초록 ▼

Polymer compositions, while providing suitable wrinkle control, also tend to dispense poorly when sprayed. The present invention shows that when viscosity of polymer compositions is minimized spray dispensing improves. Several approaches to minimizing the viscosity of polymer compositions are disclo

Polymer compositions, while providing suitable wrinkle control, also tend to dispense poorly when sprayed. The present invention shows that when viscosity of polymer compositions is minimized spray dispensing improves. Several approaches to minimizing the viscosity of polymer compositions are disclosed. Methods of controlling wrinkles in fabrics comprise treating fabrics with a variety of polymer compositions following a variety of methods. Articles of manufacture comprise (1) a container or substrate, (2) a wrinkle controlling composition, and (3) a set of instructions.

대표청구항 ▼

Polymer compositions, while providing suitable wrinkle control, also tend to dispense poorly when sprayed. The present invention shows that when viscosity of polymer compositions is minimized spray dispensing improves. Several approaches to minimizing the viscosity of polymer compositions are disclo

Polymer compositions, while providing suitable wrinkle control, also tend to dispense poorly when sprayed. The present invention shows that when viscosity of polymer compositions is minimized spray dispensing improves. Several approaches to minimizing the viscosity of polymer compositions are disclosed. Methods of controlling wrinkles in fabrics comprise treating fabrics with a variety of polymer compositions following a variety of methods. Articles of manufacture comprise (1) a container or substrate, (2) a wrinkle controlling composition, and (3) a set of instructions. t is between 20 and 200 volts. 3. A method for polishing diamond surfaces as set forth in claim 1, wherein the discharge voltage applied between the DC power source and the electron source filament is between 50 and 150 volts. 4. A method for polishing diamond surfaces as set forth in claim 1, wherein the pressure of the oxygen gas introduced into the plasma generation reaction chamber in the magnetic cylinder is between 1×10-5and 1×10-3Torr. 5. A method for polishing diamond surfaces as set forth in claim 1, wherein the pressure of the oxygen gas introduced into the plasma generation reaction chamber is between 6.0×10-5and 1.2×10-4Torr. 6. A method for polishing diamond surfaces as set forth in claim 1, wherein the electron source is a filament comprised of a material selected from the group consisting of tungsten, tantalum, and iridium. 7. A method for polishing diamond surfaces as set forth in claim 1, wherein the oxygen plasma is comprised of least 80% atomic oxygen ions. 8. A method for polishing diamond surfaces as set forth in claim 3, wherein the discharge voltage applied between the DC power source and the electron source filament is between 75 and 100 volts. 9. A method for polishing diamond surfaces as set forth in claim 5, wherein the pressure of the oxygen gas introduced into the plasma generation reaction chamber is between 8.0×10-5and 1.0×10-4Torr.