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In a 3D-shape measurement apparatus, a photoreceptive optical system for linearly scanning a target-to-be-measured with a scanning light beam and guiding a reflected light beam from the object to a scanning convergence lens is constituted such that the position of an apparent emission point of the r

In a 3D-shape measurement apparatus, a photoreceptive optical system for linearly scanning a target-to-be-measured with a scanning light beam and guiding a reflected light beam from the object to a scanning convergence lens is constituted such that the position of an apparent emission point of the reflected light to be incident on the scanning convergence lens moves in the same direction as the direction along which the scanning light beam deviates due to deformation of a scanning optical system, and the apparent emission point is always positioned on a scanning plane even when the scanning position varies.

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In a 3D-shape measurement apparatus, a photoreceptive optical system for linearly scanning a target-to-be-measured with a scanning light beam and guiding a reflected light beam from the object to a scanning convergence lens is constituted such that the position of an apparent emission point of the r

In a 3D-shape measurement apparatus, a photoreceptive optical system for linearly scanning a target-to-be-measured with a scanning light beam and guiding a reflected light beam from the object to a scanning convergence lens is constituted such that the position of an apparent emission point of the reflected light to be incident on the scanning convergence lens moves in the same direction as the direction along which the scanning light beam deviates due to deformation of a scanning optical system, and the apparent emission point is always positioned on a scanning plane even when the scanning position varies. nd station to define the beamguide passageway along the path, and wherein the beamguide supports a traveling wave propagating along the beamguide in a direction toward the end station. 9. The ion implantation system of claim 8, wherein the beamguide comprises: a feed port located along one of the top, bottom, and side walls between the entrance and exit ends of the beamguide; and a microwave coupler connected to the feed port to couple microwave power from the power source to the beamguide for exciting a single microwave mode or multiple microwave modes as a traveling wave along the beamguide. 10. The ion implantation system of claim 9, wherein the beamguide comprises an entrance wall near the entrance end of the beamguide, the entrance wall comprising an entrance aperture along the path through which the ion beam passes, and wherein the entrance wall operates as a cutoff for the microwave mode or modes to create a reflected wave propagating along the beamguide in the direction toward the end station. 11. The ion implantation system of claim 10, wherein the feed port is located between the entrance and exit ends of the beamguide and spaced from the entrance wall by a distance such that the reflected wave and an incoming wave from the feed port are generally in phase to provide the traveling wave propagating along the beamguide in the direction toward the end station. 12. The ion implantation system of claim 1, wherein the beamline assembly comprises a mass analyzer through which at least a portion of the beamguide passes, the mass analyzer being adapted to receive the ion beam from the ion source and to direct ions of a desired charge-to-mass ratio along the path toward the end station. 13. The ion implantation system of claim 1, wherein the microwave electric fields and the multi-cusped magnetic fields provide an electron cyclotron resonance condition along at least a portion of the passageway. 14. The ion implantation system of claim 1, wherein the beamguide operates as a waveguide to support the microwave electric fields in the beamguide passageway. 15. The ion implantation system of claim 14, wherein the beamguide comprises a top wall, a bottom wall, and first and second opposite side walls, wherein the top, bottom, and side walls extend from an entrance end proximate the ion source to an exit end proximate the end station to define the beamguide passageway along the path, and wherein the beamguide supports a traveling wave propagating along the beamguide in a direction toward the end station. 16. The ion implantation system of claim 15, wherein the beamguide comprises: a feed port located along one of the top, bottom, and side walls between the entrance and exit ends of the beamguide; and a microwave coupler connected to the feed port to couple microwave power from the power source to the beamguide for exciting a single microwave mode or multiple microwave modes as a traveling wave along the beamguide. 17. The ion implantation system of claim 16, wherein the beamguide comprises an entrance wall near the entrance end of the beamguide, the entrance wall comprising an entrance aperture along the path through which the ion beam passes, and wherein the entrance wall operates as a cutoff for the microwave mode or modes to create a reflected wave propagating along the beamguide in the direction toward the end station. 18. The ion implantation system of claim 17, wherein the feed port is located between the entrance and exit ends of the beamguide and spaced from the entrance wall by a distance such that the reflected wave and an incoming wave from the feed port are generally in phase to provide the traveling wave propagating along the beamguide in the direction toward the end station. 19. A beamline assembly for transporting an ion beam from an ion source to an end station in an ion implantation system, the beamline assembly comprising: a beamguide having at least one wall defining a passageway through which the io n beam is transported along the path; a magnetic device adapted to provide multi-cusped magnetic fields in the beamguide passageway; and a power source coupled with the beamguide to provide microwave electric fields in the beamguide passageway, wherein the microwave electric fields and the multi-cusped magnetic fields provide containment of the ion beam in the beamguide passageway. 20. The beamline assembly of claim 19, wherein the magnetic device comprises a plurality of magnets mounted along at least a portion of the passageway. 21. The beamline assembly of claim 20, wherein the plurality of magnets are mounted along an outer surface of the at least one beamguide wall. 22. The beamline assembly of claim 20, wherein the beamline assembly comprises a mass analyzer through which a portion of the beamguide passes, the mass analyzer being adapted to receive the ion beam from the ion source and to direct ions of a desired charge-to-mass ratio along the path toward the end station. 23. The beamline assembly of claim 22, wherein the microwave electric fields and the multi-cusped magnetic fields provide containment of the ion beam at least in the portion of the beamguide passageway passing through the mass analyzer. 24. The beamline assembly of claim 19, wherein the microwave electric fields and the multi-cusped magnetic fields provide an electron cyclotron resonance condition along at least a portion of the passageway. 25. The beamline assembly of claim 24, wherein the beamguide operates as a waveguide to support the microwave electric fields in the beamguide passageway. 26. The beamline assembly of claim 25, wherein the beamguide comprises a top wall, a bottom wall, and first and second opposite side walls, wherein the top, bottom, and side walls extend from an entrance end to an exit end to define the beamguide passageway along the path, and wherein the beamguide supports a traveling wave propagating along the beamguide in a direction toward the exit end. 27. The beamline assembly of claim 26, wherein the beamguide comprises: a feed port located along one of the top, bottom, and side walls between the entrance and exit ends of the beamguide; and a microwave coupler connected to the feed port to couple microwave power from the power source to the beamguide for exciting a single microwave mode or multiple microwave modes as a traveling wave along the beamguide. 28. The beamline assembly of claim 27, wherein the beamguide comprises an entrance wall near the entrance end of the beamguide, the entrance wall comprising an entrance aperture along the path through which the ion beam passes, and wherein the entrance wall operates as a cutoff for the microwave mode or modes to create a reflected wave propagating along the beamguide in the direction toward the exit end. 29. The beamline assembly of claim 28, wherein the feed port is located between the entrance and exit ends of the beamguide and spaced from the entrance wall by a distance such that the reflected wave and an incoming wave from the feed port are generally in phase to provide the traveling wave propagating along the beamguide in the direction toward the exit end. 30. The beamline assembly of claim 19, wherein the beamguide operates as a waveguide to support the microwave electric fields in the beamguide passageway. 31. The beamline assembly of claim 30, wherein the beamguide comprises a top wall, a bottom wall, and first and second opposite side walls, wherein the top, bottom, and side walls extend from an entrance end to an exit end to define the beamguide passageway along the path, and wherein the beamguide supports a traveling wave propagating along the beamguide in a direction toward the exit end. 32. The beamline assembly of claim 31, wherein the beamguide comprises: a feed port located along one of the top, bottom, and side walls between the entrance and exit ends of the beamguide; and a microwave coupler connected to the feed port to couple microwave power