초록 ▼

An emission measuring system and method provide an accurate, real-time calculation of a particular material emitted from an emission source. Specifically, a CEM system installed in an industrial stack can include a dilution probe located in the stack and a data analyzer that records and analyzes cha

An emission measuring system and method provide an accurate, real-time calculation of a particular material emitted from an emission source. Specifically, a CEM system installed in an industrial stack can include a dilution probe located in the stack and a data analyzer that records and analyzes characteristic data of the materials sampled by the dilution probe. A dilution ratio is used to correct for the addition of dilution gas into the stack gas sample to determine the concentration of a particular material that is being emitted from the stack. The dilution ratio is based on a molar flow rate, which can be determined by using specific algorithms and measurements.

대표청구항 ▼

1. An emission measuring device comprising: an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source, means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a ma

1. An emission measuring device comprising: an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source, means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value, and a dilution probe that receives emitted material and dilution gas which forms a mixture known as diluted sample gas, and that is in communication with the analyzer, said mass flow rate value being a value corresponding to one of a mass flow rate of dilution gas, a mass flow rate of sample gas, and a mass flow rate of emitted material. 2. The emission measuring device of claim 1, wherein the dilution probe is located in one of a stack and a duct. 3. An emission measuring device comprising: an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source, means connected in the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value; and a dilution probe connected to said means for calculating and configured to receive a sample gas that includes the emitted material and a dilution gas, wherein the means for calculating the amount of a particular material calculates by using a dilution ratio based on the mass flow rate value, and wherein the dilution ratio is determined as follows: where D is the dilution ratio, Fdais a mass flow rate of the dilution gas, Tstackis an emission source temperature, M is a molecular weight of the emitted material, Y is a constant, Pabsoluteis total emission source pressure, and β is a thermal expansion coefficient of orifice material located on the dilution probe. 4. An emission measuring device comprising: an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source; and means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value, wherein the means for calculating the amount of a particular material calculates by using a dilution ratio based on the mass flow rate value, and wherein the dilution ration is determined as follows: D=(ndil+nstack)/nstack where D is the dilution ratio, ndilis a molar flow rate of dilution gas, and nstackis a molar flow rate of emitted material. 5. An emission measuring device comprising: an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source; and means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value, wherein the means for calculating the amount of a particular material calculates by using a dilution ration based on the mass flow rate value, and wherein the dilution ration is determined as follows: D=1+[(md/ms)*(Ms/Md)]