초록 ▼

A carbon deposition chamber is provided with several advantages. The gas mixture used within the deposition process is expressed from tubing through three zones, which are each individually determined with needle valves. The substrate is permitted to rotate back-and-forth to permit more even deposit

A carbon deposition chamber is provided with several advantages. The gas mixture used within the deposition process is expressed from tubing through three zones, which are each individually determined with needle valves. The substrate is permitted to rotate back-and-forth to permit more even deposition of carbon films onto the substrate. The heating filaments are permitted to expand and contract without breakage by permitting the electrode attached to one end of the filaments to move freely as the filaments change in length. The substrate and the heating filaments are cooled to a temperature to prevent carbonization by permitting a cooling fluid to be passed through tubing connected to these elements in a heat sink like manner.

대표청구항 ▼

1. A gas dispersion apparatus for use in a reactor comprising: at least one gas source; at least two gas dispersion elements positioned proximate a filament array and a substrate, each said gas dispersion element forming an independent discharged gas zone directed at said substrate; and each sa

1. A gas dispersion apparatus for use in a reactor comprising: at least one gas source; at least two gas dispersion elements positioned proximate a filament array and a substrate, each said gas dispersion element forming an independent discharged gas zone directed at said substrate; and each said gas dispersion element connected to said gas source by a gas feedline wherein gas flow can be independently controlled to each said gas dispersion element and gas zone formed thereby. 2. The apparatus of claim 1 wherein said gas dispersion elements are aligned to substantially form a plane. 3. The apparatus of claim 2 wherein each said gas dispersion element is moveable in relation to said substrate. 4. The apparatus of claim 3 wherein each said gas dispersion element comprises a closed end conduit having a plurality of discharge orifices directed toward said substrate. 5. The apparatus of claim 2 wherein each said gas dispersion element comprises a closed end conduit having a plurality of discharge orifices directed toward said substrate. 6. The apparatus of claim 1 wherein each said gas dispersion element is moveable in relation to said substrate. 7. The apparatus of claim 6 wherein each said gas dispersion element comprises a closed end conduit having a plurality of discharge orifices directed toward said substrate. 8. The apparatus of claim 1 wherein each said gas dispersion element comprises a closed end conduit having a plurality of discharge orifices directed toward said substrate. 9. The apparatus of claim 1 wherein each said gas dispersion element forms a substantially concentric conduit having gas discharge orifices directed toward said substrate. 10. The apparatus of claim 9 wherein said gas dispersion elements are aligned to substantially form a plane. 11. The apparatus of claim 10 wherein each said gas dispersion element is moveable in relation to said substrate. 12. The apparatus of claim 9 wherein each said gas dispersion element is moveable in relation to said substrate. 13. A gas dispersion apparatus for use in a reactor comprising: at least one gas source; at least two gas dispersion elements positioned proximate a filament array and a substrate, each said gas dispersion element comprising a substantially concentric conduit having gas discharge orifices directed toward said substrate forming independent discharged gas zones directed at said substrate; and each said gas dispersion element connected to said gas source by a gas feedline wherein gas flow can be independently controlled to each said gas dispersion element and gas zone formed thereby. 14. The apparatus of claim 13 wherein said gas dispersion elements are aligned to substantially form a plane. 15. The apparatus of claim 14 wherein each said gas dispersion element is moveable in relation to said substrate. 16. The apparatus of claim 13 wherein each said gas dispersion element is moveable in relation to said substrate. 17. A gas dispersion apparatus for use in a reactor comprising: at least one gas source; three gas dispersion elements positioned proximate a filament array and a substrate, each said gas dispersion element comprising a substantially concentric conduit having gas discharge orifices directed toward said substrate forming an independent discharged gas zone directed at said substrate; said gas dispersion elements being aligned to form a plane; said gas dispersion elements being moveable in relation to said substrate; and each said gas dispersion element connected to said gas source by a gas feedline wherein gas flow can be independently controlled to each said gas dispersion element and gas zone formed thereby.