초록 ▼

A linear polisher for polishing a substrate that always provides a fresh abrasive surface for polishing and a method for linear polishing a substrate are described. In the linear polisher, a length of a polishing pad is supported on a pair of rollers which are driven by a motor means for either inte

A linear polisher for polishing a substrate that always provides a fresh abrasive surface for polishing and a method for linear polishing a substrate are described. In the linear polisher, a length of a polishing pad is supported on a pair of rollers which are driven by a motor means for either intermittently or continuously advancing the pad during a polishing process. A vibration generator which is connected to the polishing pad through an adaptor provides lateral, or vibration in a transverse direction of the pad throughout the polishing process. The present invention novel linear polisher enables substantially constant removal rate to be achieved throughout the pad life of a polishing pad without deterioration such as that normally seen in a conventional rotary or linear CMP apparatus. Optionally, a rotatable substrate holder is utilized to further improve the polishing uniformity of the linear polishing apparatus.

대표청구항 ▼

1. A linear polisher for polishing a substrate comprising: a length of a polishing pad having a first end and a second end; a first roller for removably attaching said first end of the polishing pad thereto and a second roller for removably attaching said second end of the polishing pad thereto;

1. A linear polisher for polishing a substrate comprising: a length of a polishing pad having a first end and a second end; a first roller for removably attaching said first end of the polishing pad thereto and a second roller for removably attaching said second end of the polishing pad thereto; a motor for rotating said first roller such that said polishing pad moves from said second roller to said first roller in a longitudinal direction, said polishing pad advances intermittently for a distance of at least 1/4 inch after each polishing process for a substrate; a vibration generator for causing said polishing pad to vibrate in a transverse direction of the polishing pad; and a substrate holder for mounting said substrate thereto for pressing an entire exposed surface of said substrate onto a top surface of said polishing pad and for polishing said entire exposure surface of the substrate simultaneously. 2. A linear polisher for polishing a substrate according to claim 1, wherein said polishing pad being fabricated of a polymeric material. 3. A linear polisher for polishing a substrate according to claim 1, wherein said first roller being a take-up roller for taking up used polishing pad and said second roller being a storage roller for storing unused polishing pad. 4. A linear polisher for polishing a substrate according to claim 1, wherein said motor rotates said first roller intermittently. 5. A linear polisher for polishing a substrate according to claim 1, wherein said motor rotates said first roller intermittently after each polishing process for a substrate. 6. A linear polisher for polishing a substrate according to claim 1, wherein said vibration generator generates vibrations in a frequency range between about 10 cycle/sec and about 1000 cycle/sec. 7. A linear polisher for polishing a substrate according to claim 1, wherein said vibration generator generates vibrations having an amplitude between about 0.01 inch and about 1 inch. 8. A linear polisher for polishing a substrate according to claim 1, wherein said vibration generator being coupled to said polishing pad through an adapter for causing said pad to vibrate in a transverse direction. 9. A linear polisher for polishing a substrate according to claim 1, wherein said substrate holder being equipped with a pressure device for pressing said substrate onto said polishing pad. 10. A linear polisher for polishing a substrate according to claim 1, wherein said substrate holder being equipped with a rotating device for rotating said substrate at a rotational speed of at least 50 RPM.