Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C22C-001/00
C23C-014/34
출원번호
US-0282276
(2002-10-28)
발명자
/ 주소
Ho, Ken K.
Carman, Gregory P.
Jardine, Peter A.
대리인 / 주소
Ostrolenk, Faber, Gerb & Soffen, LLP
인용정보
피인용 횟수 :
57인용 특허 :
7
초록▼
The present invention discloses devices and a method of fabrication of devices using a shape memory effect, thin film with a compositional gradient through the thickness of the film. Specifically, a NiTi SME thin film is disclosed that can be used in actuators, MEMS devices and flow control. The pro
The present invention discloses devices and a method of fabrication of devices using a shape memory effect, thin film with a compositional gradient through the thickness of the film. Specifically, a NiTi SME thin film is disclosed that can be used in actuators, MEMS devices and flow control. The process of fabrication includes a gradual heating of the target over time during the sputter deposition of a thin film on a substrate under high vacuum, without compositional modification. The resulting thin film exhibits two-way shape memory effect that can be cyclically applied without an external bias force.
대표청구항▼
The present invention discloses devices and a method of fabrication of devices using a shape memory effect, thin film with a compositional gradient through the thickness of the film. Specifically, a NiTi SME thin film is disclosed that can be used in actuators, MEMS devices and flow control. The pro
The present invention discloses devices and a method of fabrication of devices using a shape memory effect, thin film with a compositional gradient through the thickness of the film. Specifically, a NiTi SME thin film is disclosed that can be used in actuators, MEMS devices and flow control. The process of fabrication includes a gradual heating of the target over time during the sputter deposition of a thin film on a substrate under high vacuum, without compositional modification. The resulting thin film exhibits two-way shape memory effect that can be cyclically applied without an external bias force. m having a thickness of about 2 nanometers to about 1 micrometer. 6. An Fe particle having a size of about 5 nm to about 50 nm, the Fe particle having a silane coupling film thereon, the silane coupling film having the formula R-silane, where R is an aryl having an ammonium group selected from the group consisting of phenylammonium, benzylammonium, xylylammonium, biphenylammonium, and naphthylammonium, the coupling film having a thickness of about 2 nanometers to about 1 micrometer. 7. An Fe particle having a size of about 5 nm to about 50 nm, the Fe particle having a silane coupling film thereon, the silane coupling film having the formula R-silane, where R is an aryl having a charged ammonium group selected from the group consisting of phenyltrimethylammonium, benzyltrimethylammonium, xylyltrimethylammonium, biphenyltrimethylammonium, and naphthyltrimethylammonium, the coupling film having a thickness of about 2 nanometers to about 1 micrometer. 8. An Fe particle having a size of about 5 nm to about 50 nm, the Fe particle having a silane coupling film thereon, the silane coupling film having the formula R-silane, where R is selected from the group consisting of decyl, dodecyl, octadecyl, dodecylsulfonate, octadecylsulfonate, phenylsulfonate, ethylammonium, hexylammonium, butyltrimethylammonium, and hexyltrimethylammonium, the coupling film having a thickness of about 2 nanometers to about 1 micrometer.
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이 특허에 인용된 특허 (7)
King William J. (9 Putnam Rd. Reading MA 01867) King William J. (Reading MA), Ion beam sputter processing.
Gamdur Singh Mann ; Carlos Augusto Valdes ; Terry Jack Gold ; Jinping Zhang ; Fenglian Chang ; Gregory Keller Rasmussen, Production of binary shape-memory alloy films by sputtering using a hot pressed target.
Hewitt, Todd J; Merritt, Brian; Patterson, William R; Thompson, James M; Plaza, Claudio; Tran, Hung P, Filamentary devices for treatment of vascular defects.
Marton, Denes; Boyle, Christopher T.; Wiseman, Roger W.; Banas, Christopher E., High strength vacuum deposited nitinol alloy films and method of making same.
Marton,Denes; Boyle,Christopher T.; Wiseman,Roger W.; Banas,Christopher E., High strength vacuum deposited nitinol alloy films and method of making same.
Xu, Baomin; Fork, David Kirtland; Young, Michael Yu Tak; Chow, Eugene Michael, Methods for manufacturing stressed material and shape memory material MEMS devices.
Marchand, Philippe; Cox, Brian J.; Rosenbluth, Robert F.; Nolting, John; Dinh, Tan Q.; Wilder, Thomas C., Multiple layer filamentary devices for treatment of vascular defects.
Xu,Baomin; Fork,David Kirtland; Young,Michael Yu Tak; Chow,Eugene Michael, Stressed material and shape memory material MEMS devices and methods for manufacturing.
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