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Material handling system and methods for a multichamber plasma treatment system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/458
  • C23F-001/12
  • H01L-021/306
출원번호 US-0702416 (2000-10-31)
발명자 / 주소
  • Condrashoff, Robert Sergel
  • Fazio, James Patrick
  • Hoffman, David Eugene
  • Tyler, James Scott
출원인 / 주소
  • Nordson Corporation
대리인 / 주소
    Wood, Herron & Evans, L.L.P.
인용정보 피인용 횟수 : 9  인용 특허 : 81

초록

A plasma treatment system wherein workpieces are carried in slots in a magazine. The plasma treatment system has first and second plasma treatment chambers mounted on a common base a base. A queuing station is located on the base for receiving the magazines. A magazine handler moves a magazine to a

대표청구항

A plasma treatment system wherein workpieces are carried in slots in a magazine. The plasma treatment system has first and second plasma treatment chambers mounted on a common base a base. A queuing station is located on the base for receiving the magazines. A magazine handler moves a magazine to a

이 특허에 인용된 특허 (81)

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  77. Harima Yoshiyuki (Zushi JPX), Vertical heat-treatment apparatus having boat transfer mechanism.
  78. Ishii Katsumi (Kanagawa JPX) Takikawa Masao (Sagamihara JPX), Wafer container and wafer aligning apparatus.
  79. Tateyama Kiyohisa (Kumamoto JPX) Sakamoto Yasuhiro (Kumamoto JPX), Wafer conveyor apparatus and method for detecting inclination of wafer inside cassette.
  80. Morisako Isamu (Fukuoka JPX), Wire bonding apparatus and method.
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  1. De Ridder, Christianus Gerardus Maria; Oosterlaken, Theodorus Gerardus Maria, Apparatus and method for transferring two or more wafers whereby the positions of the wafers can be measured.
  2. Raetzman, Ryan R.; Anderson, Brian J.; Dienst, Johnathon R., Convertible pinch wheel closing system for agricultural planter.
  3. Dhas, Arul; Boumatar, Kareem; Ramsayer, Christopher James, Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas.
  4. Augustyniak, Edward; Ramsayer, Christopher James; Singhal, Akhil N.; Boumatar, Kareem, Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates.
  5. Kok,Ronaldus Joannes Cornelis Maria; Evers,Marinus Franciscus Johannes; Dings,Franciscus Cornelius, In-line process for making thin film electronic devices.
  6. Hashinoki,Kenji; Koyama,Yasufumi; Yamada,Takaharu, Substrate processing apparatus and method of transporting substrates and method of processing substrates in substrate processing apparatus.
  7. Kang, Hu; LaVoie, Adrien, Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging.
  8. Kang, Hu; LaVoie, Adrien, Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging.
  9. Bolden, II,Thomas V., Width adjustable substrate support for plasma processing.
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