초록 ▼

A semiconductor device has a multilayer interconnection structure in which a plurality of interconnection layers is formed in an insulating film. The multilayer interconnection structure has a first metal film made of a first material and functioning as a first interconnection belonging to an interc

A semiconductor device has a multilayer interconnection structure in which a plurality of interconnection layers is formed in an insulating film. The multilayer interconnection structure has a first metal film made of a first material and functioning as a first interconnection belonging to an interconnection layer other than an uppermost interconnection layer, a second metal film made of a second material and functioning as a second interconnection belonging to the uppermost interconnection layer, a third metal film made of the first material and belonging to an interconnection layer other than the uppermost interconnection layer and functioning as a bonding pad, an opening formed in the insulating film and having its bottom defined by the third metal film, and a bonding wire connected to the third metal film through the opening. The second material has a lower resistance and is more susceptible to oxidation than the first material.

대표청구항 ▼

1. A semiconductor device comprising a multilayer interconnection structure in which a plurality of interconnection layers are formed in an insulating film, said multilayer interconnection structure having,a first metal film made of a first material and functioning as a first interconnection belongi

1. A semiconductor device comprising a multilayer interconnection structure in which a plurality of interconnection layers are formed in an insulating film, said multilayer interconnection structure having,a first metal film made of a first material and functioning as a first interconnection belonging to an interconnection layer other than an uppermost interconnection layer,a second metal film made of a second material and functioning as a second interconnection belonging to the uppermost interconnection layer, said second material having a lower resistance and being more susceptible to oxidation than said first material, anda third metal film made of said first material, belonging to an interconnection layer other than the uppermost interconnection layer, and functioning as a bonding pad,said semiconductor device further comprising,an opening formed in said insulating film and having its bottom defined by said third metal film, anda bonding wire connected to said third metal film through said opening.2. The semiconductor device according to claim 1, wherein said first material is an aluminum alloy and said second material is copper.3. The semiconductor device according to claim 1, wherein said third metal film comprises a plurality of metal films belonging to a plurality of interconnection layers other than the uppermost interconnection layer.4. The semiconductor device according to claim 3, wherein said plurality of metal films are connected to each other through a plurality of strip-like via plugs formed between said plurality of metal films.5. The semiconductor device according to claim 3, wherein said plurality of metal films are connected to each other through a plurality of dot-like via plugs formed between said plurality of metal films.6. The semiconductor device according to claim 1, further comprising a fourth metal film formed on said third metal film in said opening and functioning as part of said bonding pad, wherein said bonding wire is bonded to said fourth metal film.7. The semiconductor device according to claim 6, wherein said fourth metal film fills said opening.8. A semiconductor device comprising a multilayer interconnection structure in which a plurality of interconnection layers are formed in an insulating film, said multilayer interconnection structure having,a first metal film made of a first material and functioning as a first interconnection belonging to an interconnection layer other than an uppermost interconnection layer,a second metal film made of a second material and functioning as a second interconnection belonging to the uppermost interconnection layer, said second material having a lower resistance and a lower thermal conductivity than said first material, anda third metal film made of said first material, belonging to an interconnection layer other than the uppermost interconnection layer, and functioning as a fuse of a redundancy circuit, andsaid semiconductor device further comprising an opening formed in said insulating film and having its bottom defined above said third metal film.