초록 ▼

A method for treating a waste stream, the method including the steps of providing a waste stream that includes waste solids suspended in water, feeding the waste stream to the top of a hydraulic downdraft column, conducting the waste stream to the bottom of the hydraulic downdraft column, conducting

A method for treating a waste stream, the method including the steps of providing a waste stream that includes waste solids suspended in water, feeding the waste stream to the top of a hydraulic downdraft column, conducting the waste stream to the bottom of the hydraulic downdraft column, conducting the waste steam to a first reaction zone, introducing nitrogen-containing oxides into the first reaction zone so that the waste stream is contacted with the nitrogen-containing oxides, conducting the waste stream up a hydraulic updraft column into a second reaction zone, where the second reaction zone is configured to provide sufficient time so that a reaction between the nitrogen-containing oxides and waste solids can take place and substantially consume the nitrogen-containing oxides, introducing oxygen gas into the waste steam after the nitrogen-containing oxides are substantially consumed, thereby providing a second reactant that reacts with waste solids suspended within the stream, conducting the stream to the top of the hydraulic updraft column.

대표청구항 ▼

A method for treating a waste stream, the method including the steps of providing a waste stream that includes waste solids suspended in water, feeding the waste stream to the top of a hydraulic downdraft column, conducting the waste stream to the bottom of the hydraulic downdraft column, conducting

A method for treating a waste stream, the method including the steps of providing a waste stream that includes waste solids suspended in water, feeding the waste stream to the top of a hydraulic downdraft column, conducting the waste stream to the bottom of the hydraulic downdraft column, conducting the waste steam to a first reaction zone, introducing nitrogen-containing oxides into the first reaction zone so that the waste stream is contacted with the nitrogen-containing oxides, conducting the waste stream up a hydraulic updraft column into a second reaction zone, where the second reaction zone is configured to provide sufficient time so that a reaction between the nitrogen-containing oxides and waste solids can take place and substantially consume the nitrogen-containing oxides, introducing oxygen gas into the waste steam after the nitrogen-containing oxides are substantially consumed, thereby providing a second reactant that reacts with waste solids suspended within the stream, conducting the stream to the top of the hydraulic updraft column. bottom of the tank with a releasable fitting that permits the overflow position to be adjusted. 6. The apparatus of claim 1 wherein the volume occupying element is a rod. 7. Apparatus for supplying a selected volume of an acid to a predetermined volume of deionized water to form a bath of a preselected concentration for etching a semiconductor wafer comprising, a tank adapted to hold the acid and having a volume larger than said selected volume of acid to be supplied to the bath, an overflow pipe located in the tank, the uppermost opening of the overflow pipe establishing an overflow level whereby acid in the tank flows into the overflow pipe for returning acid from the tank when the acid supplied to the tank rises to the overflow level of the overflow pipe, the volume of the tank below the overflow level being larger than the volume of acid to be supplied to the bath, and a rod shaped volume occupying element located in the tank and extending above and below the overflow level, the volume occupying element being adjustable with respect to the overflow level for adjusting the volume of acid contained below the overflow level to said first predetermined volume, and a first pipe and a first valve for controlling the flow of acid from the tank to the bath. 8. The apparatus of claim 7 including means for releasably mounting the overflow pipe in the tank to permit adjusting the overflow level. 9. The apparatus of claim 8 wherein the rim of the overflow pipe is slanted with respect to the acid level so that acid overflows the pipe at a small circumference of the rim. 10. The apparatus of claim 9 wherein the first valve is controllable and the apparatus includes a sensor located to sense the flow of acid in the overflow pipe when the acid has reached overflow level and means for thereafter opening the drain valve for a predetermined time sufficient to drain the acid in the tank.