초록 ▼

Materials suitable for fabricating optical monitors include amorphous, polycrystalline and microcrystalline materials. Semitransparent photodetector materials may be based on silicon or silicon and germanium alloys. Conductors for connecting to and contacting the photodetector may be made from vario

Materials suitable for fabricating optical monitors include amorphous, polycrystalline and microcrystalline materials. Semitransparent photodetector materials may be based on silicon or silicon and germanium alloys. Conductors for connecting to and contacting the photodetector may be made from various transparent oxides, including zinc oxide, tin oxide and indium tin oxide. Optical monitor structures based on PIN diodes take advantage of the materials disclosed. Various contact, lineout, substrate and interconnect structures optimize the monitors for integration with various light sources, including vertical cavity surface emitting laser (VCSEL) arrays. Complete integrated structures include a light source, optical monitor and either a package or waveguide into which light is directed.

대표청구항 ▼

1. A semitransparent optical detector, comprising: a semitransparent PIN diode; and a flexible transparent substrate on which said PIN diode is disposed so that light arriving from one side of the detector passes through the diode and the flexible transparent substrate and exits out another side

1. A semitransparent optical detector, comprising: a semitransparent PIN diode; and a flexible transparent substrate on which said PIN diode is disposed so that light arriving from one side of the detector passes through the diode and the flexible transparent substrate and exits out another side of the detector. 2. The detector of claim 1, wherein the substrate comprises a polyimide film. 3. The detector of claim 1, further comprising: a via defined through the substrate; and a conductor extending through the via. 4. The detector of claim 3, integrated with a light source, comprising: a top contact on the light source with which the conductor makes contact; and a transparent bonding layer between the substrate and the light source. 5. A method of making a semitransparent optical detector comprising: on a flexible transparent substrate, fabricating a semitransparent PIN diode so that the PIN diode and the flexible substrate in combination is semitransparent; depositing a contact bump on the flexible substrate; flip bonding the substrate and PIN diode to a vertical cavity surface emitting laser (VCSEL) using a transparent bonding layer; and forming a via through the substrate and bonding layer. 6. The method of claim 5, further comprising: before flip bonding, burning in the semitransparent PIN diode. 7. The method of claim 6, further comprising: before flip bonding, testing the semitransparent PIN diode. 8. The method of claim 7, further comprising: after forming the via, burning in the VCSEL and flip bonded PIN diode. 9. The method of claim 5, further comprising: laser drilling the via through the substrate and the bonding layer. 10. A light emitting device comprising: a first substrate having an array of vertical cavity surface emitting lasers (VCSEL); a second substrate having an array of semitransparent PIN diodes; and an optically transparent spacer separating the first and second substrates from each other, said first and second substrates aligned so that each of the VCSELs of the VCSEL array is aligned with a corresponding different one of the PIN diodes of the PIN diode array. 11. The light emitting device of claim 10, wherein the array of semitransparent PIN diodes further comprises: a first transparent conductor over a first surface of the array of semitransparent PIN diodes; a second transparent conductor over a second surface of the array of semitransparent PIN diodes; and a passivation layer surrounding all edges of the array of semitransparent PIN diodes. 12. The light emitting device of claim 10, wherein the insulating transparent layer is silicon nitride. 13. The light emitting device of claim 10, wherein the insulating transparent layer is silicon dioxide.