초록 ▼

A chuck assembly for use in semiconductor processing equipment includes elements that permit reticle expansion and assembly misalignment without additional reticle deformation. Reticle expansion is allowed by flexible support elements that are positioned to move in the direction of expansion, but th

A chuck assembly for use in semiconductor processing equipment includes elements that permit reticle expansion and assembly misalignment without additional reticle deformation. Reticle expansion is allowed by flexible support elements that are positioned to move in the direction of expansion, but that also combine to provide the control necessary for processing. Misalignment is allowed by connections that attach the reticle securely and uniquely to the support elements despite some amount of imperfection in the reticle, or the connections themselves. Accounting in this way for expansion and misalignment prevents additional reticle distortion and thus improves the accuracy of the product.

대표청구항 ▼

A chuck assembly for use in semiconductor processing equipment includes elements that permit reticle expansion and assembly misalignment without additional reticle deformation. Reticle expansion is allowed by flexible support elements that are positioned to move in the direction of expansion, but th

A chuck assembly for use in semiconductor processing equipment includes elements that permit reticle expansion and assembly misalignment without additional reticle deformation. Reticle expansion is allowed by flexible support elements that are positioned to move in the direction of expansion, but that also combine to provide the control necessary for processing. Misalignment is allowed by connections that attach the reticle securely and uniquely to the support elements despite some amount of imperfection in the reticle, or the connections themselves. Accounting in this way for expansion and misalignment prevents additional reticle distortion and thus improves the accuracy of the product. of the following: a linear multi-pole ion trap and a cylindrical multi-pole ion trap. 20. A system in accordance with claim 1, wherein the pressure within the ion dissociation chamber is maintained below atmospheric pressure. 21. A method for inducing infrared multiphoton dissociation (IRMPD) of an ion, the method comprising: positioning a portion of a hollow fiber waveguide with an ion dissociation chamber so that a distal end of the hollow fiber waveguide is aligned with at least a portion of an ion storage area of the ion dissociation chamber; positioning an infrared transparent window adjacent to a proximal end of the hollow infrared waveguide, wherein the infrared transparent windiw assists in maintaining pressures both within the hollow fiber waveguide and the ion dissociation chamber; directing an ion into the ion storage area of the ion dissociation chamber; directing infrared energy into the proximal end of the hollow fiber waveguide; delivering via the distal end of the hollow fiber waveguide at least a portion of the infrared energy to the ion located within the ion storage area of the ion dissociation chamber to cause fragmentation of the ion. 22. A method in accordance with claim 21, further comprising generating the infrared energy. 23. A method in accordance with claim 22, wherein th