally orthogonal to the first and second directions. 11. The method for controlling a planar electric motor of claim 1, wherein the current adjustments are determined such that a total force between the magnet array and the coil array remains the same. 12. A method for determining current to be applied to control a planar electric motor, the motor having a magnet array and a coil array having coils generally disposed in a plane, comprising: determining currents to be applied to coils for generating forces between the magnet array and the coil array in first and second directions defined by the plane, the currents being dependent upon the position of the magnet array and desired forces in the first and second directions or torque about a third direction generally perpendicular to the first and second directions; determining a resultant torque that would be generated by the currents; and determining current adjustments to be added to the currents to compensate for the resultant toque such that a total torque between the magnet array and the coil array becomes a desired value. 13. The method for determining current to be applied to control a planar electric motor of claim 12, further comprising determining a sum of the determined currents and determined current adjustments. 14. The method for determining current to be applied to control a planar electric motor of claim 12, wherein the currents are determined only for coils in a predetermined portion of the coil array within a magnetic field of the magnet array. 15. The method for determining current to be appli ed to control a planar electric motor of claim 14, wherein the coils in the portion of the coil array includes coils partially within the magnetic fields of the magnet array. 16. The method for determining current to be applied to control a planar electric motor of claim 12, wherein the current adjustments are determined such that a total force between the magnet array and the coil array remains the same. 17. A method for positioning a wafer in a lithography system, comprising: providing a frame; providing a stage for supporting the wafer and movable to position the wafer relative to the frame; providing a coil array attached to the frame, the coil array having coils; providing a magnet array adjacent a portion of the coil array, the magnet array being attached to the stage and having magnets generally disposed in a plane, the plane defining first and second directions; determining current to be applied to coils in the portion of coil array to generate forces between the magnet array and the coil array in the first and second directions; determining a resultant toque between the magnet array and the coil array generated by the forces; determining current adjustments to compensate for the resultant torque such that a total torque between the magnet array and the coil array becomes a desired value; and applying a sum of the determined currents and determined current adjustments to the coils to interact with magnetic fields of the magnet array. 18. The method for positioning a wafer in a lithography system according to claim 17, further comprising determining position of the magnet array relative to the coil array and using the position of the magnet array in determining currents, resultant torque or current adjustments. 19. The method for positioning a wafer in a lithography system according to claim 17, wherein currents to be applied to coils in the portion of the coil array are sinusoidal, triangular or square waveforms. 20. The method for positioning a wafer in a lithography system according to claim 17, further comprising determining forces to be generated between the magnet array and the coil array in the first and second directions to result in forces in the first and second directions or torque about a third direction, generally orthogonal to the first and second directions. 21. The method for positioning a wafer in a lithography system according to claim 17, wherein the current adjustments are determined for each coil in the portion of the coil array. 22. The method for positioning a wafer in a lithography system according to claim 17, wherein currents to be applied to the coils are determined only for coils in the portion of the coil array. 23. The method for positioning a wafer in a lithography system according to claim 17, where in the sum of the determined currents and determined current adjustments to the coils is applied only to coils in the portion of the coil array. 24. The method for positioning a wafer in a lithography system according to claim 23, wherein the coils in the portion of the coil array include coils partially within the magnetic fields of the magnet array. 25. A method for making a wafer utilizing the positioning method of claim 17. 26. A method for making a device including at least the exposure process, wherein the exposure process uses the lithography system utilizing the method of claim 17. 27. The method for positioning a wafer in a lithography system according to claim 17, wherein the current adjustments are determined such that a total force between the magnet array and the coil array remains the same. 28. A planar motor comprising: a first member; a second member interacting with the first member to generate driving force, the second member being movable relative to the first member in at least two directions by the driving force; and a controller connected to at least one of the first and second members, the controller determining information related to a resultant torque