초록 ▼

To address the deficiencies of the prior art, the present invention provides a polishing pad comprising a thermoplastic polymer and a method of manufacturing therefor. More specifically, the present invention polishing pad fabricated from an extruded amorphous thermoplastic and free of a gate vestig

To address the deficiencies of the prior art, the present invention provides a polishing pad comprising a thermoplastic polymer and a method of manufacturing therefor. More specifically, the present invention polishing pad fabricated from an extruded amorphous thermoplastic and free of a gate vestige. The invention also provides a method of manufacturing a polishing pad that is free from a gate vestige pad from an extruded amorphous thermoplastic.

대표청구항 ▼

1. A polishing pad, comprising: an extruded thermoplastic material selected from the class of amorphous thermoplastics selected from the group consisting of: aliphatic polyketones, aromatic polyketones and aromatic polysulfones; and wherein the polishing pad is free of a gate vestige. 2.

1. A polishing pad, comprising: an extruded thermoplastic material selected from the class of amorphous thermoplastics selected from the group consisting of: aliphatic polyketones, aromatic polyketones and aromatic polysulfones; and wherein the polishing pad is free of a gate vestige. 2. The polishing pad as recited in claim 1 wherein a thickness of said pad varies by less than 1%. 3. The polishing pad as recited in claim 1 wherein said polishing pad has a modulus ranging from about 1 MPascal to about 200 MPascal. 4. The polishing pad as recited in claim 1 wherein said polishing pad has an elongation-to-break of about 25%-1000%. 5. The polishing pad as recited in claim 1 wherein said polishing pad has an elongation-to-break of about 50%-500%. 6. The polishing pad as recited in claim 1 wherein said polishing pad has an elongation-to-break of about 100%-350%. 7. The polishing pad as recited in claim 1 wherein said polishing pad has an elongation-to-break of greater than 120%. 8. The polishing pad as recited in claim 1 wherein said thermoplastic has a critical surface tension greater than about 30 milliNewtons/meter.